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Method and equipment for forming optical films on workpiece

A technology for optical films and workpieces, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of film layer shedding, deposition amount, unevenness, etc., and achieve extremely easy process, uniform energy distribution, and process The effect of compact equipment

Active Publication Date: 2014-12-24
HUIZHOU OBOLAND OPTOELECTRONICS TECH
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0009] One of the purposes of the present invention is to overcome the above-mentioned deficiencies of the prior art, solve the problems of film layer falling off at high temperature and uneven deposition amount, and propose a method of pulse plasma chemical vapor deposition

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  • Method and equipment for forming optical films on workpiece

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Embodiment Construction

[0033] The present invention will be further described below in conjunction with specific embodiments and accompanying drawings.

[0034] The present invention first discloses a method for forming an optical film on a workpiece. The method is a pulsed plasma chemical vapor deposition method. This embodiment takes the formation of an infrared cut-off film or an infrared transmission film as an example, and specifically includes the following steps:

[0035] a. Fix the workpiece in the sealed microwave cover, and evacuate the sealed microwave cover; the vacuum degree in the sealed microwave cover reaches 10 -1 mbar to 10 -3 Stop vacuuming at mbar;

[0036] b. Introduce oxygen into the sealed microwave cover, and introduce pulsed microwave into the sealed microwave cover. The reaction time is 10 seconds to 60 seconds, depending on the size of the workpiece; during this process, the pulsed microwave acts on the sealed microwave cover Oxygen plasma is generated by the oxygen, and...

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Abstract

The invention relates to a method and equipment for forming optical films with various functions on a workpiece. A pulse plasma chemical vapor deposition method is adopted as the method. The method comprises the following steps that a, the workpiece is fixedly arranged in a sealed microwave cover, and the sealed microwave cover is vacuumized; b, oxygen is led into the sealed microwave cover, pulse microwaves are guided into the sealed microwave cover, and reaction is carried out for a certain time; c, gas containing film-forming component elements is led into the sealed microwave cover, the oxygen is continued to be led into the sealed microwave cover, the pulse microwaves are continued to be guided into the sealed microwave cover, reaction is carried out for a certain time, then, the gas is stopped from being led into the sealed microwave cover, and the pulse microwaves are stopped from being guided into the sealed microwave cover. The pulse plasma chemical vapor deposition method has the high deposition efficiency, the whole process only needs few minutes, and therefore the production efficiency is quite high; plasmas of the oxygen perform plasma cleaning and surface activation treatment on the surface of the workpiece before film forming, and therefore film adhesion is greatly improved; therefore, the product quality is improved.

Description

Technical field: [0001] The invention belongs to the technical field of lamps, and relates to a film forming technology on the surface of lamp beads and lamp cups, in particular to a method and equipment for forming an optical film on a workpiece. Background technique: [0002] At present, the general method of preparing an infrared cut-off film on the outer surface of the lamp bead and the method of preparing an infrared transmissive film on the inner surface of the lamp cup both use physical vacuum evaporation. The preparation of infrared cut-off film and infrared transmission film is respectively made of silicon dioxide (SiO 2 ) and titanium dioxide (TiO 2 ) solid particles are heated and gasified by the electron gun, and lamp beads or lamp cups are placed on the rotating disk in the vacuum chamber, and the gasified titanium dioxide (TiO 2 ) and silicon dioxide (SiO 2 ) adheres to the outer surface of the lamp bead or the inner surface of the lamp cup when it is cold, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/511C23C16/513C23C16/515C23C16/517
Inventor 高忠义
Owner HUIZHOU OBOLAND OPTOELECTRONICS TECH
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