Nitride-based light emitting diode
A technology of light-emitting diodes and nitride systems, which is applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of limiting the luminous efficiency of light-emitting diodes, increasing the coupling of holes and electrons, and low recombination probability, so as to increase the internal quantum efficiency, Enhances the effects of implantation and diffusion, increasing the chance of recombination
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[0023] Preferred embodiments of the nitride-based light-emitting diode of the present invention will be described in more detail below with reference to the accompanying drawings.
[0024] like figure 1 As shown, a nitride-based light-emitting diode includes, from bottom to top:
[0025] (1) A substrate 100, the substrate is selected from sapphire (Al 2 o 3 ), SiC, Si or GaN, the preferred sapphire substrate in this embodiment;
[0026] (2) A buffer layer 101, the buffer layer is grown on the substrate 100 that has undergone high temperature treatment, and is a gallium nitride (GaN) and / or aluminum nitride (AlN) layer, and the growth temperature is 400~600°C , the film thickness is 5nm~50nm;
[0027] (3) An N-type GaN layer 102, the N-type GaN layer is grown on the buffer layer 101, the growth temperature is 1000-1200°C, the film thickness is 100 nm-1000 nm, and the doping concentration is 1×10 18 ~1×10 20 cm -3 , preferably 1 x 10 19 cm -3 , the dopant source is pr...
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