Real-time correction method for off-line measurement error of crystal matching angle

Abstract

The invention discloses a real-time correction method for an offline measurement error of a crystal matching angle. The real-time correction method comprises the following steps of monitoring an incident laser drift angle in a crystal matching angle measurement process by virtue of a laser autocollimator; if the laser drift angle is greater than a preset threshold 0.4'', rejecting measurement data that the angle drift is over large; monitoring a rotating angle deviation of to-be-measured crystal in the crystal measurement process by virtue of the autocollimator; plugging the reserved rotating angle deviation into matching angle calculation. The real-time correction method has the significant effects that a light path standard offset and an optical angle drift are subjected to real-time correction through the autocollimator in the measurement process, and a dynamic error in the crystal matching angle measurement process is corrected, so that the condition that correction can only be carried out aiming at the standard static error in the past is changed; the measurement accuracy of the crystal matching angle is ensured; the dynamic measurement error in a large-aperture crystal offline measurement system can be removed to the maximal extent.

Description

technical field [0001] The invention relates to the technical field of optical engineering, in particular to a real-time correction method for off-line measurement errors of crystal matching angles. Background technique [0002] At present, in the solid-state high-power laser system, because the best matching angle of the KDP crystal is related to the cutting process of the crystal optical axis, the surface shape of the crystal, and the inhomogeneity of the refractive index, it has become the most accurate and fast measurement. Hot-spot problem in best matching angle test. [0003] There are always two errors in the off-line system measurement of large aperture crystal matching angle, namely the crystal motion displacement error and the incident laser angle drift measurement error. The existence of these two errors seriously affects the accuracy of the measurement results. [0004] However, domestic corrections of large-aperture crystal matching angle off-line measurement e...

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Problems solved by technology

[0003] There are always two errors in the off-line system measurement process of large-aperture crystal matching angle, namely, the crystal motion displacement error and the incident laser angle drift measurement error. The existence of these two errors seriously affects the accuracy of the measurement results.

[0004] However, domestic corrections of large-aperture crystal matching angle off-line measurement errors mainly focus on static factors such as laser alignment and correction of crystal surface shape influence factors, but in the measurement process, the influence factors such as motion displacement error and real-time laser angular drift are not. There is no relevant effective treatment method

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