Focusing and leveling detection device and method for lithography equipment
A technology for focusing, leveling, and lithography equipment. It is applied in the direction of using optical devices, micro-lithography exposure equipment, and measurement devices. It can solve the problems of inability to directly measure the exposure field, difficult installation, and poor process adaptability.
Active Publication Date: 2017-08-29
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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These three sensors have their own advantages and disadvantages: the air pressure sensor can directly measure the physical surface of the silicon wafer, and is not affected by the photoresist and the surface material of the silicon wafer, but the air pressure is greatly affected by the environment, resulting in low accuracy, and the sensor distance The silicon wafer surface is close and cannot directly measure the exposure field; the capacitive sensor is relatively simple to implement, but it is greatly affected by the characteristics of the tested silicon wafer, and cannot directly measure the exposure field; the photoelectric triangulation sensor can measure the exposure field and has high detection accuracy , the main focus and leveling sensor at present, but the optical mechanism and control structure are complex, and the accuracy is greatly affected by the reflectivity of the silicon chip
[0004] Most of the focusing and leveling devices used in the prior art are photoelectric triangulation technology or mixed with pneumatic and capacitive methods. These measurement methods are limited by the characteristics of materials, environmental conditions, spatial structures, and spot inhomogeneity. Resulting in poor process adaptability
The focus and leveling device used in the prior art is limited by the space structure, which leads to the limitation of the optical design of the focus and leveling sensor, the limitation of the mechanical design, and the difficulty of installation.
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[0028] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0029] The principle of the confocal measurement device is to use different wavelengths of light to produce different focal depths after passing through a lens with a gradient refractive index (light of different wavelengths passes through the same lens with different refractive indices), that is, different wavelengths The focal length corresponding to the light is different, and the calculation formula for the relationship between the focal length and the wavelength is:
[0030]
[0031] In the formula, λ is the wavelength of light corresponding to focusing, F(λ) is the focal length corresponding to this wavelength, n(λ) is the refractive index corresponding to the lens of the measuring device at this wavelength, and R 1 , R 2 is the radius of curvature of both sides of the lens. The confocal measurement device is to use this principle t...
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The invention discloses a focusing and leveling system for photo-etching equipment. The system comprises a light source, a focusing and leveling detecting device, and a focusing and leveling control device. The light source is coupled to and goes into the focusing and leveling detection device through an optical fiber interface. The focusing and leveling detecting device is used to detect the perpendicular position and inclination of a detected object. The focusing and leveling control device is used to drive and control the perpendicular position and inclination of a device, which bears the detected object. The focusing and leveling detecting device is arranged in the lens barrel of a projecting object lens of photo-etching equipment.
Description
technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a focusing and leveling detection device and method for photolithography equipment. Background technique [0002] In recent years, with the continuous development of science and technology, especially semiconductor technology, the complexity and cost of silicon wafers have continued to increase, and the requirements for lithography technology have also continued to increase. The quality requirements have also been greatly improved, especially in the front-end lithography process lithography machines, the requirements for precision and exposure quality are getting higher and higher. [0003] There are mainly three kinds of existing focusing and leveling detection sensors: one is a pneumatic sensor; the other is a capacitive sensor, and the third is a photoelectric triangulation sensor. These three sensors have their own advantages and disadvantages: the a...
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IPC IPC(8): G03F7/20G03F9/00G01M11/02G01B11/26
Inventor唐平玉陈飞彪徐荣伟刁雷
OwnerSHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD