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8 results about "Positively charged particle" patented technology

A: Positively charged atomic particles are called protons. These particles, along with neutrons, exist in the nucleus of the atom. Protons and neutrons each have an atomic mass of one.

An electrophoretic electronic paper

PendingCN122307983AElectrophoresesEngineering
This invention discloses an electrophoretic electronic paper, comprising an electrode plate, a capsule, and charged particles. There is only one electrode plate, and the capsule is disposed on one side of the electrode plate. Multiple charged particles are encapsulated within the capsule. Each charged particle includes a positively charged particle and a negatively charged particle that can combine to form a whole. Each of the positively and negatively charged particles is half of the whole, and the positively and negatively charged particles are of different colors. By applying a positive voltage to the electrode plate, the half of the particle with the negative charge will rotate towards the electrode plate, while the half with the positive charge will rotate away from the electrode plate, displaying the color of the negatively charged particle, and vice versa. Furthermore, since the positively and negatively charged particles are encapsulated as a whole, only one type of charged particle is encapsulated within the capsule, allowing for a single encapsulation per capsule. By adjusting the structure of the charged particles, the number of encapsulation steps and electrode plates is reduced, simplifying the manufacturing process and wiring.
Owner:XINLI OPTICAL RENSHOU CO LTD

A cleaning method for removing a suction pen mark on a surface of a silicon carbide substrate and a silicon carbide substrate

The application discloses a cleaning method for removing a suction pen mark on a surface of a silicon carbide substrate and the silicon carbide substrate, and belongs to the technical field of silicon carbide detection. The cleaning method comprises the following steps: (1) using a mixed solution of ammonia and hydrogen peroxide to clean the surface of the substrate, so as to pre-oxidize the surface of the substrate; (2) using ozone water to clean the pre-oxidized substrate, so as to obtain a substrate containing an oxidation layer; and (3) using an acidic cleaning solution with a pH value of 2.0-3.5 to clean the substrate containing the oxidation layer, and then performing water washing and blowing dry, so as to obtain a cleaned silicon carbide substrate. The method can change the Zeta potential of the oxidation layer on the surface of the substrate, so that the surface potential of the substrate is not lower than 0 mV, thereby reducing the adsorption of positively charged particles on the suction pen, achieving the technical effect of completely removing the suction pen mark, and improving the quality of the silicon carbide substrate.
Owner:SICC SHANGHAI CO LTD

Vacuum layer deposition apparatus and method of depositing a layer on a substrate, especially on a substrate comprising indentations in the surface to be coated

ActiveUS12595550B2Electric discharge tubesVacuum evaporation coatingPositively charged particleVacuum coating
A vacuum layer deposition apparatus includes a vacuum coating chamber with an inner space; a material source to generate electrically positively charged particles of a material to be deposited on a substrate in said inner space; a substrate holder with an extended metal or dielectric material surface exposed to said inner space; and a Rf plasma source comprising: first and second electrodes Rf-connectable or Rf-connected to first and second taps of a Rf generator, respectively. Said first and second electrodes include first and second electrode surfaces, respectively, of metal or of a dielectric material which are freely exposed to said inner space. Said extended surface of said substrate holder is at least a part of said first electrode surface and said second electrode surface is larger than said first electrode surface by at least a factor of 1.5. A method includes vacuum-process depositing a layer on a substrate.
Owner:EVATEC AG

Method of vectoring rocket thrust using an electric field

There is disclosed a method of vectoring a rocket propulsion system producing a partly ionized exhaust jet along a longitudinal jet axis and through a nozzle. One or more pairs of electrodes may straddle the exhaust jet inside the nozzle or at a nozzle exit. A high-voltage DC supply may energize one or more of the electrode pairs with a strong electric field. A field intensity of the electric field may be scaled by the DC supply to proportionately deflect the exhaust jet away the longitudinal axis by a desired vectoring angle. The particular pair voltages sent to each pair of electrodes by the DC supply may be weighted for establishing a desired azimuth for the deflection. The strong electric field may laterally accelerate positively charged particles in the exhaust jet toward a negatively charged side of the one or more electrode pairs, thereby achieving the desired deflection and azimuth.
Owner:SERDAR ERSEL OZAN

Non-woven fabric structure and / or fabric structure and method for producing non-woven fabric structure and / or fabric structure

The invention relates to a non-woven fabric and / or fabric structure infiltrated and / or infiltrated with macroscopic three-dimensional positively charged particles, the macroscopic three-dimensional positively charged particles being tetrapod zinc oxide and in the fabric structure and / or the non-woven fabric structure, there is an occlusion structure having macroscopically three-dimensional positively charged particles disposed on the surface of the fabric structure and / or non-woven fabric structure. The invention further relates to a method for producing a non-woven fabric structure and / or a fabric structure having macroscopically three-dimensional positively charged particles. The invention also relates to a method for producing a non-woven fabric structure and / or a fabric structure having macroscopically three-dimensional positively charged particles.
Owner:PHIL-STONE AG

Semiconductor processing apparatus

The application provides a semiconductor process equipment, comprising: a process chamber and a vacuum pumping device, the process chamber comprising a generating cavity, a processing cavity, a first channel and a shunt channel, the generating cavity being used for generating plasma, the processing cavity being used for carrying out etching process of a wafer, two ends of the first channel being communicated with the generating cavity and the processing cavity respectively, the processing cavity being located at the side of the first channel, two ends of the shunt channel being communicated with the first channel and the vacuum pumping device respectively; a deflection device, used for generating at least one deflection field in the first channel, so that at least part of the positively charged particles in the plasma generated in the generating cavity enter into the processing cavity, the shunt channel being used for guiding at least part of the neutral particles separated by the deflection device to the vacuum pumping device; and a focusing device, arranged in the processing cavity, used for focusing the positively charged particles entering into the processing cavity to form a charged particle beam, so as to carry out etching on the wafer through the charged particle beam, thereby realizing maskless patterning etching.
Owner:BEIJING NAURA MICROELECTRONICS EQUIP CO LTD

Purification device for ultra-high vacuum environments

This invention discloses a purification device for ultra-high vacuum environments, comprising a cylinder, an isolator, a magnet, and an ionization filament. The cylinder has an open first end and a closed second end. The isolator is disposed within the cylinder, dividing the internal cavity of the cylinder into an ionization cavity near the first end and a collection cavity near the second end along the axial direction of the cylinder. The magnet passes through the isolator and has a perforation connecting the ionization cavity and the collection cavity. The two magnetic poles of the magnet are distributed along a direction perpendicular to the central axis of the cylinder. The ionization filament is at least partially disposed within the ionization cavity for ionizing the gas within the ionization cavity. The ionization filament of this invention can ionize the gas into negatively charged particles and positively charged particles. These negatively charged and positively charged particles, influenced by the magnetic field, undergo spiral motion within the perforation on the magnet and are collected into the collection cavity.
Owner:SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI

Lithium / sodium metal battery electrolyte functional additive and preparation method and application thereof

The invention discloses a lithium / sodium metal battery electrolyte functional additive and a preparation method and application thereof, and relates to the technical field of lithium / sodium battery electrolyte preparation. The functional additive is a peelable layered material with permanent positive charges, and is stably suspended in the lithium / sodium metal battery electrolyte. The functional additive provided by the invention has both anion adsorption selectivity and migration targeting. A layer of compact solid electrolyte interface film rich in sodium fluoride is constructed in situ on the surface of a sodium metal negative electrode by utilizing an interface electrostatic adsorption-electric field driven migration mechanism of suspended state positively charged particles, and dendritic crystal growth is remarkably inhibited, so that the cycle life of the battery is prolonged, and the coulombic efficiency of the battery is improved. According to the invention, the problem of dendritic crystal growth of the existing lithium / sodium metal battery is solved.
Owner:QUZHOU INSTITUTE FOR INNOVATION IN RESOURCE CHEMICAL ENGINEERING +1