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IF7-Derived iodine fluoride compound recovery method and recovery device

A recovery method and recovery device technology, applied in the direction of interhalogen compounds, chemical instruments and methods, chemical/physical processes, etc., can solve uneconomical problems and achieve high-efficiency recovery

Active Publication Date: 2015-02-11
CENT GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But since IF 7 and IF 5 Iodine and other fluorides are expensive materials, so it is not economical to use wet and dry detoxification devices to remove the exhaust gas after etching.

Method used

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  • IF7-Derived iodine fluoride compound recovery method and recovery device
  • IF7-Derived iodine fluoride compound recovery method and recovery device

Examples

Experimental program
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Effect test

Embodiment ）

[0039] Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited to the given examples. As an example, an example in which the present invention is applied to the exhaust gas of the dry etching process is shown, and the example in which the substance to be fluorinated in the reaction tube 1 is silicon (Si) is used as Examples 1 to 6, and activated aluminum (Al 2 o 3 ) Examples As Examples 7 to 12, iodine (I 2 ) as Examples 13 to 17, and examples using tungsten (W) are shown as Examples 18 to 22. Additionally, the use of iodine (I 2 ) and the temperature of the reaction tube is changed, as a comparative example, an example in which the reaction tube 1 is not provided and the collection device 5 is used is shown as comparative example 1 to comparative example 4.

Embodiment 1）

[0041] In Example 1, Si is filled in reaction tube 1, and IF 7 :IF 5 :N 2 The gas with a volume ratio of 50:10:40 was introduced at 100 sccm. The temperature of the reaction tube 1 is changed at 80°C, and the trapping device 5 traps IF at -50°C. 5 .

Embodiment 2）

[0043] As Example 2, IF was collected under the same conditions as in Example 1, except that the total flow rate of the introduced gas was set to 300 sccm. 5 .

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Abstract

An IF 7 -derived iodine fluoride compound recovery method includes putting gas containing IF 7 into contact with a material to be fluorinated, thereby converting the IF 7 into IF 5 ; and cooling gas containing the IF 5 , thereby trapping the IF 5 as an IF 7 -derived iodine fluoride compound. The recovered IF 5 may be reacted with fluorine to generate IF 7 , which may be reused for a semiconductor production process.

Description

technical field [0001] The present invention relates to a kind of iodine heptafluoride (IF 7 ) The recovery method of the iodine fluoride compound generated and the recovery device for realizing the method. In particular, the present invention relates to a method for the IF 7 A method for recovering generated iodine fluoride compounds and a recovery device for realizing the method. Background technique [0002] IF 7 It is a gas that is useful for etching in the semiconductor manufacturing process and cleaning in the atomic energy industry. For example, in Patent Document 1, it is described that IF 7 and IF 5 It is used as an etching and cleaning gas in the semiconductor manufacturing process. Usually when using IF 7 of the etch process, IF 7 The utilization efficiency of the IF is low, which is 5 to 20%, so most of the IF 7 is discharged as exhaust gas. However, if fluorides are directly discharged into the air, the discharged fluorides cause global warming. In ad...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/24
CPCB01J2219/24C01B7/24B01J19/2415
Inventor 菊池亚纪応涉仁纪
Owner CENT GLASS CO LTD