The invention provides a method for improving imaging uniformity of an
infrared sensor and the
infrared sensor, and the method comprises the following steps: S1, forming a
polyimide layer on a readout circuit
wafer, and carrying out the curing; s2, performing
etching in the
polyimide layer to form a bridge
pier channel until the
electrode surface of the readout circuit
wafer is exposed; s3, forming a first
dielectric layer on the surface of the readout circuit
wafer; s4, forming a
thermistor part on the first
dielectric layer; s5, removing the first
dielectric layer on the surface of the
electrode to
expose the
electrode; s6, forming a first
metal layer on the surface of the readout circuit wafer; s7, forming a second
dielectric layer on the surface of the readout circuit wafer; s8, performing
oxygen plasma treatment on the surface of the second
dielectric layer under the treatment conditions that the process temperature is 150-200 DEG C and the
treatment time is 1-10 minutes; and S9, performing graphical
processing on the second
dielectric layer, the first
metal layer and the first dielectric layer to form a bridge arm structure. According to the method, the uniformity of the
key size and the morphology of the bridge arm structure is improved, and the imaging uniformity of the
infrared sensor is further improved.