Over-atmospheric-pressure chemical vapor deposition device

Abstract

The invention discloses an over-atmospheric-pressure chemical vapor deposition device which mainly comprises a shell, a pressure maintaining chamber, a reaction chamber shell and a reaction chamber. By arranging the double-chamber structure composed of the pressure maintaining chamber and reaction chamber, the reaction chamber can be in the negative pressure state relative to the pressure maintaining chamber through the pressure adjustment and setting, so that the reaction chamber becomes a vacuum chamber relative to the pressure maintaining chamber, thereby maintaining the vacuum seal design of the existing vapor deposition device reaction chamber. The chemical vapor deposition device mainly performs pressure vessel design on the pressure maintaining chamber and pressure maintaining shell, thereby greatly simplifying the design of the over-atmospheric-pressure chemical vapor deposition device. Besides, the arrangement of the pressure shell and pressure maintaining chamber adds a protective measure to the reaction chamber to some degree. The gas in the pressure maintaining chamber can use safer gas relative to the reactant gas, thereby enhancing the equipment safety performance.

Description

technical field [0001] The invention relates to the field of semiconductor material manufacturing, in particular to a superatmospheric pressure chemical vapor deposition device. Background technique [0002] Chemical vapor deposition (CVD) technology integrates precision machinery, semiconductor materials, vacuum electronics, fluid mechanics, optics, chemistry, and computer disciplines. It is a high-end semiconductor material with high automation, high price and high technology integration. Special equipment for device manufacturing. As an ideal method for the epitaxial growth of compound semiconductor materials, chemical vapor deposition equipment has the characteristics of high quality, good stability, good repeatability, flexible process, and large-scale mass production. It has become the key core for the production of semiconductor optoelectronic devices and microwave devices in the industry. The equipment has broad application prospects and industrialization value. ...

AI Technical Summary

Problems solved by technology

[0004] At present, people have little research on superatmospheric chemical vapor deposition (Superatmospheric Chemical Vapor Deposition) device, and its manufacture is more difficult. How to design a superatmospheric chemical vapor deposition device with simple manufacturing and high reliability is very important It is of great significance to study the properties of nitride semiconductors and new materials

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