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Soft magnetic target material

一种软磁性、靶材的技术，应用在磁性膜到基材的应用、磁记录、金属材料涂层工艺等方向，能够解决磁控管溅射、溅射不良、膜品质劣化等问题

Inactive Publication Date: 2014-09-10
SANYO SPECIAL STEEL COMPANY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] However, the limit of the thickness of the above-mentioned target product is about 5 mm. If the thickness exceeds this limit, sufficient leakage magnetic flux does not appear on the target surface, so there is a problem that normal magnetron sputtering cannot be performed.
In addition, as the film of the target material used for magnetron sputtering, since a high magnetic flux density is required, an Fe-based material is preferred, but there is a problem in corrosion resistance at this time, and because the target Oxidation of the material, the quality of the film will deteriorate, and abnormal discharge will occur in the oxidized part during sputtering, resulting in poor sputtering

Method used

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  • Soft magnetic target material

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Embodiment

[0021] Hereinafter, the present invention will be specifically described by way of examples.

[0022] As shown in Table 1, Fe—Co-based alloys or Fe—Ni-based alloys were produced according to a gas-atomizing method or a casting method. The gas atomization method was carried out under the conditions that the gas type was argon, the diameter of the nozzle was 6 mm, and the air pressure was 5 MPa. On the other hand, the casting method is performed by melting in a ceramic crucible (ф200×30L) and then pulverizing to obtain powder. The powders thus produced were classified into 500 μm or less, and each powder was stirred for 1 hour with a V-type mixer.

[0023] Each powder produced in this way is filled into a sealing can made of SC material with a diameter of 200 mm and a height of 100 mm, and after reaching a vacuum degree of 10-1Pa or more, degassing and vacuum sealing is performed, and then HIP (Hot Isostatic Pressing) , under the conditions of temperature 1173K, pressure 150MP...

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Abstract

There is disclosed a soft magnetic target material with an improved atmospheric resistance without deterioration of magnetic properties. A soft magnetic target material according to the first aspect comprises a Fe-Co based alloy having a Fe:Co atomic ratio of 100:0 to 20:80, wherein the alloy further comprises one or both of Al and Cr of 0.2 to 5 atom %. In addition, a soft magnetic target material according to the second aspect comprises a Fe-Ni based alloy having a Fe:Ni atomic ratio of 100:0 to 20:80, wherein the alloy further comprises one or both of Al and Cr of 0.2 to 5 atom %. In the soft magnetic target materials according to the first and second aspects, the alloys further comprise one or more selected from a group consisting of B, Nb, Zr, Ta, Hf, Ti and V of not more than 30 atom %.

Description

[0001] This application is a divisional application of the application number: 200710091791.3, application date: 2007.04.11, invention name: "soft magnetic target". [0002] Reference is made here to Japanese Patent Application No. 2006-112504 filed on April 14, 2006, the entire disclosure of which is hereby incorporated by reference into the disclosure of this specification. technical field [0003] The present invention relates to a Fe-Co-based or Fe-Ni-based target for forming a soft magnetic thin film by a sputtering method. Background technique [0004] In recent years, the magnetic recording technology has progressed significantly, and in order to increase the capacity of the drive, the high recording density of the magnetic recording medium has been promoted. However, in the magnetic recording medium of the in-plane magnetic recording method widely used in the world, in order to achieve high recording density, the recording bits must be miniaturized, and high coercivi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/14H01F41/18
CPCG11B5/667C23C14/3414G11B5/8404
Inventor 柳谷彰彦相川芳和
Owner SANYO SPECIAL STEEL COMPANY
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