Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-yield seedling cultivation method of sweet potatoes

A high-yield, sweet potato technology, applied in the field of seedling raising, can solve the problems of low seedling emergence rate, thin seedlings, lack of nutrients, etc., and achieve the effects of strong seedlings, high yield and ensuring environmental conditions.

Inactive Publication Date: 2015-06-17
孙寿浩
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Soak the selected plump Dipsacus seeds as seeds in water and then directly sow them on the field. Due to the lack of nutrients in this cultivation method, the emergence rate is low, and the seedlings are thin and the yield is low.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] A method for raising seedlings of sweet potatoes with high yield, characterized in that said method for raising seedlings comprises the following steps:

[0018] (1) Cultivation soil pretreatment: select nutrient-rich soil, use carbendazim wettable powder and pentachloronitrobenzene as a 3:1 disinfectant, spray it on the soil at an amount of 100g / cubic soil, and Watering, keeping the moisture content at 65%, stuffy for 4 days;

[0019] (2) Nutrient fertilizer: take the wheat bran passed through a 20-mesh sieve, pass through a 3cm sieve, mulch leaf soil and decomposed manure according to the composition of 3:2:2, stir evenly, and sprinkle it into the cultivation soil layer;

[0020] (3) Seed pretreatment: Soak the seeds in clean water, take the plump seeds that sink to the bottom of the water and put them in 45% phoxim granule 800 times solution and soak for 12 minutes;

[0021] (4) Sowing: Keep the water content of the culture soil at 65%, sow at a density of 1600 grai...

Embodiment 2

[0023] A method for raising seedlings of sweet potatoes with high yield, characterized in that said method for raising seedlings comprises the following steps:

[0024] (1) Cultivation soil pretreatment: select nutrient-rich soil, use carbendazim wettable powder and pentachloronitrobenzene as a 3:1 disinfectant, spray it on the soil at an amount of 100g / cubic soil, and Watering, keeping the moisture content at 70%, stuffy for 5 days;

[0025] (2) Nutrient fertilizer: take the wheat bran passed through a 20-mesh sieve, pass through a 3cm sieve, mulch leaf soil and decomposed manure according to the composition of 3:2:2, stir evenly, and sprinkle it into the cultivation soil layer;

[0026] (3) Seed pretreatment: Soak the seeds in clean water, take the plump seeds that sink to the bottom of the water and put them in 45% phoxim granule 800 times solution and soak for 14 minutes;

[0027] (4) Sowing: Keep the water content of the culture soil at 70%, sow at a density of 1700 grai...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a high-yield seedling cultivation method of sweet potatoes. The method is characterized by comprising the following steps: 1, cultivation soil pretreatment; 2, nutrition fertilizer manufacturing; 3, seed pretreatment; 4, seeding. According to the method, by replenishing the nutrition required by the growth of the sweet potatoes and pretreating seeds, the environmental conditions for the growth of the sweet potatoes are further guaranteed, the emergence rate and survival rate are high, seedling bodies are strong, the yield is high, the control over various conditions of the method is easy to achieve, the operation is simple, the method is applicable to the areas which are cold in winter, and the market application prospect is broad.

Description

technical field [0001] The invention belongs to the technical field of seedling raising, and in particular relates to a method for raising sweet potato seedlings with high yield. Background technique [0002] The sweet potato root is fleshy, hypertrophic, conical or spindle-shaped, up to 10 cm in diameter, with light yellow skin, rich in fibrous, easy to peel off, white flesh, sweet and juicy. The stem is twisted, 3-8 meters long. Compound leaves, alternate; leaflets 3, top leaflet diamond-shaped, 3.5-16 cm long, 5.5-18 cm wide, leaflets on both sides, ovate or diamond-shaped, 3.5-14 cm long, 3-13.5 cm wide, with teeth on the edge, Or palmately split, rarely entire. [0003] Sweet potato is a high-yield and stable crop. It has the characteristics of wide adaptability, strong stress resistance, drought and barren resistance, and less pests and diseases. It is planted in places with good water and fertilizer conditions. Generally, the yield per mu of spring potato can reach ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A01G1/00A01C1/00A01C21/00
CPCA01B79/02A01C1/00A01C21/00A01G22/00
Inventor 孙寿浩
Owner 孙寿浩
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com