Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Cobalt diselenide material having micro/nano three-dimensional multilevel structure as well as preparation method and application thereof

A micro-nano structure, three-dimensional technology, applied in the direction of binary selenium/telluride compound, metal selenide/telluride, nanotechnology, etc., can solve the problems of immature structure control and application potential to be further developed, and achieve excellent microwave performance , small particle size and shape anisotropy, the effect of increasing the imaginary part and dielectric loss

Inactive Publication Date: 2015-04-08
FUDAN UNIV
View PDF5 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are relatively few reports on cobalt diselenide nanocrystals in the literature, and nanosheet, cubic and rod-shaped CoSe 2 , but the structural control is not yet mature, and the application potential needs to be further developed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cobalt diselenide material having micro/nano three-dimensional multilevel structure as well as preparation method and application thereof
  • Cobalt diselenide material having micro/nano three-dimensional multilevel structure as well as preparation method and application thereof
  • Cobalt diselenide material having micro/nano three-dimensional multilevel structure as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] CoSe 2 The three-dimensional hierarchical structure is prepared by solvothermal method:

[0030] (1) First, at room temperature, 0.22–0.28 g of cobalt acetate tetrahydrate Co(CH 3 COO) 2 4H 2 O and 0.53~0.57 g cetyltrimethylammonium bromide (CTAB) were added to 11±0.5 mL of deionized water, and stirred at 40~50 °C for about 30 min until completely dissolved; then, 26±0.5 Pour 0.11-0.12 g of cobalt diselenide (SeO 2 ) was dissolved in 2±0.2 mL of deionized water, slowly added dropwise to the mixed solution, and the dropping speed was controlled at 8-15 seconds / drop; In the kettle, heat to 160~200 ℃, and react for 16±0.5 h. The reaction temperature is different, the obtained CoSe 2 The specific surface area and micro-nano structure and size are different.

[0031] (2) Purification and post-treatment of the product: After the hydrothermal kettle is cooled, the black CoSe 2 The product was separated by centrifugation, and then washed several times (3-5 times) with d...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the field of nano-functional materials and particularly relates to a cobalt diselenide material having a micro / nano three-dimensional multilevel structure as well as a preparation method and an application thereof. By the controllable synthesis of dual surfactants, a cobalt diselenide material having a three-dimensional nanometer multilevel structure is obtained and the three-dimensional multilevel structure has higher specific surface area and exhibits excellent microwave absorption property. The maximum reflection loss of the cobalt diselenide three-dimensional multi-level structure reaches -26.93 dB at 7.28 GHz. In addition, the microwave-absorbing material is low in preparation cost and high in efficiency, is convenient to industrially scale to solve practical application problems, is used as a novel microwave-absorbing material widely used for electromagnetic shielding and microwave absorption and has broad application prospects.

Description

technical field [0001] The invention belongs to the technical field of nanometer functional materials, and in particular relates to a cobalt diselenide micro / nano multilevel structure and a preparation method thereof, and its application in microwave absorption and electromagnetic shielding. Background technique [0002] With the rapid development of electronic technology, the electromagnetic radiation in people's lives is increasing. At the same time, in order to meet the needs of modern warfare, stealth materials will be widely used in weapons. Research on materials with the ability to absorb electromagnetic waves has urgent practical value. The so-called absorbing material refers to the material that can absorb and convert most of the electromagnetic waves projected on its surface into other forms of energy, mainly heat energy and almost no reflection. [1] . The shape and structure of the material have a great influence on its microwave-absorbing performance. It is gener...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C01B19/04B82Y30/00H05K9/00
CPCC01B19/007C01P2002/70C01P2002/72C01P2002/85C01P2004/03C01P2004/04C01P2006/90H05K9/0081
Inventor 张捷车仁超
Owner FUDAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com