Warming junction-pushing diffusion technology

Abstract

The invention discloses warming junction-pushing diffusion technology comprising steps of: (1) boat in; (2) fast increasing temperature; (3) pre-oxidation; (4) warming deposition; (5) warming junction pushing; (6) cooling; and (7) boat out. Warming diffusion is carried out under a low-temperature condition and junction pushing is carried out under a high-temperature condition such that a deep junction with low surface concentration is formed and a conversion efficiency is increased by over 0.2 percent.

Description

technical field [0001] The invention belongs to the field of solar cells, and in particular relates to a temperature-rising push-junction diffusion process. Background technique [0002] At present, the production process of solar cells mainly includes cleaning texture, diffusion, etching, PECVD, screen printing and sintering. In the main manufacturing process of solar cells, the surface concentration, junction depth and square resistance uniformity of the diffused silicon wafer directly affect the electrical properties of the solar cell. , forming a PN junction, which is the core of the solar cell and plays a vital role in the photovoltaic conversion efficiency. Although the currently used constant temperature diffusion process has a good effect on the preparation of PN junctions during phosphorus diffusion, the gettering effect on the substrate is not particularly significant. This is because the release and diffusion of impurities in the phosphorus gettering process req...

AI Technical Summary

Problems solved by technology

Although the constant temperature diffusion process currently used has a good effect on the preparation of PN junctions during phosphorus diffusion, the gettering effect on the substrate is not particularly significant.

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