Waveless front detector far-field laser beam shaping device and method based on double-wavefront corrector

A wavefront corrector and wavefront detector technology, applied in optics, instruments, optical components, etc., can solve the problem of limited shaping range and accuracy of a single deformable mirror laser beam shaping system, increasing system complexity and cost, and laser beam shaping. The process is complicated and other problems, so as to achieve the effect of far-field light intensity shaping, shortening the optimal control time, and improving the shaping range and accuracy

Active Publication Date: 2015-12-30
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

Since the near-field modulation phase is directly fitted by the deformable mirror, the wavefront detector is required to measure the system aberration, which increases the complexity and cost of the system; if there is a dynamic aberration in the system, the laser beam shaping process will be more complicated by this method
[0005] In summary, the single deformable mirror laser beam shaping system has limited shaping range and accuracy; while the wavefront detector-based double deformable mirror laser beam shaping system directly uses the deformable mirror to fit the near-field modulation phase and needs to use the wavefront detector to measure the system image. Poor, increase system complexity and cost, and it is difficult to achieve real-time beam shaping when there is dynamic aberration in the system

Method used

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  • Waveless front detector far-field laser beam shaping device and method based on double-wavefront corrector
  • Waveless front detector far-field laser beam shaping device and method based on double-wavefront corrector
  • Waveless front detector far-field laser beam shaping device and method based on double-wavefront corrector

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[0032] specific implementation plan

[0033] The specific implementation manner of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0034] figure 1The far-field laser beam shaping device without a wavefront detector based on a dual wavefront corrector shown mainly includes a laser system, a wavefront correction system, a beam matching system, a monitoring system, a working system and a computer control system, among which: the laser system, Composed of a laser 1 and a collimator 2, the output beam of the laser 1 is collimated; the wavefront correction system is composed of a first wavefront corrector 3 and a second wavefront corrector 6, which corrects system aberrations in real time and generates Near-field modulation phase required for far-field laser beam shaping; beam matching system, consisting of a first matching lens 4 and a second matching lens 5, matching the beam apertures of the first wavefront corrector 3 a...

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Abstract

The invention discloses a waveless front detector far-field laser beam shaping device based on a double-wavefront corrector. The device comprises a laser system, a wavefront correction system, a beam matching system, a monitoring system, a working system and a computer control system; the monitoring system collects far-field light-intensity form distribution information, the computer control system concurrently controls the double-wavefront corrector according to an optimization algorithm, corrects system aberration in real time and generates a near-field modulation phase needed by far-field laser beam shaping, and laser beam shaping on the monitoring system is achieved; by means of the characteristic that incident pupil face phase distributions of the working system and the monitoring system are the same, when the laser beam shaping is achieved on the monitoring system, the laser beam shaping is synchronously achieved on the working system. According to the waveless front detector far-field laser beam shaping device based on the double-wavefront corrector, the double-wavefront corrector is adopted to promote the shaping range and accuracy of the system; a waveless front detection method is adopted, dynamic aberration of the system can be corrected, and far-filed light-intensity real-time shaping is achieved.

Description

technical field [0001] The invention relates to a laser beam shaping device in the field of beam shaping, in particular to a far-field laser beam shaping device and method based on a double wavefront corrector without a wavefront detector. Background technique [0002] Lasers are widely used in many fields such as industry, military, communication, medicine and scientific research due to their good characteristics in terms of directionality, brightness, monochromaticity and coherence. Usually, the spatial shape of the laser beam is Gaussian distribution. With the expansion of the application field of laser technology, Gaussian beams can no longer meet some specific requirements in practical applications. For example, laser processing, laser holography, laser storage and recording, and isotope separation, etc., these applications require the output laser beam shape and energy of the laser to be in a specific distribution. This requires the use of laser beam shaping technolo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/09
CPCG02B27/09
Inventor 张雨东何杰铃魏凌杨金生李喜琪何益
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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