Device and method for measuring liquid level height of molten silicon in single crystal furnace
A liquid level, single crystal furnace technology, applied in the self-melting liquid pulling method, single crystal growth, single crystal growth and other directions, can solve the problems of complex algorithm and low detection accuracy, achieve high measurement accuracy, improve accuracy, The effect of simplifying the complexity of the installation
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[0028] Example: The camera model is SQ-S20C-G30-C, and the pixel size is 5.5 μm. Since the height of the liquid level cannot be directly measured during the crystal pulling process, the liquid level is replaced by a mirror surface. The measured distance between the mirror surface and the heat shield is 37.5 mm, through calibration, the angle between the optical axis of the lens and the liquid surface is 22.1 degrees. When the measured size of the actual calibration object is 80mm, the length of the object in the image is 195 pixels, and the magnification k of the lens can be obtained as 0.0134 times. The projected distance of the coordinates of Q' and P' measured at this time in the direction perpendicular to the laser stripes is 135 pixels. According to the size of the CCD pixel, the actual distance between Q' and P' is 0.743mm. According to the formula (1) It can be obtained that the distance between the liquid surface and the bottom edge of the heat shield is 37.09mm.
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