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Metal nitride material for thermistor and its manufacturing method and film type thermistor sensor

A technology of thermistors and thin film thermistors, applied in thermistors, metal material coating technology, resistors, etc., can solve the problem of no heat resistance, unrealizable, unknown thermal reliability of nitride-based materials, etc. problems, to achieve high heat resistance, good B constant effect

Active Publication Date: 2018-05-18
MITSUBISHI MATERIALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, in this thermistor material, in the example of Ta-Al-N-based material, although a material with a B constant of about 500 to 3000K was obtained, there is no description about heat resistance, and the nitride-based material Unknown thermal reliability
[0013] In addition, the Cr-N-M-based material of Patent Document 5 is a material with a small B constant of 500 or less, and if heat treatment at 200°C to 1000°C is not performed, heat resistance within 200°C cannot be ensured, so there is a problem that it cannot Problems in Realizing Thin-Film Thermistor Sensors Directly Formed on Thin Films

Method used

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  • Metal nitride material for thermistor and its manufacturing method and film type thermistor sensor
  • Metal nitride material for thermistor and its manufacturing method and film type thermistor sensor
  • Metal nitride material for thermistor and its manufacturing method and film type thermistor sensor

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Embodiment

[0111] Next, regarding the metal nitride material for thermistors and its manufacturing method and thin-film thermistor sensor according to the present invention, refer to Figure 8 to Figure 28 , and specifically describe the results of evaluation based on the examples prepared according to the above-mentioned embodiment.

[0112]

[0113] As examples and comparative examples of the present invention, the following Figure 8 Element 121 is shown for film evaluation. In addition, each of the following examples of the present invention was produced by using M=Ti, A=Mn and as (Ti 1-v mn v ) x Al y (N 1-w o w ) z The metal nitride element for the thermistor is used as M=Ti, A=Cu and as (Ti 1-v Cu v ) x Al y (N 1-w o w ) z The metal nitride element for the thermistor is used as M=Ti, A=Ni and as (Ti 1-v Ni v ) x Al y (N 1-w o w ) z The thermistor uses a metal nitride element, which is set as M=Ti, A=Fe and used as (Ti 1-v Fe v ) x Al y (N 1-w o w ) z ...

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Abstract

The present invention provides a metal nitride material for a thermistor, a manufacturing method thereof, and a film-type thermistor sensor. The metal nitride material for a thermistor can be directly formed into a film on a film or the like under non-firing conditions, and Has high heat resistance and high reliability. The metal nitride material used for the thermistor of the present invention is composed of a metal nitride represented by the general formula: (M1-vAv)xAly(N1-wOw)z, wherein M is selected from Ti, V, Cr, At least one of Mn, Fe and Co, and A represents at least one element selected from Mn, Cu, Ni, Fe and Co and is different from the selected M, 0.0<v<1.0, 0.70≤ y / (x+y)≦0.98, 0.45≦z≦0.55, 0<w≦0.35, x+y+z=1, and its crystal structure is a single phase of the wurtzite type in the hexagonal system.

Description

technical field [0001] The present invention relates to a metal nitride material for a thermistor that can be directly deposited on a thin film or the like under non-firing conditions, a method for producing the same, and a thin-film thermistor sensor. Background technique [0002] Thermistor materials used in temperature sensors etc. require a high B constant for high precision and high sensitivity. Conventionally, such thermistor materials are generally transition metal oxides such as Mn, Co, and Fe (refer to Patent Documents 1 to 3). In addition, these thermistor materials require heat treatment such as firing at 550° C. or higher in order to obtain stable thermistor characteristics. [0003] And, in addition to the thermistor material composed of the above-mentioned metal oxide, for example, in Patent Document 4, it is proposed that the general formula: M x A y N z (Wherein, M represents at least one of Ta, Nb, Cr, Ti and Zr, and A represents at least one of Al, Si a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01C7/02
CPCG01K7/226C23C14/0036C23C14/0641H01C1/012H01C1/14H01C7/006H01C7/008H01C7/041
Inventor 藤田利晃田中宽长友宪昭
Owner MITSUBISHI MATERIALS CORP
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