Heating device, reaction cavity, and plasma processing equipment

Abstract

The invention provides a heating device, a reaction cavity, and plasma processing equipment. The heating device comprises a plurality of separated sub-coils, an on-off switch, and an alternating current (AC) power supply. The plurality of sub-coils are arranged in different areas of the surface of a workpiece to be processed. The on-off switch is used to selectively connect one of the plurality of the sub-coils to the AC power supply, or selectively connect at least two of the plurality of the sub-coils in series to form a multi-turn coil and connect the multi-turn coil to the AC power supply electrically. The AC power supply is used to supply alternating current to the sub-coil, which is electrically connected to the AC power supply so that the sub-coil or multi-turn coil can heat the corresponding areas on the surface of the workpiece in an induction heating mode. The provided heating device can uniformly heat a workpiece through an induction heating mode, and thus the technological uniformity is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor processing, and in particular relates to a heating device, a reaction chamber and plasma processing equipment. Background technique [0002] Chemical vapor deposition (Chemical Vapor Deposition, referred to as CVD) technology is a technology that uses the interaction of different gases at high temperatures to prepare epitaxial thin film layers on the surface of the workpiece to be processed. During the process, it is not only necessary to heat the processed workpiece to the temperature required by the process, but also to ensure that the temperature of the processed workpiece is uniform to ensure the quality of the process. [0003] For this reason, resistance heating or infrared heating can be used to control the temperature of the processed workpiece in different regions to achieve uniform heating of the processed workpiece. Specifically, the surface of the workpiece to be processed is di...

AI Technical Summary

Problems solved by technology

However, in the process of heating different areas on the surface of the processed workpiece, there are often alternating magnetic fields generated by multiple induction coils 12 that will couple and interfere with each other, resulting in an impact on the zoned temperature control of the processed workpiece, so that it cannot Realize the uniform heating of the processed workpiece by induction heating

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