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114results about How to "With uniformity" patented technology

Method for profiling weaving thick top-to-thin wall capping fabric

The invention relates to a method for profiling weaving a thick top-to-thin wall capping fabric. The method comprises the following steps: 1, the capping fabric is woven from the center of a core model to form, the fabric is woven outside the weaving core model, and two pairs or four pairs of yarns which are crossed with each other are used to weave one or two weaving structures to circularly form a square top; 2, the interlaced yarns which form the square top are taken as warps, and wefts are gradually guided into each layer of yarns layer by layer; the square top is taken as a center, the wefts are woven in an intertwining manner to form a concentric circle, and a round top is formed after a plurality of circular weaving; and 3, after the round top is completely woven, the fabric is woven from a thick top capping fabric to a conical thin-wall fabric, the weaving diameter of the fabric is gradually increased during the conversion process and is increased through adding the weft arrays along the warp direction, and the weft density is kept consistent. By the method, a forming and producing technology of the complicated capping fabric is simplified, the internal fibers of the capping reinforcement fabric are distributed uniformly, a fabric forming effect is enhanced, and the clear dimension profiling weaving is realized.
Owner:NANJING FIBERGLASS RES & DESIGN INST CO LTD

Grinding device for sapphire wafers and grinding method thereof

The invention discloses a grinding device for sapphire wafers. The grinding device for sapphire wafers comprises a pulp stock barrel, a peristaltic pump and a grinder, wherein a pulp stock trough is arranged on the grinder, and pulp stock enters into the grinder through the peristaltic pump and the pulp stock trough. The grinding method for the sapphire wafers comprises the following steps: 1, preparing the pulp stock: putting in raw materials by levels and layers; 2, controlling pulp stock flows: putting pulp stock accurately; 3, correcting the flatness of the surface of a grinding lower plate: repeatedly measuring by using a long gauge, a short gauge and a dial gauge, and correcting; 4, distributing powder on the surface of a grinding plate; and 5, grinding both sides of each wafer: firstly carrying out light pressing grinding. The grinding method provided by the invention is characterized in that raw material ratio of the pulp stock is optimized, the pulp stock supplying flow is more accurate, the conveying is more even, before normal grinding, light pressing grinding is performed firstly, the problem of wafer breakage during a grinding process can be prevented for the greatest possible, the wafer breakage rate is lowered, the merit factor of grinding is improved, the removing rate during grinding is stable, the problems of over grinding and low removing rate cannot be caused, and the efficiency is relatively high.
Owner:TUNGHSU GRP

Method for accomplishing sub-wavelength interference photolithography utilizing multiple layer metal dielectric-coating structure

InactiveCN101261454AWith uniformitySolve the problem that sub-wavelength pattern lithography cannot be realizedSemiconductor/solid-state device manufacturingPhotomechanical exposure apparatusResistPhotolithography
A method for utilizing multilayer metal dielectric film structure to realize the sub-wavelength interference lithography is characterized by the following steps of selecting a substrate material; coating an anticorrosion agent on the surface of the substrate; carrying out the alternate vapor deposition of a metal material film and a dielectric material film on the surface of the anticorrosion agent to form a metal layer and a dielectric layer which are arranged alternately; designing and arranging a periodic structure pattern mask on the surface of the structure which is obtained by the above step; carrying out the exposure of the obtained structure; removing the mask structure after the finish of the exposure; further removing the material of the metal layer and the material of the dielectric layer; arranging the obtained structure in a developing liquid which is matched with the anticorrosion agent for carrying out the development; carrying out the dry etching of the structure after the development and transferring the structure on the substrate; removing the residual anticorrosion agent on the surface of the structure and obtaining a final sub-wavelength periodic structure pattern; the utilization of the method of the invention can realize the periodic structure pattern with a large area, evenness and the period of which is below the wavelength.
Owner:INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI

Multi-barrel rotary black tea fermentation device

The invention discloses a multi-barrel rotary black tea fermentation device. The multi-barrel rotary black tea fermentation device comprises a power device, a heat, moisture and oxygen supplying system, a frame, a feeding port and a discharging port, wherein a long outer barrel is arranged; a plurality of fermentation barrel are arranged on the same circumference inside the outer barrel; the fermentation barrels are fixedly connected with the outer barrel; small holes are arranged uniformly on the surface of the barrel wall of each fermentation barrel; a plurality of small round pipes provided with small holes pass through the barrel wall of each fermentation barrel; the inner wall of each fermentation barrel is provided with a plurality of uniformly distributed spiral material guiding ribs; the feeding port is communicated with the fermentation barrels; the terminal end of each fermentation barrel is communicated with the discharging port; an air intake central pipe is arranged; one end of the air intake central pipe is communicated with the center of a cavity body of the outer barrel while the other end of the air intake central pipe is connected with the heat, moisture and oxygen supplying system; and the power device can drive the outer barrel to rotate. The multi-barrel rotary black tea fermentation device, disclosed by the invention, has the advantages of a simple structure, cleaning convenience, high automation level and capability of realizing clean production of tea leaves; the fermented black tea has uniformity and consistency; and the quality of the tea leaves is improved.
Owner:ZHEJIANG ZHUFENG MACHINERY

Method for reducing number of array elements of large-scale spherical surface array

The invention discloses a method for reducing the number of array elements of a large-scale spherical surface array, and aims to provide a method capable of obtaining electrical performance equivalentto that of a full array and remarkably reducing the total number of the array elements of a spherical surface antenna array. According to the technical scheme, the method comprises: establishing a coordinate system, and constructing an antenna subarray according to the rule of half-wavelength uniform arrangement of antenna units in the antenna subarray; dividing sub-arrays along the pitching direction and the azimuth direction of the coordinate system, and constructing an initial full array; establishing a spherical cylindrical array antenna array model based on large-spacing array element arrangement, and constructing a new antenna subarray with large-spacing array element arrangement; and then, setting an activation angle domain and different incoming wave directions according to the array element spacing, and calculating the synthetic gain of the antenna array under each array element interval. The total array synthetic gain of the antenna is compensated by reasonably reducing thecurvature of the spherical surface and increasing the diameter of the spherical surface to a proper value, and the gain value and the sidelobe characteristic similar to those of a full-array array areobtained while the number of the array elements is reduced.
Owner:10TH RES INST OF CETC

Double-layer comprehensive pipe gallery

The invention relates to a double-layer comprehensive pipe gallery. A natural gas cabin, an electric cabin and a comprehensive cabin are arranged in the double-layer comprehensive pipe gallery, a natural gas pipeline can be contained in the natural gas cabin, an electric power pipeline and a communication pipeline can be contained in the electric cabin, a water supply pipeline, a reclaimed water pipeline, a heat power pipe and a communication pipeline are contained in the comprehensive cabin, and the natural gas cabin and the electric cabin are arranged above the comprehensive cabin to form adouble-layer distribution structure, and the natural gas cabin is independently arranged in a sealed manner; a function cabin is further arranged on the upper layer of the double-layer comprehensive pipe gallery, the function cabin can be communicated with the natural gas cabin, the electric cabin and the comprehensive cabin in the longitudinal direction of the double-layer comprehensive pipe gallery, and the top of the function cabin is provided with a function through opening which can be communicated with the exterior of the top of the double-layer comprehensive pipe gallery and can be sealed. The double-layer comprehensive pipe gallery is internally provided with the function cabin used for meeting the functions of hoisting, line leading and the like, the occupied space is effectivelyreduced, the structure is simple, the construction cost is low, and application and popularization are facilitated.
Owner:MCC CAPITAL ENGINEERING & RESEARCH

Method and equipment for forming optical films on workpiece

The invention relates to a method and equipment for forming optical films with various functions on a workpiece. A pulse plasma chemical vapor deposition method is adopted as the method. The method comprises the following steps that a, the workpiece is fixedly arranged in a sealed microwave cover, and the sealed microwave cover is vacuumized; b, oxygen is led into the sealed microwave cover, pulse microwaves are guided into the sealed microwave cover, and reaction is carried out for a certain time; c, gas containing film-forming component elements is led into the sealed microwave cover, the oxygen is continued to be led into the sealed microwave cover, the pulse microwaves are continued to be guided into the sealed microwave cover, reaction is carried out for a certain time, then, the gas is stopped from being led into the sealed microwave cover, and the pulse microwaves are stopped from being guided into the sealed microwave cover. The pulse plasma chemical vapor deposition method has the high deposition efficiency, the whole process only needs few minutes, and therefore the production efficiency is quite high; plasmas of the oxygen perform plasma cleaning and surface activation treatment on the surface of the workpiece before film forming, and therefore film adhesion is greatly improved; therefore, the product quality is improved.
Owner:HUIZHOU OBOLAND OPTOELECTRONICS TECH

Diversion plate and anti-vortex device integration based condenser

The invention discloses a diversion plate and anti-vortex device integration based condenser which comprises a shell; the shell is a cylindrical shell with openings formed in the left end and the right end respectively; and a left end opening of the shell is provided with a left end cover. The diversion plate and anti-vortex device integration based condenser is simple in structure and convenientto mount and use; by performing progressive shunting through a shunting plate, an anti-flushing plate and a retaining cover, the axial distribution rate of a refrigerant is increased, the refrigeranthas uniformity in distribution of a section, and the refrigerant is prevented from washing a pipe wall when entering a condensation pipe; the anti-flushing plate has the self-adaptive moving capability, so that vibration of the anti-impact plate caused by pressure fluctuation is absorbed, transfer of the vibration is inhibited, the vibration amplitude of the condensation pipe is lowered, the structural strength of the anti-flushing plate is ensured at the same time, and the anti-flushing plate is difficult to damage; a diversion plate which moves along with the anti-flushing plate is provided,so that the radial blocking can be provided, and generation of vortices can be inhibited; and by fully utilizing a refrigerating fluid, the heat exchange efficiency and the flow discharge capacity are improved, and the energy consumption is low.
Owner:广东捷邦节能设备制造有限公司
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