Metal-nitride thermistor material, manufacturing method therefor, and film-type thermistor sensor
A technology for thermistors and manufacturing methods, applied in thermistors, resistance manufacturing, metal material coating technology, etc., can solve the problems of no heat resistance, unclear thermal reliability of nitride-based materials, and unrealizable problems , to achieve the effect of high heat resistance
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[0082] Next, regarding the metal nitride material for thermistors and its manufacturing method and thin-film thermistor sensor according to the present invention, refer to Figure 4 to Figure 14 , and specifically describe the results of evaluation based on the examples prepared according to the above-mentioned embodiment.
[0083]
[0084] As examples and comparative examples of the present invention, the following Figure 4 Element 121 is shown for film evaluation.
[0085] First, by reactive sputtering method, using Ti-Cr-Al composite targets with various composition ratios, on the Si wafer with thermal oxide film to be the Si substrate S, each layer shown in Table 1 was formed with a thickness of 500 nm. The thin film thermistor part 3 of a metal nitride material for a thermistor formed with a composition ratio. The sputtering condition at this time is the ultimate vacuum degree: 5×10 -6 Pa, sputtering pressure: 0.1-1Pa, target input power (output power): 100-500W, an...
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