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Photoresist removal method

A technology of photoresist and fiber optic panels, applied in the direction of photosensitive material processing, etc., can solve the problems of incomplete removal of photoresist and fiber panel material damage, and achieve good effect and small damage

Active Publication Date: 2016-06-01
BEIJING ZHONGKEZIXIN TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the removal process, it is easy to cause damage to the fiber optic panel material, and at the same time, the cleaning fluid needs to be replaced frequently
In addition, the concentrated sulfuric acid used in the prior art can only remove the surface layer of the photoresist, but cannot completely remove the photoresist.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] (1) Use wet etching to remove photoresist;

[0023] (2) Use a hypochlorous acid solution with a concentration of 20% to wash the photoresist residue on the fiber optic panel;

[0024] (3) Heat the sodium hydroxide solution with a concentration of 9% to 70°C, soak and wash;

[0025] (4) Put the optical fiber panel washed with sodium hydroxide solution into water, and continue to pass through ozone for 20 minutes;

[0026] (5) Wash in 26% chlorine water for 10 minutes;

[0027] (6) Soak in n-hexane at 40°C for 1 hour, take it out, wash it with clean water, and dry it.

Embodiment 2

[0029] (1) Use wet etching to remove photoresist;

[0030] (2) Use a 50% perchloric acid solution to wash the photoresist residue on the fiber optic panel;

[0031] (3) Heat 10% potassium hydroxide solution to 90°C, soak and wash;

[0032] (4) Put the optical fiber panel washed with potassium hydroxide solution into water, and continue to pass through ozone for 25 minutes;

[0033] (5) Wash in 25% chlorine water for 20 minutes;

[0034] (6) Soak in N-N dimethylformamide at 45°C for 1.5 hours, take it out, wash it with clean water, and dry it.

Embodiment 3

[0036] (1) Use wet etching to remove photoresist;

[0037] (2) Use a hydrofluoric acid solution with a concentration of 20% to wash the photoresist residue on the fiber optic panel;

[0038] (3) Heat the mixed alkali solution of 8% potassium hydroxide and sodium hydroxide to 80°C, soak and wash;

[0039] (4) Put the optical fiber panel washed with the mixed alkali solution into the water, and continue to pass through the ozone for 22 minutes;

[0040] (5) Wash in 20% chlorine water for 15 minutes;

[0041] (6) Soak in N-N dimethylformamide at 55°C for 1 hour, take it out, wash it with clean water, and dry it.

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PUM

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Abstract

The invention discloses a photoresist removing method which comprises the following steps of: (1) removing a photoresist by wet etching; (2) washing residual photoresist on an optical fiber panel by using an acid solution; (3) heating an alkali solution, and washing the optical fiber panel by using the alkali solution; (4) placing the optical fiber panel washed by using the alkali solution in water, and continuously introducing ozone; (5) adding chlorine water; and (6) immersing the optical fiber panel by using an organic solvent. By the photoresist removing method, the parts of the photoresist at the surface layer and the bottom layer can be respectively removed, and the photoresist on the optical fiber panel is thoroughly removed.

Description

technical field [0001] The invention belongs to the field of semiconductor manufacturing, and in particular relates to a method for removing photoresist. Background technique [0002] Photoresist, also known as photoresist, is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer and solvent. The photoresist should have relatively low surface tension, so that the photoresist has good fluidity and coverage. After the photosensitive resin is exposed to light, the photocuring reaction can quickly occur in the exposed area, so that the physical properties of the material, especially the solubility and affinity, will change significantly. Photoresists are widely used in the manufacture of printed circuits and integrated circuits, and in processes such as printing plate making. The technology of photoresist is complicated and there are many varieties. According to its chemical reaction mechanism and development principle, it can be d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 陈哲张睿王者馥王绪敏殷金龙任鲁风
Owner BEIJING ZHONGKEZIXIN TECH