166 results about "Beamline" patented technology

The invention relates to the field of medical equipment, and provides a compact multi-chamber proton treatment system based on a shared beam line, and the system comprises a fixed beam transmission line which is used for guiding the movement direction of a proton beam into a vertical direction; the rotating beam transmission line is used for guiding the movement direction of the proton beam into the horizontal direction; one end of the fixed beam transmission line is connected with the proton cyclotron, the other end of the fixed beam transmission line is connected with one end of the rotary beam transmission line, and the other end of the rotary beam transmission line is in butt joint with a plurality of treatment rooms; the rotating beam transmission line rotates around a central axis extending in the vertical direction. According to the invention, the proton beam can be safely, efficiently and accurately transmitted to each treatment room, and a fixed beam transmission system and a rotating rack do not need to be independently arranged for each treatment room, so that the beam control assembly and the system occupied area of the multi-room particle treatment device are minimized, and the number of treated patients can be remarkably increased.

An ion implantation system includes an ion source, a beamline that extracts and shapes an ion beam from the ion source, a deceleration stage that reduces the energy of the ion beam while focusing the ion beam in the direction of a workpiece. A workpiece support has a structure that determines an implant plane position, which is the position of a workpiece surface that receives the ion beam. The workpiece support is configured to translate the implant plane along a path of the ion beam so as to shorten or lengthen the path without changing the tilt angle of the workpiece. The beam optics may be fixed and the focal point of the ion beam may be allowed to vary with a decel ratio. The workpiece support may translate the implant plane to a focal point of the ion beam or to some fixed offset from that focal point.

A linear accelerator apparatus may include a beamline enclosure that defines a polygonal backbone, and a plurality of acceleration stages, disposed along a length of the beamline enclosure. A given acceleration stage may include a drift tube assembly to conduct an ion beam therethrough, a resonator, coupled to deliver an RF signal to the drift tube assembly, and a quadrupole assembly to shape the ion beam. As such, at a first acceleration stage, a first resonator may be disposed along a first side of the polygonal backbone, and at a second acceleration stage, adjacent to and downstream of the first acceleration stage, a second resonator may be disposed along a second side of the polygonal backbone, different from the first side.

The invention relates to the application field of a negative neutral beam ion source system in a magnetic confinement nuclear fusion Tokamak device, in particular to a supporting and adjusting structure and method for a beam source of a negative neutral beam system in a fusion device. According to the technical scheme, the device comprises a beam source device and a stainless steel flat plate base located below the beam source device, and further comprises a welding corrugated pipe which is fixedly installed at one end of the beam source device and used for connecting the beam source device with a bunching vacuum chamber. The beam source three-dimensional space adjusting function is achieved through the characteristic that the welding corrugated pipe is small in rigidity, the position of the beam source can be accurately adjusted through the three-dimensional jacking jack, and therefore the position of a beam spot of a beam can be accurately adjusted, the anion beam spot can be kept at the center of a target, and the problem that the beam spot of an ion beam in a negative neutral beam system in a fusion device is difficult to adjust is solved. And an acting point is provided for the three-dimensional jacking jack through the arc-shaped supporting piece, stress concentration is reduced, point discharge is prevented, and safety in the high-voltage environment is guaranteed.

An exemplary system includes a gantry including a beamline structure configured to direct a particle beam from an output of a particle accelerator toward an irradiation target at a treatment location, the beamline structure including a magnetic bending element for bending the particle beam along at least a portion of a length of the beamline structure, and a mount on which at least a portion of the beamline structure is held configured to enable translational movement of at least a portion of the beamline structure relative to the irradiation target.

A method for measuring the liquid level at a container outlet connection located on the outlet side of a container includes orienting an incident beam through a container connection located on the upper head of the container on the side opposite to the outlet side of the container such that the incident beam line forms an acute angle with the longitudinal axis of the container outlet connection. An apparatus for implementing this method is configured such that the incident beam line pivots ±30 degrees from the longitudinal axis of the container connection and the incident beam line rotates about the longitudinal axis of the container connection.

This invention provides a gas cluster ion beam apparatus capable of planarizing a material substrate by irradiating it with a neutral beam. A neutral gas introduction device (26) is provided for a vacuum container (2). By introducing neutral gas from the neutral gas introduction device (26), the gas cluster ion beam (11) traveling along the beamline in the beam delivery system (BT) collides with the neutral gas, undergoing dissociation and neutralization to form a high-energy neutral beam (25). Furthermore, a reflective electrode (28) is provided between an electrostatic lens (9b) and the material substrate (15), and a high voltage equal to the accelerating voltage is applied to the reflective electrode.

The application belongs to the technical field of space particle environment simulation, and provides a space particle environment simulation system and method.The system comprises a vacuum cabin body, a multi-beam line incidence unit connected with the vacuum cabin body, a first beam line incidence unit, a second beam line incidence unit, the first beam line incidence unit comprising a first adjusting support assembly and a first beam line incidence cone, the second beam line incidence unit comprising a second adjusting support assembly and a second beam line incidence cone, and a control device used for determining correction amounts of an incidence point of the simulated proton beam line and an incidence point of the simulated electron beam line in a vacuum extraction process of the vacuum cabin body, and correcting positions of the first incidence point of the simulated proton beam line and the second incidence point of the simulated electron beam line by moving operations of the first adjusting support assembly and the second adjusting support assembly.The application improves the convergence accuracy of multiple simulated beam lines and the automatic correction process of the incidence points of the simulated beam lines.

A system and method for producing radioisotopes such as molybdenum-99. The system comprises a first accelerator, a second accelerator, a first beamline, a second beamline, and a target. Using a pair of accelerators, beamlines are preferably fired at a target from opposite directions, thereby irradiating the target from both sides. The system can further comprise a target cooling system utilizing gaseous helium, a modular local target shielding comprised of boxes of either metal shot with liquid coolant or steel with concrete, and a hot cell for loading and unloading target disks.

To provide a method and an apparatus for controlling beam current in an ion implantation process, which reduce the amount of "tune" time employed for such a calibration process using a uniform current density across the wafer surface.SOLUTION: A method includes receiving a spot beam profile (SpotBP) for the spot ion beam, receiving a linear scanned beam profile (ScannedBP) for the spot ion beam, generating a calculated calibration spot profile on the basis of the spot beam profile and the linear scanned beam profile, and implementing an adjusted scanned profile for the spot ion beam on the basis of the calculated calibration spot profile.SELECTED DRAWING: Figure 10

The present invention discloses a serial crystallography experimental device based on conveyor belt technology. The device comprises a goniometer head, a base film, and a crystallization plate storage tray. The bottom end of the goniometer head is provided with a goniometer head groove for coupling with the goniometer head base on a synchrotron beamline station. The top end of the goniometer head is provided with two goniometer head support rods for coupling with bearing short rods, and a goniometer head waste liquid tank for collecting waste liquid after X-ray irradiation. The base film is coupled to the crystallization plate storage tray for supporting and flipping the crystallization plate storage tray. During the experiment, the crystallization plate storage tray, equipped with a sitting drop in situ crystallization plate, is coupled to the base film. The low background scattering film on the back of the sitting drop in situ crystallization plate is connected to the bearing short rod via an adhesive film to form a conveyor belt film. Driven by a motor, the bearing short rod tears off the conveyor belt film during sample delivery to the goniometer head and performs diffraction data acquisition. Waste sample droplets are squeezed out and flow down the goniometer head support rods into the waste liquid tank.

The present invention relates to a beam distribution system and irradiation terminal based on multi-angle irradiation, wherein the beam distribution system comprises: a fixed beam line and a rotating beam line, both of which are fixed on a rotating frame; the rotating beam line comprises a rotating section single dipole magnet, a horizontal beam line and a plurality of inclined beam lines at a certain angle to the ground, the horizontal beam line and the plurality of inclined beam lines are branches of the fixed beam line, the beam pre-separated by the rotating section single dipole magnet enters the horizontal beam line or the plurality of inclined beam lines, and the rotating section single dipole magnet is electrically connected to a variable pre-excitation full energy storage power supply. The system adopts a one-to-many solution, that is, only one beam line is required for one irradiation direction, and a plurality of beam distribution lines are used to form multi-angle irradiation, and the beam splitting direction is controlled by a single dipole magnet. At the same time, a rotation point is designed in front of the dipole magnet, and the beam line is rotated to form a multi-terminal layout without adding other beam lines, and finally a layout of multi-irradiation terminals and single-terminal multi-angle irradiation is realized.

A method includes receiving a spot beam profile is received for a spot ion beam; receiving a linear scanned beam profile for the spot ion beam; generating a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile; and implementing an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile.

The utility model relates to the technical field of server cabinets, in particular to a wire arranging device which comprises cabinet side plates, sliding rails are fixedly installed on the inner side faces of the two cabinet side plates, and a server and a movable limiting plate are installed between the two sliding rails in a sliding mode. A fixed limiting plate is fixedly connected between the tail ends of the inner side surfaces of the two cabinet side plates, and a bunching mechanism is arranged between the fixed limiting plate and the movable limiting plate; a plurality of groups of fixing assemblies are arranged in the bunching mechanism; according to the utility model, through the arrangement of the bunching mechanism, the movable limiting plate and the fixed limiting plate, the length of the cable can be adjusted without dismounting the cable during the wiring detection of the server, and meanwhile, the plurality of cables are always kept in an orderly installation and connection state, so that the cables are prevented from being bent and pressed to be damaged; and the convenience of server detection work is improved.

This invention discloses a highly stable, ultra-fast switching white light shutter device. The invention includes a motion mechanism, a vacuum chamber, an adjustable base, and a support. The adjustable base is used for elevation adjustment and leveling of the motion mechanism and the vacuum chamber. The motion mechanism includes a drive assembly, a shutter switching assembly, and multiple spring-loaded fine-tuning assemblies. The shutter switching assembly is mounted directly above the drive assembly, and the spring-loaded fine-tuning assemblies are symmetrically arranged on both sides of the drive assembly. The upper end of each spring-loaded fine-tuning assembly is connected to the drive assembly, and the lower end is connected to the adjustable base. The shutter switching assembly is sealed to the vacuum chamber, and the absorber of the shutter switching assembly is located inside the vacuum chamber. The drive assembly drives the absorber to reciprocate vertically within the vacuum chamber, controlling the switching between on and off light. The spring-loaded fine-tuning assemblies are used to balance the vacuum suction force generated by the vacuum chamber on the drive assembly, thereby reducing the load on the drive assembly. This invention significantly improves the stability of equipment operating on the beamline.

The present invention relates to a beamline (10) for a laser beam (220) of a thermal laser evaporation (TLE) system (300), the beamline (10) extending between a source end (20) of the beamline (10) and a chamber end (30) of the beamline (10), such that the source end (20) is connectable to a laser light source (210) and the chamber end (30) is connectable to a reaction chamber (310) of the TLE system (300), the beamline (10) including one or more laser beam sources (210) for modifying and / or controlling the characteristics of the laser beam (220). and / or one or more linear guiding sections (52), each of the optical section (50) and the guiding section (52) having an upstream end (60) with a first connection interface (64), a downstream end (66) with a second connection interface (70), and a section cavity (56) extending continuously within the housing (54) from the first section opening (62) at the upstream end (60) to a second section opening (68) at the downstream end (66). The present invention further relates to a laser system (200) for a TLE system (300), the laser system (200) comprising a laser source (210) for providing a laser beam (220), and the beamline (10). The present invention further relates to a TLE system (300) comprising a reaction chamber (310) that can be filled with a reaction atmosphere (312), a substrate (316) disposed in the reaction chamber (310), one or more sources (314) disposed in the reaction chamber (310), and a laser system (200) for providing a laser beam (220) for evaporating and / or sublimating material from the sources (314) and / or for heating material from the substrate (316).

A method of reducing defects in a beamline ion implanter. The method may entail, after performing an implantation procedure on a set of substrates disposed in a process chamber of a beamline of the ion implanter, using a first ion beam comprising a first ion species, the additional procedure of: performing a beam conditioning operation of at least a portion of the beamline. The beam conditioning operation may include generating a second ion beam and conducting the second ion beam to the process chamber along a direction of propagation, and moving the second ion beam within the process chamber, in a sweep direction, at an angle with respect to the direction of propagation, wherein a targeted region of the process chamber is impacted by the second ion beam.

The utility model discloses a wire bunching structure which comprises two oppositely-arranged fixing parts and a rotating part, the fixing parts are connected with a shell of an automobile lamp, the two fixing parts and the shell define a U-shaped frame used for containing a wire harness, the rotating part is arranged at the open end of the U-shaped frame, the rotating part is rotationally connected with one of the two fixing parts, and the rotating part is arranged at the open end of the U-shaped frame. The open end is opened or blocked through rotation of the rotating piece. Compared with a traditional mode that a binding belt is tightened to the diameter of the wire harness to fix the wire harness, the wire bunching structure disclosed by the utility model changes the fixing mode of the wire harness, the wire harness is placed in the U-shaped frame composed of the shell and the two fixing pieces, and the open end of the U-shaped frame is blocked through rotation of the rotating piece, so that the wire harness is fixed in the U-shaped frame; according to the wire harness structure, the wire harness is locked by closing the wire harness moving area, and the size of the U-shaped frame is not reduced in the locking process, so that the risk of wire pressing when the wire harness is fixed through the wire harness structure is reduced.

Embodiments of systems, devices, and methods relate to fast beam position monitoring for detecting beam misalignment in a beam line. In an example, a fast beam position monitor includes a plurality of electrodes extending into an interior of a component of a beam line. The fast beam position monitor is configured to detect a position of a beam passing through the component of the beam line based on beam halo current. Embodiments of systems, devices, and methods further relate to noninvasively monitoring parameters of beams advancing along a beam line. In examples, gas is puffed into a pumping chamber along a beam line. One or more beam parameters are measured from fluorescence resulting from collisions of energetic beam particulates of a beam advancing through the beam line.

The utility model discloses a bunching device for an electric vehicle controller, which comprises a fixing seat, a clamping assembly arranged on the fixing seat and a fixing assembly arranged on the clamping assembly, and the clamping assembly comprises a bunching seat, a clamping seat and a bunching semicircular hole; a fixing groove is formed in each bunching semicircular hole, a mounting groove is formed in the clamping seat, a clamping block is arranged in the mounting groove, and a limiting spring is arranged on the clamping block; the fixing assembly comprises a telescopic base, a stretching rod and a pull rod. A hollow structure is arranged in the telescopic seat; the end, away from the pull rod, of the stretching rod is arranged in the telescopic base and provided with a sliding plate in a matched mode, and limiting springs are symmetrically arranged on the sliding plate. By adopting the wire bunching seat, the clamping seat and the fixing groove, tidy wiring of wires is realized, meanwhile, maintenance personnel can quickly position wire paths and problem roots, the maintenance difficulty is reduced, and the maintenance efficiency is improved to a certain extent.

A method includes receiving a spot beam profile is received for a spot ion beam; receiving a linear scanned beam profile for the spot ion beam; generating a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile; and implementing an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile.

The invention discloses a three-beam ion irradiation device for simulating research and development of a novel nuclear reactor material, and the device comprises an accelerator which is used for generating a heavy ion beam line; the hydrogen ion implanter is used for generating hydrogen ion beams; the helium ion implanter is used for generating helium ion beams; the irradiation target chamber is used for receiving beam lines generated by the accelerator, the hydrogen ion implanter and the helium ion implanter; the hydrogen ion beam line and the helium ion beam line are located on the two sides of the heavy ion beam line respectively. According to the three-beam ion irradiation device for simulating the research and development of the novel nuclear reactor material, disclosed by the invention, the deviation of the material between the actual conditions of a simulation experiment and a reactor is reduced, and the influence of neutral particles in a simulation experiment irradiation target chamber on the simulation experiment is reduced, so that the detection of the simulation experiment is more accurate.

The present invention discloses a multi-stage cable harness structure for new energy vehicle communications, and relates to the technical field of cable harnesses. The present invention includes a lower shell, the inner wall of the lower shell is fixedly provided with a fixing seat, a plurality of connecting channels distributed in a ring shape are provided inside the fixing seat for connecting cable cores, connecting columns and a plurality of arc blocks distributed in a ring shape are fixed on both sides of the fixing seat, and the plurality of arc blocks are respectively arranged on one side of the connecting channel, and the outer walls of the two connecting columns are rotatably connected with movable rings, and the outer walls of the movable rings are fixed with a plurality of evenly distributed pressing blocks. The present invention can seal the gap of the connecting structure, ensure the sealing of the overall structure, and improve the safety of the connection. No additional tape is required, and it is more convenient to use. The cable core can be compressed twice to ensure the stability of the cable connection. The cable core can also be quickly connected and disassembled, and the operation is simple and convenient, which provides convenience for later maintenance.

The ion implanter may include an ion source to generate an ion beam. An ion implanter may include a set of beam assemblies to direct an ion beam along an ion beam axis to a substrate, and a processing chamber housing the substrate to receive the ion beam. The ion implanter may include a conical optical system comprising: an illumination light source for introducing light to a substrate location; a first polarizer having a first polarization axis and disposed between the illumination light source and the substrate position; and the second polaroid is used for receiving the light passing through the position of the substrate. The conical optical system may include a lens to receive light passing through the substrate location, and a detector to detect light passing through the lens.

A method includes: recording time-series data in which a beam condition including an ion species, energy, and a beam current of an ion beam that is transported along a beamline in an ion implanter and a neutron dose rate that is measured at a predetermined measurement position in the ion implanter are associated with each other in a recording device; transporting a high-energy ion beam along the beamline; acquiring a measured value of the neutron dose rate that is measured at the predetermined measurement position when transporting the high-energy ion beam; calculating an estimated value of the neutron dose rate that is estimated at the predetermined measurement position when transporting the high-energy ion beam, by using the time-series data and the beam condition of the high-energy ion beam; and comparing the measured value with the estimated value.

The present invention discloses a method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device, which relates to the technical field of grating monochromators for synchrotron radiation devices and includes the following steps: S1, designing a planar tool; S2, measuring the tool surface angle data during continuous rotation; S3, calculating the angle between the two rotating shafts based on the tool surface angle data. The present invention designs a set of planar tooling with a high-precision laser interferometer rangefinder. By measuring the change in the tool surface angle of the tooling plane during rotation around the axis, the rotation axis angle is successfully calculated, filling the gap in the inability to accurately measure the biaxial parallelism of a grating monochromator. The present invention provides theoretical support and technical guidance for the design and construction of high-performance beamlines in synchrotron radiation devices, and can also be used to guide the structural optimization design of grating monochromators. The biaxial parallelism of the monochromator is calculated by measuring the change in the surface angle of a set of planar tooling loaded on the two rotating shafts of the grating monochromator during rotation.

This invention discloses a real-time positioning system and method for component installation based on a laser reference. The method includes: setting up a laser reference system according to the construction layout line; projecting multiple laser beams along the arch axis and circumferential direction to form a spatial reference within the installation space; setting up a set of identifying features at the arch, arch waist, arch foot connection points, and nodes; establishing a correspondence between the identifying codes and the component number, node type, and geometric reference surface; continuously sampling the spatial geometric relationship between the laser reference system and the identifying feature set during component unfolding, hoisting, and positioning to form an observation data stream; inputting the observation data stream into an attitude calculation model; and using factor graph and graph optimization algorithms to combine beamline constraints, shape constraints, and hinge continuity constraints to obtain the spatial attitude of each component and the overall arch frame. This invention constructs a closed-loop laser reference and multi-component attitude calculation system, realizing continuous positioning and overall contour controllability of component installation under complex working conditions.

The application relates to the technical field of synchrotron radiation beam lines, in particular to an actively controlled synchrotron radiation focusing mirror device, wherein a horizontal hinge pair and a vertical hinge pair are guiding mechanisms of focusing mirror movement, a rotating driver is a driving, measuring and feedback element of the focusing mirror movement, and an active controller is a control core of an active control motion platform. The actively controlled synchrotron radiation focusing mirror device provided by the application has high control precision and strong disturbance suppression capability, and can realize milliradian stroke and nanoradian level resolution key indicators.

The invention discloses a compact negative ion beam transmission system for laser neutralization. The compact negative ion beam transmission system comprises an insulating cylinder, a four-way cavity, a beam line cavity, a gate valve, a limiter, a measuring target, a deflection magnet and a folding laser cavity module, the insulating cylinder, the four-way cavity and the bunching cavity are sequentially and coaxially connected, the gate valve is arranged between the insulating cylinder and the four-way cavity, the limiter is arranged between the four-way cavity and the bunching cavity, and a flat center hole is formed in the center of the limiter, so that the section of an ion beam entering an inner cavity of the bunching cavity is rectangular. The measuring target and the deflection magnet are sequentially arranged in an inner cavity of the bunching cavity in the axial direction of the bunching cavity. The folded laser cavity module is arranged in the inner cavity of the beam line cavity, and laser is coupled with the ion beam for multiple times through the folded laser cavity module. The negative ion transmission system has the advantages that the compactness of the negative ion transmission system is realized, and the laser neutralization efficiency of the negative ion transmission system is improved.

A linear accelerator apparatus may include a beamline enclosure that defines a polygonal backbone, and a plurality of acceleration stages, disposed along a length of the beamline enclosure. A given acceleration stage may include a drift tube assembly to conduct an ion beam therethrough, a resonator, coupled to deliver an RF signal to the drift tube assembly, and a quadrupole assembly to shape the ion beam,. As such, at a first acceleration stage, a first resonator may be disposed along a first side of the polygonal backbone, and at a second acceleration stage, adjacent to and downstream of the first acceleration stage, a second resonator may be disposed along a second side of the polygonal backbone, different from the first side.