A method for improving the quiet zone performance of a microwave anechoic chamber and a modular dielectric barrier

A microwave anechoic chamber and modular technology, which is applied in the direction of architecture and building construction, can solve the problems of performance degradation of absorbing materials, influence of reflection level index in quiet zone, influence of antenna measurement or simulation test accuracy, etc., so as to improve performance, Effect of size reduction and construction cost reduction

Inactive Publication Date: 2016-08-17
UNIT 63892 OF PLA
View PDF6 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Depend on figure 1 It can be seen that when the center of the quiet zone 4 or the position of the electromagnetic radiation source 3 is asymmetrical, the incident angle of electromagnetic waves increases. If the incident angle α is greater than 60°, the performance of the absorbing material will drop sharply, seriously affecting the reflection level index of the quiet zone, and then affecting The accuracy of antenna measurement or simulation test must take certain measures

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for improving the quiet zone performance of a microwave anechoic chamber and a modular dielectric barrier
  • A method for improving the quiet zone performance of a microwave anechoic chamber and a modular dielectric barrier
  • A method for improving the quiet zone performance of a microwave anechoic chamber and a modular dielectric barrier

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] The present invention will be described in further detail in conjunction with the accompanying drawings and embodiments.

[0034] like figure 1 , 2 As shown in , 3, a modular dielectric barrier for improving the performance of the quiet zone of the microwave anechoic chamber is characterized in that: the modular dielectric barrier 2 located in the microwave anechoic chamber 1 is formed by connecting a right-angled triangle with a rectangular base 2.2, and the right-angled triangle An acute angle of the body is 20-30°, the right-angled surface of the modular dielectric barrier 2 is facing the curtain wall 5, and the slope of the modular dielectric barrier 2 is facing the center of the quiet zone 4; and the slope of the right-angled triangle is provided with a wave-absorbing material layer 2.1 A wave-absorbing material layer 2.1 is respectively arranged on the ground plane shielding body of the microwave anechoic chamber where the vertical plane of the right-angled trian...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to the field of propagation technology for microwave anechoic chamber isolation from the external environment, and in particular to a method for improving the performance of the quiet zone of the microwave anechoic chamber and a modular dielectric barrier. It is connected with a rectangular base, the acute angle of the right-angled triangle is 20-30°, the right-angled surface of the modular dielectric fence faces the electromagnetic radiation source, and the slope of the modular dielectric fence faces the center of the quiet zone; and the slope of the right-angled triangle is set There is a wave-absorbing material layer, and the wave-absorbing material layer is respectively arranged on the right-angled surface of the vertical surface of the right-angled triangle and the shielding body of the ground plane of the microwave anechoic chamber; the modularized dielectric barrier is fixed or movable. The invention uses multiple dielectric barriers to suppress ground reflection or wall reflection of the microwave anechoic chamber, which can reduce the size of the microwave anechoic chamber, directly reduce the construction cost of the microwave anechoic chamber, and further improve the quiet zone performance of the microwave anechoic chamber.

Description

technical field [0001] The invention relates to the field of propagation technology for microwave darkroom isolation from the external environment, in particular to a method for improving the quiet zone performance of the microwave darkroom and a modular dielectric barrier. Background technique [0002] Microwave anechoic chamber is widely used in many fields such as antenna, target RCS characteristic measurement, electromagnetic compatibility test and electronic equipment simulation test. Its most basic function is to provide a propagation environment for electromagnetic waves that is approximately free space and isolated from the outside. The size design of the microwave anechoic chamber generally follows the following principles: the length of the anechoic chamber must meet the test requirements of the equipment under test with antennas of a certain diameter. The restriction is the far-field distance formula, R≤K(D 1 +D 2 ) / 2λ. The transverse dimension of the darkroom...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): E04B1/92
Inventor 甘连仓肖本龙杨黎都傅亦源郭克成牛凤梁刘敏
Owner UNIT 63892 OF PLA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products