91 results about "Beamline" patented technology

An ion implantation system includes an ion source, a beamline that extracts and shapes an ion beam from the ion source, a deceleration stage that reduces the energy of the ion beam while focusing the ion beam in the direction of a workpiece. A workpiece support has a structure that determines an implant plane position, which is the position of a workpiece surface that receives the ion beam. The workpiece support is configured to translate the implant plane along a path of the ion beam so as to shorten or lengthen the path without changing the tilt angle of the workpiece. The beam optics may be fixed and the focal point of the ion beam may be allowed to vary with a decel ratio. The workpiece support may translate the implant plane to a focal point of the ion beam or to some fixed offset from that focal point.

A linear accelerator apparatus may include a beamline enclosure that defines a polygonal backbone, and a plurality of acceleration stages, disposed along a length of the beamline enclosure. A given acceleration stage may include a drift tube assembly to conduct an ion beam therethrough, a resonator, coupled to deliver an RF signal to the drift tube assembly, and a quadrupole assembly to shape the ion beam. As such, at a first acceleration stage, a first resonator may be disposed along a first side of the polygonal backbone, and at a second acceleration stage, adjacent to and downstream of the first acceleration stage, a second resonator may be disposed along a second side of the polygonal backbone, different from the first side.

This invention provides a gas cluster ion beam apparatus capable of planarizing a material substrate by irradiating it with a neutral beam. A neutral gas introduction device (26) is provided for a vacuum container (2). By introducing neutral gas from the neutral gas introduction device (26), the gas cluster ion beam (11) traveling along the beamline in the beam delivery system (BT) collides with the neutral gas, undergoing dissociation and neutralization to form a high-energy neutral beam (25). Furthermore, a reflective electrode (28) is provided between an electrostatic lens (9b) and the material substrate (15), and a high voltage equal to the accelerating voltage is applied to the reflective electrode.

The application belongs to the technical field of space particle environment simulation, and provides a space particle environment simulation system and method.The system comprises a vacuum cabin body, a multi-beam line incidence unit connected with the vacuum cabin body, a first beam line incidence unit, a second beam line incidence unit, the first beam line incidence unit comprising a first adjusting support assembly and a first beam line incidence cone, the second beam line incidence unit comprising a second adjusting support assembly and a second beam line incidence cone, and a control device used for determining correction amounts of an incidence point of the simulated proton beam line and an incidence point of the simulated electron beam line in a vacuum extraction process of the vacuum cabin body, and correcting positions of the first incidence point of the simulated proton beam line and the second incidence point of the simulated electron beam line by moving operations of the first adjusting support assembly and the second adjusting support assembly.The application improves the convergence accuracy of multiple simulated beam lines and the automatic correction process of the incidence points of the simulated beam lines.

To provide a method and an apparatus for controlling beam current in an ion implantation process, which reduce the amount of "tune" time employed for such a calibration process using a uniform current density across the wafer surface.SOLUTION: A method includes receiving a spot beam profile (SpotBP) for the spot ion beam, receiving a linear scanned beam profile (ScannedBP) for the spot ion beam, generating a calculated calibration spot profile on the basis of the spot beam profile and the linear scanned beam profile, and implementing an adjusted scanned profile for the spot ion beam on the basis of the calculated calibration spot profile.SELECTED DRAWING: Figure 10

The present invention discloses a serial crystallography experimental device based on conveyor belt technology. The device comprises a goniometer head, a base film, and a crystallization plate storage tray. The bottom end of the goniometer head is provided with a goniometer head groove for coupling with the goniometer head base on a synchrotron beamline station. The top end of the goniometer head is provided with two goniometer head support rods for coupling with bearing short rods, and a goniometer head waste liquid tank for collecting waste liquid after X-ray irradiation. The base film is coupled to the crystallization plate storage tray for supporting and flipping the crystallization plate storage tray. During the experiment, the crystallization plate storage tray, equipped with a sitting drop in situ crystallization plate, is coupled to the base film. The low background scattering film on the back of the sitting drop in situ crystallization plate is connected to the bearing short rod via an adhesive film to form a conveyor belt film. Driven by a motor, the bearing short rod tears off the conveyor belt film during sample delivery to the goniometer head and performs diffraction data acquisition. Waste sample droplets are squeezed out and flow down the goniometer head support rods into the waste liquid tank.

A method includes receiving a spot beam profile is received for a spot ion beam; receiving a linear scanned beam profile for the spot ion beam; generating a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile; and implementing an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile.

This invention discloses a highly stable, ultra-fast switching white light shutter device. The invention includes a motion mechanism, a vacuum chamber, an adjustable base, and a support. The adjustable base is used for elevation adjustment and leveling of the motion mechanism and the vacuum chamber. The motion mechanism includes a drive assembly, a shutter switching assembly, and multiple spring-loaded fine-tuning assemblies. The shutter switching assembly is mounted directly above the drive assembly, and the spring-loaded fine-tuning assemblies are symmetrically arranged on both sides of the drive assembly. The upper end of each spring-loaded fine-tuning assembly is connected to the drive assembly, and the lower end is connected to the adjustable base. The shutter switching assembly is sealed to the vacuum chamber, and the absorber of the shutter switching assembly is located inside the vacuum chamber. The drive assembly drives the absorber to reciprocate vertically within the vacuum chamber, controlling the switching between on and off light. The spring-loaded fine-tuning assemblies are used to balance the vacuum suction force generated by the vacuum chamber on the drive assembly, thereby reducing the load on the drive assembly. This invention significantly improves the stability of equipment operating on the beamline.

The present invention relates to a beamline (10) for a laser beam (220) of a thermal laser evaporation (TLE) system (300), the beamline (10) extending between a source end (20) of the beamline (10) and a chamber end (30) of the beamline (10), such that the source end (20) is connectable to a laser light source (210) and the chamber end (30) is connectable to a reaction chamber (310) of the TLE system (300), the beamline (10) including one or more laser beam sources (210) for modifying and / or controlling the characteristics of the laser beam (220). and / or one or more linear guiding sections (52), each of the optical section (50) and the guiding section (52) having an upstream end (60) with a first connection interface (64), a downstream end (66) with a second connection interface (70), and a section cavity (56) extending continuously within the housing (54) from the first section opening (62) at the upstream end (60) to a second section opening (68) at the downstream end (66). The present invention further relates to a laser system (200) for a TLE system (300), the laser system (200) comprising a laser source (210) for providing a laser beam (220), and the beamline (10). The present invention further relates to a TLE system (300) comprising a reaction chamber (310) that can be filled with a reaction atmosphere (312), a substrate (316) disposed in the reaction chamber (310), one or more sources (314) disposed in the reaction chamber (310), and a laser system (200) for providing a laser beam (220) for evaporating and / or sublimating material from the sources (314) and / or for heating material from the substrate (316).

A method of reducing defects in a beamline ion implanter. The method may entail, after performing an implantation procedure on a set of substrates disposed in a process chamber of a beamline of the ion implanter, using a first ion beam comprising a first ion species, the additional procedure of: performing a beam conditioning operation of at least a portion of the beamline. The beam conditioning operation may include generating a second ion beam and conducting the second ion beam to the process chamber along a direction of propagation, and moving the second ion beam within the process chamber, in a sweep direction, at an angle with respect to the direction of propagation, wherein a targeted region of the process chamber is impacted by the second ion beam.

A method includes receiving a spot beam profile is received for a spot ion beam; receiving a linear scanned beam profile for the spot ion beam; generating a calculated calibration spot profile, based upon the spot beam profile and the linear scanned beam profile; and implementing an adjusted scanned profile for the spot ion beam, based upon the calculated calibration spot profile.

The ion implanter may include an ion source to generate an ion beam. An ion implanter may include a set of beam assemblies to direct an ion beam along an ion beam axis to a substrate, and a processing chamber housing the substrate to receive the ion beam. The ion implanter may include a conical optical system comprising: an illumination light source for introducing light to a substrate location; a first polarizer having a first polarization axis and disposed between the illumination light source and the substrate position; and the second polaroid is used for receiving the light passing through the position of the substrate. The conical optical system may include a lens to receive light passing through the substrate location, and a detector to detect light passing through the lens.

The present invention discloses a method for detecting the biaxial parallelism of a grating monochromator for a synchrotron radiation device, which relates to the technical field of grating monochromators for synchrotron radiation devices and includes the following steps: S1, designing a planar tool; S2, measuring the tool surface angle data during continuous rotation; S3, calculating the angle between the two rotating shafts based on the tool surface angle data. The present invention designs a set of planar tooling with a high-precision laser interferometer rangefinder. By measuring the change in the tool surface angle of the tooling plane during rotation around the axis, the rotation axis angle is successfully calculated, filling the gap in the inability to accurately measure the biaxial parallelism of a grating monochromator. The present invention provides theoretical support and technical guidance for the design and construction of high-performance beamlines in synchrotron radiation devices, and can also be used to guide the structural optimization design of grating monochromators. The biaxial parallelism of the monochromator is calculated by measuring the change in the surface angle of a set of planar tooling loaded on the two rotating shafts of the grating monochromator during rotation.

This invention discloses a real-time positioning system and method for component installation based on a laser reference. The method includes: setting up a laser reference system according to the construction layout line; projecting multiple laser beams along the arch axis and circumferential direction to form a spatial reference within the installation space; setting up a set of identifying features at the arch, arch waist, arch foot connection points, and nodes; establishing a correspondence between the identifying codes and the component number, node type, and geometric reference surface; continuously sampling the spatial geometric relationship between the laser reference system and the identifying feature set during component unfolding, hoisting, and positioning to form an observation data stream; inputting the observation data stream into an attitude calculation model; and using factor graph and graph optimization algorithms to combine beamline constraints, shape constraints, and hinge continuity constraints to obtain the spatial attitude of each component and the overall arch frame. This invention constructs a closed-loop laser reference and multi-component attitude calculation system, realizing continuous positioning and overall contour controllability of component installation under complex working conditions.

The application relates to the technical field of synchrotron radiation beam lines, in particular to an actively controlled synchrotron radiation focusing mirror device, wherein a horizontal hinge pair and a vertical hinge pair are guiding mechanisms of focusing mirror movement, a rotating driver is a driving, measuring and feedback element of the focusing mirror movement, and an active controller is a control core of an active control motion platform. The actively controlled synchrotron radiation focusing mirror device provided by the application has high control precision and strong disturbance suppression capability, and can realize milliradian stroke and nanoradian level resolution key indicators.

The invention discloses a compact negative ion beam transmission system for laser neutralization. The compact negative ion beam transmission system comprises an insulating cylinder, a four-way cavity, a beam line cavity, a gate valve, a limiter, a measuring target, a deflection magnet and a folding laser cavity module, the insulating cylinder, the four-way cavity and the bunching cavity are sequentially and coaxially connected, the gate valve is arranged between the insulating cylinder and the four-way cavity, the limiter is arranged between the four-way cavity and the bunching cavity, and a flat center hole is formed in the center of the limiter, so that the section of an ion beam entering an inner cavity of the bunching cavity is rectangular. The measuring target and the deflection magnet are sequentially arranged in an inner cavity of the bunching cavity in the axial direction of the bunching cavity. The folded laser cavity module is arranged in the inner cavity of the beam line cavity, and laser is coupled with the ion beam for multiple times through the folded laser cavity module. The negative ion transmission system has the advantages that the compactness of the negative ion transmission system is realized, and the laser neutralization efficiency of the negative ion transmission system is improved.

A linear accelerator apparatus may include a beamline enclosure that defines a polygonal backbone, and a plurality of acceleration stages, disposed along a length of the beamline enclosure. A given acceleration stage may include a drift tube assembly to conduct an ion beam therethrough, a resonator, coupled to deliver an RF signal to the drift tube assembly, and a quadrupole assembly to shape the ion beam,. As such, at a first acceleration stage, a first resonator may be disposed along a first side of the polygonal backbone, and at a second acceleration stage, adjacent to and downstream of the first acceleration stage, a second resonator may be disposed along a second side of the polygonal backbone, different from the first side.

The invention provides a non-invasive diagnosis device and system suitable for X-ray free electron laser and a use method, and relates to the technical field of X-ray free electron laser beam line diagnosis. The diagnosis device comprises a vacuum cavity, an optical element is arranged in an inner cavity of the vacuum cavity, a diagnostor mechanism is arranged on the inner wall or the inner top face of the vacuum cavity, the optical element and the diagnostor mechanism are oppositely arranged, and the optical element is used for emitting fluorescent light and photoelectrons; a light inlet channel is arranged on the side wall of the vacuum cavity; the diagnosis device mechanism comprises a mounting plate, a micro-channel plate diagnosis device is arranged on the mounting plate, and photoelectric detection elements are further arranged on the two sides of the micro-channel plate diagnosis device. According to the invention, non-invasive diagnosis of the XFEL can be realized, diagnosis is carried out by using fluorescence and photoelectron signals generated by excitation of the XFEL on the surface of the optical element, a main light beam can be prevented from being shielded, parallel operation with an experiment terminal can be realized, and non-invasive diagnosis of the XFEL can be realized.

This invention discloses a compact magnetic deflection system for neutral beam injection, comprising: a yoke assembly, two identical magnet assemblies, and a magnet protection assembly. The yoke assembly has a rectangular frame structure, forming a complete magnetic circuit. The two magnet assemblies are arranged opposite each other within the yoke assembly, with a channel in between. The magnet protection assembly surrounds the two magnet assemblies. Each magnet assembly includes: an excitation coil box, an iron core, and a energized coil. The excitation coil box has two U-shaped slots, with the iron core located in the inner slot and the energized coil in the outer slot, with both ends of the energized coil extending from the side of the excitation coil box in the same direction. By changing the current or the number of turns of the energized coil, charged ions can be flexibly deflected out of the original beamline channel. This invention can effectively filter out mixed charged ion beams, achieving purified neutral beam injection.

The utility model relates to the technical field of computer bunching, and discloses a computer bunching device in a machine room, which comprises a bunching plate, the left side and the right side of the bunching plate are fixedly connected with connecting plates, and the top end in the bunching plate is provided with a first reserved groove. According to the computer bunching device for the machine room, through the arrangement of the fixed plate, the limiting groove and the movable block, after a cable is placed in the first reserved groove and the second reserved groove, the limiting plate is placed at the front end of the bunching plate, and when the limiting plate is placed, the two sides of the limiting plate are placed in the fixed plate; a guide groove in a fixed plate can limit and guide a limiting plate, a connecting frame can support the limiting plate, a movable block is rotated after the limiting plate is well placed so that a limiting groove in the movable block can be clamped outside a limiting clamping block, and therefore the limiting plate can be limited and fixed, the situation that the limiting plate accidentally shakes to affect use is prevented, and when the limiting plate is fixed, a clamping plate can limit a cable; the problems that a limiting plate is inconvenient to mount and dismount, and the bunching efficiency is easily affected are solved.

A component analysis method and system. A sample is excited by a synchrotron radiation beamline to obtain sample charged ions; the sample charged ions are accelerated by an acceleration orbit to obtain sample to-be-tested waves; and the components of the to-be-tested sample are determined by analyzing the sample to-be-tested waves. The synchrotron radiation beamline has the characteristics of high intensity, high collimation, high monochromaticity, wide energy spectrum coverage and high polarization, and the trace and ultratrace components can be accurately detected by exciting the to-be-tested sample by the synchrotron radiation beamline, the detection limit can be reduced to the ppb level or even the ppt level, the high purity requirement of high-end semiconductor materials on materials can be met, and the synchrotron radiation beamline can be used for material component analysis, the sample loss can be avoided, the real component distribution can be restored, the synchronous detection of multi-element complex components can be realized, and the full component detection of matrix elements, doped elements and trace elements in the material can be realized synchronously.

The utility model discloses a control all-in-one machine with a bunching mechanism, belonging to the control all-in-one machine technology field, the control all-in-one machine with the bunching mechanism comprises an all-in-one machine main body and a bunching rack fixed on the all-in-one machine main body, one end of the all-in-one machine main body close to the bunching rack is embedded and fixed with a plurality of lead terminals in a rectangular array, first bunching rings are fixed to the top end of the bunching frame at equal intervals, arc-shaped grooves staggered with the first bunching rings are formed in the top end of the bunching frame, second bunching rings fixed to the bunching frame are embedded in the first bunching rings, and heat dissipation grooves are formed in the two ends of the all-in-one machine body at equal intervals. According to the control all-in-one machine with the wire bunching mechanism, through the second wire bunching ring in the first wire bunching ring and the wire bunching grooves between the second wire bunching ring and the arc-shaped grooves, the connecting wires used for a long time and the connecting wires used for a short time are classified and bunched, and the situation that the connecting wires on the control all-in-one machine are disordered is avoided.

The application discloses an ion mass analyzer and an ion implantation device. The ion mass analyzer comprises a magnetic yoke, first and second magnetic poles symmetrically arranged above and below the magnetic yoke, a beam line cavity between the first and second magnetic poles for a mixed ion beam to pass through in a certain route, a first coil wound on the first magnetic pole, and a second coil wound on the second magnetic pole. The first and second magnetic poles are both fan-shaped, the incident surfaces of the first and second magnetic poles are both concave, the outgoing surfaces of the first and second magnetic poles are both convex, the curvature of the concave surface is -0.8 to -0.5, and the curvature of the convex surface is 0.45 to 0.6. The angle between the mixed ion beam line and the normal line of the incident surface is 56.5 to 60 degrees when the mixed ion beam is incident, and the angle between the deflected ion beam line and the normal line of the outgoing surface is -10.5 to -13 degrees when the mixed ion beam is outgoing. The resolution of the ion mass analyzer is greater than 200.

A method of measuring the liquid level at a vessel outlet connection located on an outlet side of a vessel comprises directing an incident beam through a vessel connection located on the top head of the vessel opposite the outlet side of the vessel so that an incident beam line forms an acute angle with the vessel outlet connection longitudinal axis. An apparatus for carrying out the method is configured to allow the incident beam line to pivot + / −30 degrees from the vessel connection longitudinal axis and to allow the incident beam line to rotate about the vessel connection longitudinal axis.

The invention relates to a radiation beam line purging structure based on a beam limiting hole and upstream differential air exhaust, and the structure comprises a beam line channel which is used for the axial transmission of radiation; the at least two beam limiting holes are arranged at intervals along the radiation propagation direction of the beam line channel and comprise a first beam limiting hole and a second beam limiting hole; the gas introduction port is used for introducing purging gas into the bunching channel; an extraction opening provided on the upstream side of the gas introduction opening and used for extracting the purge gas; and the relative positions of the extraction opening and the gas introduction opening are configured to enable the introduced purging gas to form directional gas flow pointing to the radiation source direction in an area between the first beam limiting hole and the second beam limiting hole. The device has the beneficial effects that through the synergistic effect of beam limiting hole constraint and upstream differential gas extraction, a stable reverse gas flow field pointing to the radiation source direction is formed in a beam line, and active interception and blocking can be carried out before pollutants enter a downstream key area.

The application provides a compact beam switching deflection device and application thereof, and relates to the technical field of ion accelerator equipment. The device comprises a superconducting beam splitter, a multi-channel vacuum chamber and a superconducting combined magnet which are connected in sequence, wherein the superconducting beam splitter is used for splitting the input beam, the multi-channel vacuum chamber is provided with a plurality of outlet flanges, each outlet flange is connected to a branch beam line pipe, and at least one branch beam line pipe is provided with a superconducting combined magnet. The application adopts a superconducting magnet to deflect the beam, improves the maximum field strength of the deflection magnet, reduces the deflection radius of the beam, and thus reduces the floor area. Furthermore, the combined superconducting magnet is adopted to combine the quadrupole field on the dipole field, reduces the use of the quadrupole magnet, and thus further reduces the floor area.

The invention relates to the technical field of building construction auxiliary equipment, and discloses a building scaffold which comprises a lifting platform, the top of the lifting platform is fixedly connected with a fixing frame, the top of the fixing frame is provided with a rotary positioning mechanism, the top of the rotary positioning mechanism is provided with a support, and the top of the support is provided with an angle adjusting mechanism. A connecting frame is arranged at the top of the angle adjusting mechanism, a bunching frame is arranged on the inner side of the fixing frame, a bunching mechanism and a fixing mechanism are installed in the bunching frame and on the side face of the bunching frame respectively, and a flashlight is arranged in the connecting frame; the angle adjusting mechanism comprises a first rotating block, the first rotating block is fixedly connected to the top of the support, and the side face of the first rotating block is rotationally connected with a second rotating block. Through multi-directional rotary positioning and linkage clamping bunching functions, illumination can be accurately adjusted, cables can be safely stored, and the safety and convenience of the construction platform are remarkably improved.

The application relates to the technical field of beam wire machines, and discloses a pay-off rack with a shaft coupling device, which comprises a shaft coupling device and a wire reel; the shaft coupling device comprises a pair of shaft coupling units oppositely arranged along the axial direction; the shaft coupling unit comprises a fixing block, a transmission shaft, a first transmission housing, a second transmission housing, a rotating shaft, a clamping assembly and a driving assembly; the transmission shaft is arranged in the first transmission housing and connected with the driving assembly; the second transmission housing is arranged outside the first transmission housing, and a first rotating supporting structure is arranged between the first transmission housing and the second transmission housing; the rotating shaft is arranged on the second transmission housing; the clamping assembly is arranged at the other end of the transmission shaft and connected with the transmission shaft; one end of the wire reel is connected with the rotating shaft, the other end is connected with the clamping assembly, and the wire reel is arranged outside the second transmission housing. The application reduces the swing and deviation of the rotating shaft and improves the stability of the pay-off process.

Described herein are compact particle therapy systems comprising a superconducting cyclotron for proton therapy applications. In some aspects, an electromagnetic beamline incorporating energy selection systems and pencil beam scanning magnets directs particle beams from the cyclotron to a treatment isocenter. A patient positioning device comprising a robotic positioner with six degrees of freedom supports patient alignment, t. The particle system can be ultra compact and able to be installed in existing photon linear accelerator (e.g., radiation therapy) vaults.

An ultrasound processing system, a transceiver circuit, and a method related to beamforming are provided. The ultrasound processing system includes a transceiver circuit. The transceiver circuit includes one or several delay calculators. Each delay calculator is configured with a beamline initial location, a receiving ultrasound element location, and a steering angle and is configured to determine location information according to the beamline initial location, the receiving ultrasound element location, and the steering angle. The beamline initial location is the location of beamline on a baseline. The receiving ultrasound element location is the location of receiving an echo of the ultrasound signal on one transducer element. The steering angle is an angle relationship related to the beamline and the baseline. The location information includes the location of points on the beamline and the distance from these points to the receiving ultrasound element location.