Full-dielectric reflecting film and manufacturing method thereof

Abstract

The invention discloses a full-dielectric reflecting film and a manufacturing method thereof. The full-dielectric reflecting film is continuous in manufacturing process, low in the manufacturing cost and convenient to manufacture. An amorphous silicon film with the density of 2.15-2.32 g / cm <3> is adopted and manufactured into a high-refractive-index film layer, an amorphous silicon film with the density of 1.90-2.10 g / cm <3> is adopted and manufactured into a low-refractive-index film layer, and the amorphous silicon films are adopted for both the high-refractive-index film layer and the low-refractive-index film layer. The amorphous silicon films with the different densities can be obtained only by alternately changing reaction conditions in the PECVD process. Only amorphous Silicon is adopted as film layer materials for the structure of the reflecting film, so that the reflecting layer has the advantages that the process is continuous, and film formation is achieved at one time. Meanwhile, the reflecting film can be manufactured at low cost and on a large scale because of the mature amorphous silicon film production process and has high practical significance. The reflecting film is suitable for being applied and popularized in the field of optical devices.

Description

technical field [0001] The invention relates to the field of optical devices, in particular to a total dielectric reflection film and a preparation method thereof. Background technique [0002] Optical film is an important part of modern optical instruments and various optical devices. It is based on the interference of light and realizes its function by changing the light intensity and polarization state of transmitted or reflected light. Among them, optical reflective films occupy an extremely important position and are widely used in military and civilian fields. [0003] Reflective film mainly realizes energy reflection, including metal reflective film and total dielectric reflective film. Metal reflective films are not widely used in optical devices due to large light loss. The all-dielectric reflective film is based on multi-beam interference. The traditional all-dielectric reflective film is made of optical thickness λ 0 / 4(λ 0 is the incident light wavelength) hi...

AI Technical Summary

Problems solved by technology

[0004] The high-refractive index film layer and the low-refractive-index film layer of the traditional total dielectric reflective film are made of different materials, and the high-refractive index film layer and the low-refractive index film layer need to be plated separately, that is, different equipment is required to The high-refractive index film layer and the low-refractive index film layer are plated separately, so that the production process of the entire reflective film is discontinuous, and the production cost is high, it takes a long time, and it is difficult to produce a large area.

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