Apparatus And Method For Treating Perfluorocompounds
A perfluoride treatment device technology, which is applied in the field of perfluoride treatment devices, can solve the problems of long-term persistence and high consumption, and achieve the effect of less consumption
Inactive Publication Date: 2014-09-24
SHOWA DENKO KK
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- Abstract
- Description
- Claims
- Application Information
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Problems solved by technology
And, as mentioned above, perfluorinated compounds are generally relatively stable, and their effects last for a long time in many cases.
Method used
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[0033] Hereinafter, modes for carrying out the present invention will be described in detail. In addition, this invention is not limited to the following embodiment, Various deformation|transformation can be implemented within the range of the summary. In addition, the drawings used are for explaining this embodiment, and do not show actual size.
[0034]
[0035] figure 1 It is a figure explaining the overall structure of the semiconductor manufacturing plant to which the perfluoride processing apparatus of this embodiment is applied.
[0036] As shown in the figure, the semiconductor manufacturing plant of this embodiment includes a semiconductor manufacturing facility 1 for manufacturing semiconductors, a perfluoride treatment device 2 for decomposing and treating perfluoride, and an acid scrubber 3 for collecting acid gas.
[0037] Semiconductor manufacturing equipment 1 is usually a clean room, and in the illustrated example, it is equipped with: a P-Si etcher 11 for ...
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The invention provides an apparatus, which can more effectively remove an acid component from decomposition gases and reduce the comsumption of an agentia for dry type acid component removing, for treating perfluorocompounds and so on. The apparatus (2) for treating the perfluorocompounds is characterized by comprising heating units (a first heater (221) and a second heater (222)) which heat device entrance heat exhaust gases and water and hydrolyze the perfluorocompounds by utilizing predetermined catalysts to generate the decomposition gases containing HF, a heat exchanger (231) configured to be at a front section and a rear section of the heating units and perform heat exchanging between the device entrance exhaust gases and the decomposition gases and between the water and the decomposition gases, an acid component removing device (232) removing the HF in a dry manner from the decomposition gases by utilizing the agentia, an HF concentration sensor (236) detecting concentration of the HF contained in the exhaust gases flowed out from the acid component removing device (232), and a control device (24) for executing control for discharging the agentia from the acid component removing device (232) and for supplying the agentia to acid component removing device (232).
Description
technical field [0001] The present invention relates to, for example, a perfluoride treatment device and the like used for decomposing and treating perfluoride. Background technique [0002] For example, in the manufacturing process of a semiconductor device or a liquid crystal device, etching and cleaning may be performed in order to form a fine pattern. In this case, perfluorinated compounds are often used. In addition, perfluorinated compounds are generally stable and mostly harmless to the human body, so they are also used, for example, as refrigerants in air conditioners. [0003] However, among these perfluorinated compounds, when released into the atmosphere, many perfluorinated compounds have a large impact on the global environment. That is, since it exists stably in the atmosphere for a long period of time and has a large global warming coefficient, it becomes a factor of global warming. In addition, as described above, perfluorinated compounds are generally rel...
Claims
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IPC IPC(8): B01D53/86B01D53/68B01D53/30
CPCY02C20/30Y02P70/50B01D53/26B01D53/261B01D53/68B01D53/86
Inventor 鸟巢纯一早坂裕二加藤健一
Owner SHOWA DENKO KK