Array substrate and manufacturing method thereof

A technology for array substrates and manufacturing methods, which is applied in the field of array substrates and array substrate manufacturing, and can solve the problems of reduced aperture ratio, too small capacitance, and reduced aperture ratio, etc.
CN104659072AActive Publication Date: 2015-05-27BOE TECH GRP CO LTD
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Patent Information

Authority / Receiving Office
CN ยท China
Current Assignee / Owner
BOE TECH GRP CO LTD
Publication Date
2015-05-27

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Abstract

The invention relates to an array substrate, a manufacturing method thereof and a display device. The array substrate comprises a plurality of pixel groups, wherein each pixel group has a plurality of sub-pixels; each sub-pixel comprises a luminous area and a luminous layer deletion area, and a first area is limited by the luminous layer deletion area of the plurality of sub-pixels of each pixel group; a light-sensitive unit is arranged in the first area and is used for generating electrical signals according to the sensed light intensity. By virtue of the technical scheme of the invention, a non-luminous area of each sub-pixel can be fully utilized, i.e., the opening area lost by the sub-pixel is fully utilized, so that the circuit structure in the array substrate is more compact and reasonable, and furthermore the light-sensitive positioning function is also realized.
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Description

technical field

[0001] The present invention relates to the field of display technology, in particular, to an array substrate and a manufacturing method of the array substrate. Background technique

[0002] AMOLED (Active-matrix organic light emitting diode, active matrix organic light-emitting diode) display screen has multiple TFT (Thin Film Transistor, thin-film transistor) and Multi-capacitor designs such as figure 1 The circuit structure is shown, and the corresponding pixel arrangement diagram is shown in figure 2 shown. However, the increasing requirements for display performance make it a huge challenge to improve the design of pixel circuits. E.g image 3 As mentioned above, in order to improve the short-circuit risk caused by the metal climbing in the via holes where the cathode and the anode are overlapped in the OLED, a pixel definition layer is used in the prior art to fill the via holes used for the original cathode to anode overlap ,Such as Figure 4 As...

Claims

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