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Method and device for forming optical film on workpiece

A technology of optical film and workpiece, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve problems such as unevenness, film layer shedding and deposition amount, etc., achieve uniform energy distribution, easy process, and wide application The effect of applying the foreground

Active Publication Date: 2018-08-07
HUIZHOU OBOLAND OPTOELECTRONICS TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] One of the purposes of the present invention is to overcome the above-mentioned deficiencies of the prior art, solve the problems of film layer falling off at high temperature and uneven deposition amount, and propose a method of pulse plasma chemical vapor deposition

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  • Method and device for forming optical film on workpiece

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Embodiment Construction

[0033] The present invention will be further described below in conjunction with specific embodiments and accompanying drawings.

[0034] The present invention first discloses a method for forming an optical film on a workpiece. The method is a pulsed plasma chemical vapor deposition method. This embodiment takes the formation of an infrared cut-off film or an infrared transmission film as an example, and specifically includes the following steps:

[0035] a. Fix the workpiece in the sealed microwave cover, and evacuate the sealed microwave cover; the vacuum degree in the sealed microwave cover reaches 10 -1 mbar to 10 -3 Stop vacuuming at mbar;

[0036] b. Introduce oxygen into the sealed microwave cover, and introduce pulsed microwave into the sealed microwave cover. The reaction time is 10 seconds to 60 seconds, depending on the size of the workpiece; during this process, the pulsed microwave acts on the sealed microwave cover Oxygen plasma is generated by the oxygen, and...

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Abstract

The invention relates to a method and equipment for forming various functional optical films on workpieces. The method is a pulsed plasma chemical vapor deposition method, which includes the following steps: a. fixing the workpiece in a sealed microwave cover, and vacuumizing the sealed microwave cover; b. feeding oxygen into the sealed microwave cover, and Introduce pulsed microwaves into the air, and react for a certain period of time; c. Then feed gas containing film-forming component elements into the sealed microwave cover, and continue to feed oxygen and continue to introduce pulsed microwaves. After a certain period of time, stop feeding the sealed microwave cover. The gas is fed into the middle and the pulsed microwave is stopped; the pulsed plasma vapor-phase chemical deposition method of the present invention has very high deposition efficiency, and the whole process time only needs a few minutes, so the production efficiency is very high; Plasma cleaning and surface activation treatment greatly improve the adhesion of the film layer, thereby improving the product quality.

Description

Technical field: [0001] The invention belongs to the technical field of lamps, and relates to a film forming technology on the surface of lamp beads and lamp cups, in particular to a method and equipment for forming an optical film on a workpiece. Background technique: [0002] At present, the general method of preparing an infrared cut-off film on the outer surface of the lamp bead and the method of preparing an infrared transmissive film on the inner surface of the lamp cup both use physical vacuum evaporation. The preparation of infrared cut-off film and infrared transmission film is respectively made of silicon dioxide (SiO 2 ) and titanium dioxide (TiO 2 ) solid particles are heated and gasified by the electron gun, and lamp beads or lamp cups are placed on the rotating disk in the vacuum chamber, and the gasified titanium dioxide (TiO 2 ) and silicon dioxide (SiO 2 ) adheres to the outer surface of the lamp bead or the inner surface of the lamp cup when it is cold, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/511C23C16/513C23C16/515C23C16/517
Inventor 高忠义
Owner HUIZHOU OBOLAND OPTOELECTRONICS TECH
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