Solid-state imaging device and method for manufacturing solid-state imaging device
A technology of a solid-state imaging device and a manufacturing method, which is applied in the fields of semiconductor/solid-state device manufacturing, electric solid-state device, radiation control device, etc., can solve problems such as deterioration and reduction of modulation degree of amplifying transistors, and achieve the effect of improving C/N ratio.
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[0020] According to the present embodiment, a solid-state imaging device is provided. A solid-state imaging device includes a plurality of photoelectric conversion elements, impurity layers, low-concentration regions, and transistors. A plurality of photoelectric conversion elements are provided on the semiconductor layer. The impurity layer is provided in the same layer as the semiconductor layer in which the photoelectric conversion elements are arranged, and contains impurities of a conductivity type opposite to that of the charge accumulation region of the photoelectric conversion elements. The low-concentration region is provided inside the impurity layer, and the concentration of the impurity is lower than that of the impurity layer. The active region of the transistor is set on the impurity layer.
[0021] Hereinafter, the solid-state imaging device and the method of manufacturing the solid-state imaging device according to the embodiment will be described in detail w...
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