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Active matrix substrate manufacturing method and display device manufacturing method

A manufacturing method and active matrix technology, which are used in identification devices, semiconductor/solid-state device manufacturing, instruments, etc., can solve problems such as insulation damage of insulating layers, and achieve the effects of preventing light leakage, preventing short circuits, and avoiding the increase in the number of processes

Active Publication Date: 2016-09-07
SHARP KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, electrostatic discharge (Electro-Static Discharge; ESD) occurs between the wiring layers, thereby causing a problem of dielectric breakdown of the insulating layer covering the wiring layers.

Method used

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  • Active matrix substrate manufacturing method and display device manufacturing method
  • Active matrix substrate manufacturing method and display device manufacturing method
  • Active matrix substrate manufacturing method and display device manufacturing method

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Experimental program
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Embodiment Construction

[0044] Embodiments of the present invention will be described below based on the drawings. In addition, this invention is not limited to the following embodiment.

[0045] In this embodiment, a liquid crystal display device 1 will be described as an example of the display device of the present invention. Figure 5 It is a cross-sectional view showing a schematic configuration of the liquid crystal display device 1 . Image 6 It is an enlarged plan view showing a part of the TFT substrate.

[0046] Such as Figure 5As shown, the liquid crystal display device 1 includes: a TFT substrate 11 as a first substrate; an opposite substrate 12 as a second substrate, which is arranged opposite to the TFT substrate 11; and a liquid crystal layer 13, which is provided on the opposite substrate 12 and the TFT substrate. Between 11. The liquid crystal layer 13 is sealed between the TFT substrate 11 and the counter substrate 12 with a frame-shaped sealing member 14 .

[0047] Such as F...

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PUM

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Abstract

A gate line is formed on a pixel region, and a plurality of wiring layers are formed on a frame region. Next, a gate insulating layer and a semiconductor material layer are formed to cover the wiring layers and the gate line. Next, a first resist is formed to cover a portion of the semiconductor material layer over the pixel region, and second resists are formed to individually cover portions of the gate insulating layer between adjacent pairs of the wiring layers. Next, portions of the semiconductor material layer exposed from the first and second resists and are etched by dry etching to form semiconductor layers of semiconductor elements.

Description

technical field [0001] The present invention relates to a method of manufacturing an active matrix substrate and a method of manufacturing a display device. Background technique [0002] In recent years, thin display devices (flat panel displays) such as liquid crystal display devices have been widely used as display devices for electronic devices such as smartphones and tablet PCs. [0003] Such a display device includes a first substrate as an active matrix substrate and a second substrate facing the first substrate. For example, in a liquid crystal display device, a liquid crystal layer is provided between a first substrate and a second substrate. In addition, in the organic EL display device, a light emitting layer is provided between the first substrate and the second substrate. [0004] In addition, the above-mentioned display device includes: a frame area as a non-display area along outer edges of the first substrate and the second substrate; and a pixel area formed...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G09F9/30G02F1/1368G09F9/00H01L21/336H01L29/786
CPCG02F1/136204G02F1/136286G02F1/136295H01L27/124H01L27/1288H01L27/1244H01L27/1259H01L21/76837
Inventor 井上毅
Owner SHARP KK