An Insulated Gate Bipolar Device Using a Surface Voltage Resistant Layer Structure
An insulated gate and bipolar technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of small voltage change range and voltage change delay
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[0038] The technical solutions of the present invention will be described in further detail below with reference to the accompanying drawings and embodiments. For the sake of convenience, unless otherwise specified, this patent takes the IGBT device as an example. The technical schemes in the drawings and embodiments are also applicable to gate-controlled thyristors, IGCTs, MCTs and other bipolar devices.
[0039] Fig. 4 (a) is n used in this patent - -Schematic diagram of the structure of the IGBT's cell and its junction edge. Among them, in n - Type substrate 101 has p-type region 110 and n-type region 111 to lower surface 002, and these two regions are respectively covered with a conductor to form n - - Anode A and base B of the IGBT. in n - There are two source substrate regions 121 and 122 of n-MIST under the upper surface 001 of the substrate 101, each of which has an electron source region 124 and 125 in the two source substrate regions, and an electron source regi...
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