A kind of graphene film field emission cathode
A technology of graphene film and field emission cathode, which is applied in the direction of electrical components, discharge tube/lamp parts, circuits, etc., to achieve good conductivity
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[0027] The preparation method of the continuous graphene film 70 is vapor phase chemical deposition method, plasma enhanced vapor phase chemical deposition method, mechanical exfoliation method or redox method.
[0028] The continuous graphene film 70 is single-layer graphene, two-layer graphene or multi-layer graphene.
[0029] The preparation method of the porous array 30 is electron beam lithography, ultraviolet ray lithography, microsphere template method or anodized aluminum template method.
[0030] The cathode substrate 40 is an insulating material.
[0031] The material of the cathode substrate 40 is one or a combination of at least two of silicon dioxide, aluminum oxide or silicon nitride.
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[0032] The concrete preparation process of a kind of graphene film field emission cathode of the present invention is as follows:
[0033] Step 1: Preparation of continuous graphene film 70:
[0034] Place the copper foil in a quartz tube, and heat it from room temperature to 800-1000°C under an argon atmosphere. The flow rate of argon was maintained at 600 sccm, and the temperature increase rate was 8° C. / min. After the copper foil is heated to the target temperature, hydrogen gas is introduced for reduction annealing. The hydrogen gas flow rate is 60 sccm, and the flow rate and temperature of argon gas remain constant. After 20 minutes, 10-50 sccm methane gas, 100 sccm hydrogen gas and 1000 sccm argon gas are injected. After growing for 5-15 minutes, turn off the methane and hydrogen, cool down to room temperature in an argon atmosphere, and grow a continuous graphene film 70 on the copper foil.
[0035] Step 2: Transfer of Graphene
[0036] Coat PMMA on the copper foil t...
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