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A multi-tilt angle composite multilayer Laue lens and its design method

A composite multi-layer film and Laue lens technology, applied in hard X-ray nano-focusing optical components and their design, in the field of multi-layer film Laue lenses, can solve the problems of difficult WedgeMLL plating process, low diffraction limit focusing efficiency, etc.

Inactive Publication Date: 2017-02-22
INST OF HIGH ENERGY PHYSICS CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to propose a new MLL structure - multi-tilt angle composite MLL, to solve the problems of low efficiency and difficult Wedge MLL plating process when TiltedMLL realizes diffraction-limited focusing

Method used

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  • A multi-tilt angle composite multilayer Laue lens and its design method
  • A multi-tilt angle composite multilayer Laue lens and its design method
  • A multi-tilt angle composite multilayer Laue lens and its design method

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Embodiment

[0032] 1. Assume that the incident X-ray energy is 12.0keV, and the required diffraction-limited focusing resolution is 10nm. According to the coating ability, the focal length f is selected as 4mm. At this time, the total thickness of the coating is about 41.3 microns; according to the coating accuracy and working distance , the outermost film thickness is selected as 4nm, its film number is 6458, the innermost film thickness is 20nm, the film number is 258, and the total film number N is 6200 layers.

[0033] 2. Using TTD to calculate the diffraction efficiency of Wedge MLL at different depths, the best depth value is about 12 microns. Its diffraction efficiency distribution is as follows figure 2 As shown, the total efficiency is about 47.06%, and the intensity distribution near the focus is as image 3 As shown, the light intensity distribution curve on the best focal plane is as follows Figure 4 As shown, the strongest peak is around 1944.

[0034] 3. Calculate the t...

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Abstract

The invention discloses a multi-inclination-angle composite multi-film Laue lens. The lens comprises m inclined multi-film Laue lens bodies arranged in the direction perpendicular to incident light. The included angles between all film layers in each inclined multi-film Laue lens body and the incident light are equal. The multi-inclination-angle composite multi-film Laue lens can achieve diffraction limit focusing. M is larger than two. The thickness of the film layers of the inclined multi-film Laue lens body close to the central area is large, and the included angle between the film layers of the inclined multi-film Laue lens body and the incident light is small. The thickness of the film layers of the inclined multi-film Laue lens body close to the outer area is small, and the included angle between the film layers of the inclined multi-film Laue lens body and the incident light is large. The multi-inclination-angle composite multi-film Laue lens has the focusing performance close to that of Wedge MLL, and processing and implementation are easy.

Description

technical field [0001] The invention relates to a hard X-ray nano-focusing optical element and a design method thereof, in particular to a multilayer Laue lens, belonging to the fields of synchrotron radiation beamline engineering and synchrotron radiation optics Background technique [0002] The third-generation synchrotron radiation has the characteristics of high brightness and high collimation, and the unique properties of hard X-rays, such as strong penetrating ability, sensitivity to structural information and chemical information, insensitivity to electromagnetic fields, etc. , making hard X-ray microscopes widely used in many fields such as materials science, medicine, biology and environmental science. The performance of an X-ray microscope depends on the intensity and size of the focused spot. So far, a variety of focusing optics using reflection, refraction, and diffraction have been able to focus hard X-rays down to the order of tens of nanometers. Among these ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21K1/06
CPCG21K1/062G21K1/065
Inventor 周亮岳帅鹏常广才李明刘鹏
Owner INST OF HIGH ENERGY PHYSICS CHINESE ACAD OF SCI