20 results about "Beamline" patented technology

This invention provides a gas cluster ion beam apparatus capable of planarizing a material substrate by irradiating it with a neutral beam. A neutral gas introduction device (26) is provided for a vacuum container (2). By introducing neutral gas from the neutral gas introduction device (26), the gas cluster ion beam (11) traveling along the beamline in the beam delivery system (BT) collides with the neutral gas, undergoing dissociation and neutralization to form a high-energy neutral beam (25). Furthermore, a reflective electrode (28) is provided between an electrostatic lens (9b) and the material substrate (15), and a high voltage equal to the accelerating voltage is applied to the reflective electrode.

The application belongs to the technical field of space particle environment simulation, and provides a space particle environment simulation system and method.The system comprises a vacuum cabin body, a multi-beam line incidence unit connected with the vacuum cabin body, a first beam line incidence unit, a second beam line incidence unit, the first beam line incidence unit comprising a first adjusting support assembly and a first beam line incidence cone, the second beam line incidence unit comprising a second adjusting support assembly and a second beam line incidence cone, and a control device used for determining correction amounts of an incidence point of the simulated proton beam line and an incidence point of the simulated electron beam line in a vacuum extraction process of the vacuum cabin body, and correcting positions of the first incidence point of the simulated proton beam line and the second incidence point of the simulated electron beam line by moving operations of the first adjusting support assembly and the second adjusting support assembly.The application improves the convergence accuracy of multiple simulated beam lines and the automatic correction process of the incidence points of the simulated beam lines.

A component analysis method and system. A sample is excited by a synchrotron radiation beamline to obtain sample charged ions; the sample charged ions are accelerated by an acceleration orbit to obtain sample to-be-tested waves; and the components of the to-be-tested sample are determined by analyzing the sample to-be-tested waves. The synchrotron radiation beamline has the characteristics of high intensity, high collimation, high monochromaticity, wide energy spectrum coverage and high polarization, and the trace and ultratrace components can be accurately detected by exciting the to-be-tested sample by the synchrotron radiation beamline, the detection limit can be reduced to the ppb level or even the ppt level, the high purity requirement of high-end semiconductor materials on materials can be met, and the synchrotron radiation beamline can be used for material component analysis, the sample loss can be avoided, the real component distribution can be restored, the synchronous detection of multi-element complex components can be realized, and the full component detection of matrix elements, doped elements and trace elements in the material can be realized synchronously.

The application relates to the technical field of beam wire machines, and discloses a pay-off rack with a shaft coupling device, which comprises a shaft coupling device and a wire reel; the shaft coupling device comprises a pair of shaft coupling units oppositely arranged along the axial direction; the shaft coupling unit comprises a fixing block, a transmission shaft, a first transmission housing, a second transmission housing, a rotating shaft, a clamping assembly and a driving assembly; the transmission shaft is arranged in the first transmission housing and connected with the driving assembly; the second transmission housing is arranged outside the first transmission housing, and a first rotating supporting structure is arranged between the first transmission housing and the second transmission housing; the rotating shaft is arranged on the second transmission housing; the clamping assembly is arranged at the other end of the transmission shaft and connected with the transmission shaft; one end of the wire reel is connected with the rotating shaft, the other end is connected with the clamping assembly, and the wire reel is arranged outside the second transmission housing. The application reduces the swing and deviation of the rotating shaft and improves the stability of the pay-off process.

An ion implantation system comprises an ion source that generates ions and forms an ion beam along a beamline, and a mass spectrometer located downstream of the ion source that generates a magnetic field according to a selected charge-to-mass ratio. The beamline formed by the ion beam is directed toward a workpiece target. A gating device comprises one or more of: a mechanical gating device configured to block or deflect the ion beam from contacting the workpiece target; or a power-controlled gating device configured to cut off power to the ion source. A beam-to-workpiece target shift mechanism changes the beam-to-workpiece target position while the ion beam is gated by the gating device. A method for implanting ions onto a workpiece with a predetermined profile in multiple scans is disclosed. Such a system and method enable an implantation profile having smooth curvature and / or sharp differences in implantation volume characteristics at adjacent locations.

The present application relates to a kind of multi-head radiotherapy device, belong to radiotherapy technical field, including particle source, beam splitting element, deflection element and multiple independent head, particle source is used to generate charged particle beam pulse, charged particle beam pulse is cut into multiple sub-pulse of different transmission direction by beam splitting element, the transmission direction of sub-pulse is deflected again by deflection element, after deflection sub-pulse is injected into head by transmission beam line, multiple head is located and different, it is irradiated to tumor from different directions, the present application can complete the irradiation of multiple beams to tumor target area simultaneously in very short time, shorten the entire radiotherapy time, at the same time, it can be conformal to target area without rotating head, save time and cost, novel structure.

A mobile detection system that follows the high energy beamline during a tuning phase / startup phase of an ion implantation system or otherwise having a passive mobile monitoring system around the ion implantation system can identify radiation conditions that stationary detection systems outside or even inside the system may have missed or poorly reported data on. A mobile detection system that can move a radiation detector to pinpoint location near the ion implantation system or wafer cassette and take detailed data readings very near the source will provide enhanced abilities to determine radiation conditions and appropriately determine shutdown and cooldown times, thereby improving efficient use of the system.

A beamline ion implanter is disclosed. The beamline ion implanter generates an upwardly oriented ion beam that is used to impact a workpiece. In some embodiments, a deflector that uses magnets or biased electrodes is used to deflect the ion beam from a substantially horizontal plane to the upward orientation. In other embodiments, the beamline ion implanter is designed so that the ion beam travels substantially within a vertical plane through its entire path from the ion source to the workpiece. The workpiece is mounted on a hollow workpiece holder so that the upwardly oriented ion beam strikes the side of the workpiece that is resting on the workpiece holder.

This invention relates to a compact, multi-chamber, multi-angle ion therapy device, comprising a dual-rotating gantry beam distribution system, including a coaxially arranged front rotating gantry and a rear rotating gantry. A front rotating beamline is mounted on the front rotating gantry, and a rear rotating beamline is mounted on the rear rotating gantry. The rear rotating beamline includes two integrated but independently distributed L-shaped and U-shaped rotating beamlines, with the U-shaped beamline forming a spatial confocal relationship with the front rotating beamline. A first row of treatment chambers includes several treatment chambers evenly arranged along the circumferential direction of the front rotating beamline, each treatment chamber having an X-ray aperture. A second row of treatment chambers also includes several treatment chambers evenly arranged along the circumferential direction of the L-shaped rotating beamline, each treatment chamber having an X-ray aperture. Several treatment heads are also included, each corresponding to a treatment chamber in the first row and a treatment chamber in the second row.

This invention proposes a bistatic forward-looking SAR target localization method, the implementation steps of which are: initializing the bistatic forward-looking SAR target localization scene; calculating the slant range between the receiver and the scene center, as well as the precise position of the scene center; and obtaining the target localization result. This invention decouples the bistatic slant range by establishing a system of equations based on the triangle formed by the receiver's slant range relative to the scene center at adjacent synthetic aperture center times and the flight trajectory within the synthetic aperture time interval, and the triangle formed by the transmitter's slant range relative to the scene center at the previous synthetic aperture center time, its projection, and the transmitter's height. This allows for the acquisition of the receiver's slant range relative to the scene center at the next synthetic aperture center time, avoiding the defect of amplified beamline angle error due to sine calculations, thus improving localization accuracy. Furthermore, the data used to calculate the transmitter's slant range relative to the scene center can be directly obtained from the constructed localization scene, without the need for beamline angle calculations, thus possessing universality and broadening the application scope.

The utility model relates to computer beam line technical field, and disclose a kind of computer beam line device, including annular frame, beam seat and locking assembly, the outside of annular frame is movably sleeved with rotary seat, adjusting assembly is equipped between rotary seat and annular frame, the top of rotary seat is fixedly connected with fixed frame by bolt, the top of fixed frame is fixedly connected with beam seat, the top of beam seat is fixedly connected with cover plate by bolt, the utility model adopts the structure that T type movable block with spring cooperates with rubber elastic block, and it can be adaptive different diameter cable combination, ensure that the stress of multiple wire harness is uniform, avoid local overtightening or slackening;Unique rotary seat and annular frame cooperate design, cooperate 12 degree block structure, can realize 30 ° as unit's quick flexible angle adjustment, satisfy multi-angle wiring requirement, magnetic attraction type buckle design makes adjustment process more convenient and stable, easy and fast operation, improve computer wiring and maintenance efficiency.

The application discloses a device for measuring orbital angular momentum of vortex particles based on a gradient magnetic field, which is integrated in a beamline system of a particle accelerator or an electron microscope and used for measuring the orbital angular momentum of a vortex particle beam in real time. The device comprises a vortex particle source, a gradient magnetic field device, a detection system and a processing system. The vortex particle source is used for providing a vortex particle beam. The gradient magnetic field device is used for exerting a transverse deflection force related to the orbital angular momentum on the vortex particle beam. The detection system is used for receiving the particle beam after a certain longitudinal movement and obtaining an intensity distribution image of the particle beam. The processing system is used for calculating the orbital angular momentum of the vortex particle beam according to the intensity distribution image and magnetic field gradient parameters. The device for measuring the orbital angular momentum of vortex particles based on the gradient magnetic field has the characteristics of simple structure, fast response and integration in the beamline system, and is suitable for various equipment environments such as particle accelerators, electron microscopes and the like.

The application discloses a high-energy outgoing electron protection device for a neutral beam injection negative ion source, belongs to the field of the neutral beam injection negative ion source of magnetic confinement nuclear fusion, and mainly comprises a protection plate, a supporting base, a thermocouple and an infrared thermal imager. The protection plate is used for intercepting high-energy outgoing electrons. The supporting base is used for mounting and positioning the protection plate in a beam line vacuum chamber. The thermocouple is used for realizing real-time monitoring of the local temperature of the protection plate. The infrared thermal imager is used for observing a large-area heat source of the protection plate and determining the heat deposition position distribution of the high-energy outgoing electrons. The application realizes protection of heat load sensitive components such as a cryogenic pump by intercepting the high-energy outgoing electron beam and monitoring the deposition position of the high-energy outgoing electron beam, promotes the performance improvement and scheme perfection of an electron suppression means, is favorable for long-pulse stable operation of the negative ion source, and can effectively protect the high-energy outgoing electron in the neutral beam injection negative ion source.

The present invention provides a gas cluster ion beam apparatus capable of achieving flat processing by irradiating a material substrate with a neutral beam. The neutralizing gas introducing device 26 is provided for a vacuum vessel 2. By introducing a neutralizing gas from the neutralizing gas introducing device 26, the gas cluster ion beam 11 traveling along the beamline in the beam transport system BT collides with the neutralizing gas, undergoing dissociation and neutralization to form a high-energy neutral beam 25. Furthermore, a reflecting electrode 28 to which a high voltage equivalent to the acceleration voltage is applied is provided between the electrostatic lens 9b and the material substrate 15.

This utility model discloses a beamforming mechanism for a single-frequency fiber laser, including a fiber laser body, an interface on the side wall of the fiber laser body, and an optical cable connected to the interface. A support plate is detachably mounted on the top of the fiber laser body, and multiple circumferentially distributed positioning pins are fixedly connected to the top of the support plate. The optical cable is wound around the positioning pins, and a clamping component for limiting the optical cable is provided above the support plate. In this utility model, excess optical cable is wound around the outside of the positioning pins, and then the clamping component limits and clamps the optical cable. An elastic locking component then locks the clamping component, ultimately achieving beamforming of the optical cable. This prevents excessive bending of the optical cable due to haphazard winding, folding, or external pressure; it also solves the problem of joints loosening due to frequent shaking caused by external vibration and tension.

A beamline ion implanter is disclosed. The beamline ion implanter generates an upwardly oriented ion beam that is used to impact a workpiece. In some embodiments, a deflector that uses magnets or biased electrodes is used to deflect the ion beam from a substantially horizontal plane to the upward orientation. In other embodiments, the beamline ion implanter is designed so that the ion beam travels substantially within a vertical plane through its entire path from the ion source to the workpiece. The workpiece is mounted on a hollow workpiece holder so that the upwardly oriented ion beam strikes the side of the workpiece that is resting on the workpiece holder.

The invention relates to a beam line for a laser beam of a thermal laser evaporation (TLE) system. The beam line extends between a source end of the beam line and a chamber end of the beam line. The source end is connectable to a laser source and the chamber end is connectable to a reaction chamber of the TLE system.

This invention relates to a characterization method for air electrodes in solid oxide fuel cells / electrolytes. The cross-section of the air electrode is divided into multiple test sites from the electrode / electrolyte interface to the surface. K-edge near-edge absorption spectra of active site elements at each test site are collected using a synchrotron radiation micro-area beamline. By comparing the absorption spectrum characteristics under different operating conditions, the changes in elemental valence states and the degree of electrode attenuation are determined. This method, through gradient site division combined with micro-area testing, achieves quantitative determination of valence state changes of active site elements. Starting from the intrinsic fundamental factors of electrode attenuation, it overcomes the limitation of existing technologies that can only obtain superficial information. It can accurately capture the valence state gradient change law in the electrode thickness direction, clearly distinguish the electrode influence mechanism of different operating modes, and achieve accurate characterization of electrode attenuation. This provides a direct and effective theoretical basis and technical support for the material optimization and structural design of air electrodes.

A target carrier assembly includes a housing, a target, and a collimator. The housing includes a collimator compartment and a target compartment divided by a vacuum window foil, the collimator being removably disposed within the collimator compartment, and the target being disposed within the target compartment. The collimator compartment is attached to a cyclotron beam line in the irradiation position, and the target compartment is in fluid communication with a cooling fluid supply line and a cooling fluid return line in the irradiation position. The target is cooled by the cooling fluid from the cooling fluid supply line. The collimator directs a particle beam from the cyclotron beam line to irradiate the target and includes a beam entry diameter and a beam exit diameter. The collimator is in thermal contact with the collimator compartment.

This invention proposes a high-frequency transformer winding structure for a photonic crystal beamline, relating to the field of transformers. It includes an E-type iron core, with multiple pins A and B mounted on its upper surface. Connecting plates are mounted on the outer surfaces of pins A and B. Each connecting plate has multiple wire holes on its outer surface and multiple tightening screws on its upper surface. The interior of each wire hole communicates with the bottom of the tightening screw. A washer is mounted on the bottom surface of each fixing foot. This invention provides a regular wire connection path through the connecting plates and wire holes. The tightening screws securely fix the wires, reducing poor contact due to loosening and lowering connection losses. The sealing plates and fixing feet on the bottom surface of the E-type iron core, along with the washer, make it easier and more stable to fix the transformer to equipment or circuit boards during installation. The washer also provides cushioning and anti-slip properties.