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Semiconductor device

A semiconductor and conductive technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, transistors, etc., can solve problems such as electrostatic discharge fragility

Active Publication Date: 2014-11-05
NEW JAPAN RADIO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, a semiconductor device with a general structure formed on a semiconductor substrate is extremely vulnerable to electrostatic discharge due to contact with a charged person, etc., in combination with the miniaturization of the wiring rules on the substrate.

Method used

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  • Semiconductor device
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no. 1 Embodiment approach

[0061] Next, while referring to the attached Figure 1 Next, the semiconductor device of the present invention will be described. According to the semiconductor device of the present invention such as Figure 1~3 A plan explanatory view, a cross-sectional explanatory view, and an equivalent circuit diagram respectively showing the semiconductor structure have a first conductivity type semiconductor substrate ( Figure 1~3 In the example shown, it is a P-type semiconductor substrate) 1, and a second conductivity-type semiconductor layer formed on the surface of the semiconductor substrate 1 (in Figure 1~3 In the example shown, the first region 2 of the N-type epitaxial semiconductor layer) has a circuit element including a PN junction formed by the semiconductor substrate 1 and the first region 2 ( Figure 1~3 The example shown is a PNP transistor) 10 and an input terminal 13 connected to the first region 2, and a protection element ( Figure 1~3 In the example shown it is ...

no. 2 Embodiment approach

[0075] A plan explanatory view, a cross-sectional explanatory view, and an equivalent circuit diagram of the semiconductor structure of the semiconductor device according to the second embodiment of the present invention are as follows: Figure 5-7 shown. This embodiment differs from the first embodiment in that the circuit elements are lateral PNP transistors. Such as Figure 5 as well as Figure 6 As shown, the only structural difference from Embodiment 1 is that the collector 4 of the PNP transistor 10 is not in the P-type semiconductor substrate 1 in the first embodiment, but in the first region 2 formed of the above-mentioned N-type semiconductor. In this point, there is a P-type semiconductor region formed around the emitter 3 of the transistor. exist Figure 7 In the equivalent circuit of , only the point that the collector 4 of the PNP transistor 10 is not directly connected to the base of the protection element 11 (semiconductor substrate 1 ) is different. The st...

no. 3 Embodiment approach

[0079] A plan explanatory view, a cross-sectional explanatory view, and an equivalent circuit diagram of a semiconductor structure of a semiconductor device according to a third embodiment of the present invention are as follows: Figure 8-10 shown. This embodiment differs from the second embodiment in that the circuit element is an NPN transistor 19 and the input terminal 13 is connected to the collector. The NPN transistor 19 as Figure 8 as well as Figure 9 As shown, the first region 2 connected to the input terminal 13 via the contact region 18 is used as the collector, the P-type region 16 formed in the first region 2 is used as the base, and the N-type region 16 formed in the P-type region 16 is used as the collector. Type region 17 is formed for the emitter. Such as Figure 9 as well as Figure 10 As shown, in the equivalent circuit, the input terminal 13 and the collector of the protective element 11 are also different in that the collector of the NPN transistor ...

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Abstract

The present invention provides a semiconductor device that is equipped with an ESD protection element, which has a size increase thereof suppressed, does not require extra process, and can be formed without inducing deterioration of characteristics of the semiconductor device. This semiconductor device includes: a semiconductor substrate (1); a circuit element (10), that includes a PN junction formed of a region (2), which is formed on the semiconductor substrate, and which has a conductivity type different from that of the substrate; and a protection element (11) for the circuit element. The protection element (11) is a transistor formed of the region (2), another region (6) having the conductivity type same as that of the region (2), and the semiconductor substrate (1). The emitter for the transistor and the semiconductor substrate (1) are connected to each other.

Description

technical field [0001] The present invention relates to a semiconductor device formed with an element for protecting a bipolar transistor or a junction field effect transistor used in an input circuit of the semiconductor device from electrostatic discharge (ESD: Electrostatic Discharge), and particularly relates to a device that suppresses the protection. A semiconductor device that requires additional steps for element formation and reduces its occupied area. Background technique [0002] Today, semiconductor devices such as semiconductor integrated circuits are widely used in various fields, including consumer applications such as mobile communication terminals, display devices, and notebook PCs, as well as industrial applications such as various production equipment and factory equipment. . On the other hand, along with the expansion of the field of use, the level of reliability required has become higher, and particularly high reliability is required in the field of us...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/822H01L21/8232H01L27/04H01L27/06
CPCH01L27/0262H01L27/0248H01L27/0623
Inventor 松本英显山下顺江刺家健司杉野高夫
Owner NEW JAPAN RADIO CORP