A rolling method of large single weight and wide molybdenum strip for sputtering target

A technology of sputtering target material and large unit weight, which is applied in metal rolling, metal rolling, manufacturing tools, etc., can solve the problems of small average grain size, low surface flatness, uneven density, etc., and achieve Effects of small grain size, high surface flatness, and uniformity of thickness distribution

Inactive Publication Date: 2016-12-07
郑州通达重型机械制造有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a rolling method of large unit weight and wide molybdenum strips for sputtering targets, which solves the problem that the molybdenum strips prepared in the prior art have small specifications, insufficient width, too small unit weight, and grain gaps. Large, uneven density, too small average grain size, and low surface flatness

Method used

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  • A rolling method of large single weight and wide molybdenum strip for sputtering target

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] The sputtering target material of the present embodiment is used the rolling method of large unit weight wide width molybdenum strip, comprises the following steps:

[0034] 1) Blank opening:

[0035] Take powder metallurgy sintered molybdenum slab, size 87mm×550mm×450mm, density 9.6g / cm 3 The unit weight is about 206kg; the powder metallurgy sintered molybdenum slab includes the following components in mass percentage: Si 0.003%, Ca 0.002%, Mg0.002%, P 0.001%, C 0.02%, O 0.003%, N 0.003% , the balance is Mo;

[0036] Put the molybdenum slab into a 450kw medium-frequency induction heating furnace, and heat it to 1490°C under a hydrogen protective atmosphere for preheating. The preheating time is 60 minutes;

[0037] Put the preheated molybdenum slab on the ф800mm×1200mm two-roller irreversible hot rolling mill, and carry out the second fire six-pass hot rolling at the rolling speed of 50m / min; the used rolls are preheated online before rolling, preheating The tempera...

Embodiment 2

[0062] The sputtering target material of the present embodiment is used the rolling method of large unit weight wide width molybdenum strip, comprises the following steps:

[0063] 1) Blank opening:

[0064] Take powder metallurgy sintered molybdenum slab, size 87mm×550mm×450mm, density 9.6g / cm 3 The unit weight is about 206kg; the powder metallurgy sintered molybdenum slab includes the following components in mass percentage: Si 0.003%, Ca 0.002%, Mg0.002%, P 0.001%, C 0.02%, O 0.003%, N 0.003% , the balance is Mo;

[0065] Put the molybdenum slab into a 450kw medium-frequency induction heating furnace, and heat it to 1485°C under a hydrogen protective atmosphere for preheating, and the preheating time is 61 minutes;

[0066] Put the preheated molybdenum slab on the ф800mm×1200mm two-roller irreversible hot rolling mill, and carry out the second fire six-pass hot rolling at the rolling speed of 48m / min; the used rolls are preheated online before rolling, preheating The tem...

Embodiment 3

[0091] The sputtering target material of the present embodiment is used the rolling method of large unit weight wide width molybdenum strip, comprises the following steps:

[0092] 1) Blank opening:

[0093] Take powder metallurgy sintered molybdenum slab, size 87mm×550mm×450mm, density 9.6g / cm 3 The unit weight is about 206kg; the powder metallurgy sintered molybdenum slab includes the following components in mass percentage: Si 0.003%, Ca 0.002%, Mg0.002%, P 0.001%, C 0.02%, O 0.003%, N 0.003% , the balance is Mo;

[0094] Put the molybdenum slab into a 450kw medium-frequency induction heating furnace, and heat it to 1495°C under a hydrogen protective atmosphere for preheating. The preheating time is 59 minutes;

[0095] Put the preheated molybdenum slab on the ф800mm×1200mm two-roller irreversible hot rolling mill, and carry out the second fire six-pass hot rolling at the rolling speed of 52m / min; The temperature is 305°C;

[0096] Before the molybdenum slab enters the ...

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Abstract

The invention discloses a method for rolling large unit-weight and wide molybdenum plates for a sputtering target material. The method includes the steps that firstly, a powder metallurgy sintering molybdenum plate blank is taken and heated to the temperature of 1485 DEG C to 1495 DEG C, second-heating-number and six-pass hot rolling is conducted at the rolling speed of 48-52 m / min, and the molybdenum plate A is obtained; secondly, the molybdenum plate is taken, three-pass cold rolling is conducted at the rolling speed of 38-42 m / min, annealing is conducted, and the molybdenum plate B is obtained; thirdly, the molybdenum plate B is taken and heated to the temperature of 845-855 DEG C and is rolled at the rolling speed of 90-100 m / min, afterwards, flattening is conducted, and the molybdenum plate B is obtained. According to the method for rolling the large unit-weight and wide molybdenum plates for the sputtering target material, obtained finished molybdenum plate strip products are large in specification, high in purity and density, small in grain gap and uniform in density, the average grain size is small, aeolotropic small grains are even, the surface flatness is high, the good surface quality and the good use performance are achieved, the requirements for the specification and the use performance of the sputtering molybdenum target material for manufacturing large and high-elaboration LCD panels are met, and the method is suitable for application and popularization.

Description

technical field [0001] The invention belongs to the technical field of molybdenum plate rolling, and in particular relates to a rolling method of a large unit weight and wide molybdenum plate strip for sputtering targets. Background technique [0002] In recent years, my country's electronic information industry has developed rapidly and has gradually become one of the regions with the largest demand for thin-film sputtering targets in the world. This huge market must also receive great attention from major sputtering target manufacturers in the world. . The development of the size of flat-panel displays requires that the deposition substrate be developed towards a larger size. The biggest problem facing target manufacturers is how to ensure the uniformity of the microstructure and organization of large-scale sputtering targets and avoid defects. In particular, the uniformity of the microstructure of the sputtering target has a great influence on the film formation rate, th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B21B1/30B21B37/74
CPCB21B1/30B21B9/00B21B15/00B21B37/74
Inventor 蒋焕迎李临洁张国杰蒋焕召
Owner 郑州通达重型机械制造有限公司
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