Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Non-contact glass micro-nano structure processing method

A processing method and non-contact technology, applied in the field of preparing micro-nano structures, can solve the problems of harsh etching line width and expensive patterning, and achieve the effect of simplifying the process cost

Active Publication Date: 2015-09-23
XIAMEN UNIV
View PDF11 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a non-contact glass micro-nano structure processing method for the problems of expensive patterning and harsh etching line width in the traditional glass etching method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Non-contact glass micro-nano structure processing method
  • Non-contact glass micro-nano structure processing method
  • Non-contact glass micro-nano structure processing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] see figure 1 , the specific steps of the embodiment of the present invention are given below:

[0019] Step 1: The glass sheet 01 is placed on the Z-axis mobile platform 04 and connected to the negative pole of the power supply 06; the conductive material 07 is made of semiconductor silicon material, processed into a needle-like shape by micro-nano etching technology, and the conductive material 07 is placed on the glass sheet 01 , fixed on the X-Y plane mobile platform 11, and connected to the positive pole of the power supply 06; turn on the heating device 03 to heat the glass sheet 01 to between 250°C and 500°C; change the distance value between the glass sheet 01 and the conductive material 07 a; and adjust the voltage value of the power supply 06 to U to break down the atmosphere medium 05 and form an arc 08. Taking air as an example, the distance value a between the glass sheet 01 and the conductive material 07 and the voltage value U of the power supply 06 satis...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A non-contact glass micro-nano structure processing method relates to a method for preparing the micro-nano structure. According to the method, a glass sheet is put on a Z axis mobile platform and is connected with a power supply cathode, and a conductive material is put above the glass sheet, is fixed on an X-Y plane mobile platform and is connected with a power supply anode; a heating unit is started, the distance between the conductive material and the glass sheet is adjusted, an atmosphere medium is punctured so as to form an electric arc, so that six parts, namely the anode, conductive material, atmosphere medium, glass sheet, cathode and power supply, form a loop, and an electric heating modification process is started; and the X-Y plane mobile platform moves in an X-Y plane and drives the conductive material to move in the X-Y plane according to a preset processing pattern so as to process the glass sheet to obtain a patterning electric heating modification structure, the glass sheet with the patterning electric heating modification structure is put in an HF solution so as to be etched, and as the etching speed of the electric heating modification structure on the glass sheet is faster than that of the unmodified area, and the etched glass sheet is processed so as to obtain the required micro-nano structure.

Description

technical field [0001] The invention relates to a method for preparing a micro-nano structure, in particular to a non-contact glass micro-nano structure processing method. Background technique [0002] Micro-Electro-Mechanical Systems (MEMS) have been widely used in aerospace, automotive, communication and medical fields. Since micro-sensors, micro-actuators and micro-actuators are the core of micro-electromechanical systems, the preparation process of micro-devices has become the key to MEMS manufacturing. [0003] As a typical material for making MEMS devices, glass is widely used in microbial sensors, optical devices, and sensor packaging. Traditionally commonly used glass micro-nano structure processing methods include sandblasting etching (Zheng Yu, Wang Ya, Ding Guifu. High reliability glass sandblasting micromachining technology based on flexible mask[J]. Nanotechnology and Precision Engineering, 2012,10 (6):563-568.), inductively coupled plasma etching (Zhang Mingc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00
Inventor 王凌云杨秉臻占瞻吴珍孙道恒
Owner XIAMEN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com