Exhaust gas recovery device for silicon material pickling machine, and exhaust gas recovery method for silicon material pickling machine

Abstract

The invention relates to the photovoltaic technical field, particularly an exhaust gas recovery device for a silicon material pickling machine, and an exhaust gas recovery method for the silicon material pickling machine. The invention provides the exhaust gas recovery device for the silicon material pickling machine. The exhaust gas recovery device for the silicon material pickling machine comprises a first reaction tank provided with a first exhaust pipe on the top face, wherein the first exhaust pipe is connected with a first air inlet pipe arranged on the side wall of a second reaction tank; a water inlet pipe is arranged on the top face of the second reaction tank; a second exhaust pipe arranged on the side face of the second reaction tank is connected with a third reaction tank provided with a second air inlet on the top face; a third exhaust pipe arranged on the side wall of the reaction tank penetrates through the top face of the fourth reaction tank and the length of the third exhaust pipe is greater than 1 / 2 of the height of a fourth reaction tank; the fourth reaction tank is connected with the bottom face of the second reaction tank through an acid discharge pipe; a fourth exhaust pipe and an acid discharge opening are arranged on the side wall and the bottom face of the fourth reaction, respectively. The device provided by the invention can be used for effectively reducing the discharge rate of exhaust gas and effectively recovering exhaust gas, so that dilute nitric acid is recycled and the pollution to the atmosphere is reduced.

Description

technical field [0001] The invention relates to the field of photovoltaic technology, in particular to a waste gas recovery device of a silicon material pickling machine and a waste gas recovery method thereof. Background technique [0002] In the existing photovoltaic industry, the cleaning of silicon materials is a very important task. Its purpose is to make the surface of silicon materials clean and free from impurity pollution. According to the different corrosive liquids used, it is divided into two types: pickling and alkali cleaning. In large-scale production, a mixture of hydrofluoric acid and nitric acid is generally used. During the process of cleaning silicon materials, a large amount of yellow smoke will appear, and the main components are nitrogen oxides, such as nitric oxide, nitrogen dioxide, and nitrogen dioxide. The amount of these gases accounts for more than 90%. Since these gases are extremely harmful to the human body, in the follow-up treatment, accordi...

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The structure of the patent is unreasonable, and the recovery effect is not good

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