Method for measuring and compensating absolute positioning accuracy of precise positioning platform

Abstract

The invention discloses a method for measuring and compensating absolute positioning accuracy of a precise positioning platform. The method comprises the following specific steps: putting a mask plate on a photo-etching device with high known positioning accuracy, exposing a plurality of regularly arranged Marks on the photo-etching device, measuring a positioning platform with poor accuracy by virtue of the mark plate, a CCD imaging technology and an image matching technology after etching, and compensating a measured error to a platform controller so as to improve the positioning accuracy of the platform. The method is used for measuring and compensating the error by exposing the marks on the mask plate; compared with a method of measurement and compensation with a laser interferometer in the prior art, the method is low in cost and easy to operate; when the image matching method is used for measuring and compensating, the measurement accuracy is high, and the error is 1 / 20 pixel, namely 4.65 microns / 22.3 / 20 which is about 10nm; the method is capable of effectively compensating and calibrating the two-dimensional positioning accuracy of the positioning platform.

Description

technical field [0001] The invention belongs to the technical field of plate-making lithography, and relates to an absolute positioning accuracy measurement and compensation method of a precision positioning platform on plate-making lithography equipment. Background technique [0002] Photolithography is used to print a pattern of features on the surface of a substrate. Such substrates may include chips used in the manufacture of semiconductor devices, various integrated circuits, flat panel displays (eg, liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like. [0003] The process of lithography plate making is: place the mask or wafer on the precision positioning platform system, use vacuum adsorption, and project the designed characteristic pattern onto the surface of the mask through the exposure device in the lithography equipment. The graphics on the mask plate are as consistent as possible with ...

AI Technical Summary

Problems solved by technology

Using a laser interferometer is expensive. If you only measure and compensate the positioning accuracy of a single axis, you can use a single-axis laser interferometer. If you measure and compensate the positioning accuracy of each position on the two-dimensional plane for the XY integrated platform, you need a length Reflectors that can cover the travel of the XY axis are more expensive than single-axis compensation. This method has high environmental requirements, and requires stable temperature and humidity, cleanliness, etc., and the construction of this measurement system requires a complicated adjustment process.

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