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A kind of equipment and method for preparing oxide film with biaxial texture

A technology of oxide thin film and oxide, which is applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problem of high cost

Active Publication Date: 2017-02-22
SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, IBAD technology has the disadvantage of high cost due to the need for expensive ion sources

Method used

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  • A kind of equipment and method for preparing oxide film with biaxial texture
  • A kind of equipment and method for preparing oxide film with biaxial texture
  • A kind of equipment and method for preparing oxide film with biaxial texture

Examples

Experimental program
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Effect test

Embodiment 2

[0043] Example 2: Using the parameters of the above example, but increasing the working pressure to 2Pa, a MgO film with an out-of-plane orientation (001) crystal plane parallel to the substrate surface can be obtained, and its in-plane texture is fourfold symmetric.

Embodiment 3

[0044] Example 3: using a yttrium-zirconium alloy target, the angle between the incident direction of the auxiliary particle beam and the normal line of the substrate surface is 55°, the ion energy is controlled to 350eV, the substrate temperature is 100°C, and the film thickness is 1000nm. Other parameters are the same as in Example 1. YSZ films with out-of-plane orientation with (001) crystal plane parallel to the substrate surface can be obtained, and the in-plane texture is four-fold symmetry.

Embodiment 4

[0045] Example 4: Using a gadolinium-zirconium alloy target, the angle between the incident direction of the auxiliary particle beam and the normal line of the substrate surface is 55°, the ion energy is controlled to 200eV, the substrate temperature is 200°C, and the film thickness is 500nm. Other parameters are the same as in Example 1. Gd with an out-of-plane orientation (001) crystal plane parallel to the substrate surface can be obtained 2 Zr 2 o 7 film with a four-fold symmetry in its in-plane texture.

[0046] This method does not need to use an expensive ion source, but only adjusts the deposition parameters in the common magnetron sputtering equipment to obtain a suitable auxiliary particle beam, so that the film is assisted by beam bombardment during deposition to produce a biaxial texture, so Compared with the prior art solution (ion beam assisted deposition method), the present invention has obvious advantages of low cost.

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Abstract

The invention discloses equipment and a method for preparing an oxide film with a biaxial texture. The equipment comprises a magnetron sputtering vacuum chamber as well as a magnetron sputtering target material and a sample rack which are mounted in the magnetron sputtering vacuum chamber, wherein the distance from the magnetron sputtering target material to a substrate material is in a range of 1-100 cm; an included angle of an incident direction of a particle beam transmitted from the magnetron sputtering target material on the substrate material and a normal of the substrate material is in a range of 30-60 degrees; the working air pressure of the magnetron sputtering vacuum chamber is in a range of 0.01-10 Pa; the sputtering power and the voltage in a magnetron sputtering process are controlled to produce the particle beam in a voltage range of 100-1000 eV, and the particle beam bombards a growing film to produce the biaxial texture. By using the equipment and the method, the oxide film with the biaxial structure can be prepared without expensive ion sources.

Description

technical field [0001] The invention relates to the technical field of thin film materials, in particular to a device and a method for preparing an oxide thin film with biaxial texture. Background technique [0002] Films with biaxial texture have some special physical properties compared to ordinary films without texture due to their consistent grain orientation, so biaxial textured oxide films can produce very good results in some fields. application effect. If a thin film with biaxial texture is to be prepared on a non-textured substrate material, there are two physical vapor deposition methods in the prior art, namely inclined substrate deposition (ISD) and ion beam assisted deposition (IBAD). However, ISD technology can only prepare a few types of thin film materials, and the c-axis direction of the thin film is not perpendicular to the substrate, so its application range is very limited. The scope of application of IBAD technology is wider. The principle is to use th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/0052C23C14/08C23C14/3442C23C14/35
Inventor 肖绍铸冯峰瞿体明朱宇平卢弘愿韩征和
Owner SHENZHEN GRADUATE SCHOOL TSINGHUA UNIV