Proximity gap exposure workpiece table of a lithography machine

Abstract

The invention discloses a proximity-type interval exposure workpiece table of a photoetching machine. The workpiece table is used for realizing proximity exposure of a sample wafer and a mask plate in the photoetching machine. The workpiece table takes a mask holder and a mask plate as horizontal reference, and a three-point elastic support mechanism, a wafer chuck and a substrate lifter are driven by a lifting driving mechanism; after the three automatic-protruding equal-diameter steel balls are matched with a standard mask plate and leveled, the three-point elastic support mechanism is locked by a pneumatic control mechanism, and meanwhile the lifting driving mechanism stops ascending, so as to keep the sample wafer parallel to the mask plate; then the lifting driving mechanism stops moving after descending to a certain specific distance, the three steel balls contract and return, and finally the lifting driving mechanism moves upward again until the interval between the sample wafer and the mask plate reaches a certain required value, and the proximity-type interval exposure of the sample wafer and the mask plate is realized. The workpiece table is capable of automatically finishing the leveling of sample wafer and the mask plate and keeping a certain exposure interval, and the service life of the mask plate is prolonged.

Description

technical field [0001] The invention relates to the technical field of special equipment for microelectronics, in particular to a proximity gap exposure workpiece table of a photolithography machine. Background technique [0002] In contact lithography equipment, the mask plate is directly in contact with the photoresist layer, and the resolution of the exposed pattern is equivalent to that of the pattern on the mask plate. The equipment is simple, and the closer the contact, the higher the resolution. However, since the contact between the mask and the glued substrate is easy to damage the mask, the service life of the mask is short (only 5 to 25 times). And lead to accumulated defects in the exposure pattern. In addition, the closer the contact, the greater the damage to the mask and material. Contents of the invention [0003] In order to avoid damage to the mask caused by direct contact between the sample and the mask, to achieve a long service life of the mask and l...

AI Technical Summary

Problems solved by technology

However, due to the contact between the mask and the glue-coated substrate, the mask plate is easily damaged, resulting in a short service life of the mask plate (only 5 to 25 times can be used).

and lead to accumulated defects in exposure pattern

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