Array substrate and manufacturing method thereof

Abstract

The invention relates to an array substrate, a manufacturing method thereof and a display device. The array substrate comprises a plurality of pixel groups, wherein each pixel group has a plurality of sub-pixels; each sub-pixel comprises a luminous area and a luminous layer deletion area, and a first area is limited by the luminous layer deletion area of the plurality of sub-pixels of each pixel group; a light-sensitive unit is arranged in the first area and is used for generating electrical signals according to the sensed light intensity. By virtue of the technical scheme of the invention, a non-luminous area of each sub-pixel can be fully utilized, i.e., the opening area lost by the sub-pixel is fully utilized, so that the circuit structure in the array substrate is more compact and reasonable, and furthermore the light-sensitive positioning function is also realized.

Description

technical field [0001] The present invention relates to the field of display technology, in particular, to an array substrate and a manufacturing method of the array substrate. Background technique [0002] AMOLED (Active-matrix organic light emitting diode, active matrix organic light-emitting diode) display screen has multiple TFT (Thin Film Transistor, thin-film transistor) and Multi-capacitor designs such as figure 1 The circuit structure is shown, and the corresponding pixel arrangement diagram is shown in figure 2 shown. However, the increasing requirements for display performance make it a huge challenge to improve the design of pixel circuits. E.g image 3 As mentioned above, in order to improve the short-circuit risk caused by the metal climbing in the via holes where the cathode and the anode are overlapped in the OLED, a pixel definition layer is used in the prior art to fill the via holes used for the original cathode to anode overlap ,Such as Figure 4 As...

AI Technical Summary

Problems solved by technology

However, the increasing requirements for display performance make it a huge challenge to improve the design of pixel circuits.

E.g image 3 As mentioned above, in order to improve the short-circuit risk caused by the metal climbing in the via holes where the cathode and the anode are overlapped in the OLED, a pixel definition layer is used in the prior art to fill the via holes used for the original cathode to anode overlap ,like Figure 4 As shown, it will lead to a decrease in the aperture ratio

[0003] Moreover, in order to increase the number of pixels per unit area, there will be a problem that the capacitance is too small, such as Figure 5 shown

In the prior art, the capacitance is increased by setting Metal3 (a metal that does not belong to the gate metal layer and the source-drain metal layer), such as Image 6 shown, but still reduces the aperture ratio

[0004] That is to say, in order to make up for various defects in the pixel structure, the aperture ratio will inevitably be reduced.

Images