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A method for preparing acid and alkali-resistant nano Hastelloy coatings by magnetron sputtering and vacuum heat treatment

A technology of vacuum heat treatment and Hastelloy, applied in metal material coating process, coating, sputtering and other directions, can solve the influence of high cost factors of strong acid and alkali resistance of C-276 Hastelloy, and high preparation cost The problem is to improve the acid and alkali corrosion resistance, the effect is obvious, and the process is simple.

Inactive Publication Date: 2018-04-06
江苏尚大海洋工程技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] C-276 Hastelloy is an alloy with strong acid and alkali resistance, but due to the addition of precious metal elements, the preparation cost is high, and it can only be used in high-tech fields in use, and it is rarely used in general industrial devices. It is still less, so the application of the strong acid and alkali resistance of C-276 Hastelloy is greatly affected by the high cost factor of its bulk material

Method used

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  • A method for preparing acid and alkali-resistant nano Hastelloy coatings by magnetron sputtering and vacuum heat treatment

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Effect test

Embodiment 1

[0027] The commercially available C-276 Hastelloy alloy was used as the target, and the Q235 low-carbon steel was ultrasonically cleaned with acetone, ethanol and deionized water, blown with high-pressure nitrogen and placed on the substrate holder in the deposition chamber. The distance from the substrate to the target is about 7 cm. The background vacuum before deposition is better than 8×10 -5 Pa, the working pressure during the deposition process is 0.1Pa, N 2 The flow rate is 20mL / min (standard state). The C-276 Hastelloy target is controlled by a medium-frequency pulse power supply with a fixed power of 350W and a frequency of 80kHz. In order to improve the uniformity of the sample, the speed of the sample stage is 14r / min. In order to improve the film quality, 20min pre-sputtering is required to clean the target surface before sputtering. During the deposition process, a medium-frequency pulse bias of -90V was applied to the substrate, the substrate temperature was c...

Embodiment 2

[0030] The commercially available C-276 Hastelloy alloy was used as the target, and the Q235 low-carbon steel was ultrasonically cleaned with acetone, ethanol and deionized water, blown with high-pressure nitrogen and placed on the substrate holder in the deposition chamber. The distance from the substrate to the target is about 7 cm. The background vacuum before deposition is better than 8×10 -5 Pa, the working pressure during the deposition process is 0.1Pa, N 2 The flow rate is 20mL / min (standard state). The C-276 Hastelloy target is controlled by a medium-frequency pulse power supply with a fixed power of 350W and a frequency of 80kHz. In order to improve the uniformity of the sample, the speed of the sample stage is 14r / min. In order to improve the film quality, 20min pre-sputtering is required to clean the target surface before sputtering. During the deposition process, a medium-frequency pulse bias of -90V was applied to the substrate, the substrate temperature was c...

Embodiment 3

[0033] The commercially available C-276 Hastelloy alloy was used as the target, and the Q235 low-carbon steel was ultrasonically cleaned with acetone, ethanol and deionized water, blown with high-pressure nitrogen and placed on the substrate holder in the deposition chamber. The distance from the substrate to the target is about 7 cm. The background vacuum before deposition is better than 8×10 -5 Pa, the working pressure during the deposition process is 0.1Pa, N 2The flow rate is 20mL / min (standard state). The C-276 Hastelloy target is controlled by a medium-frequency pulse power supply with a fixed power of 350W and a frequency of 80kHz. In order to improve the uniformity of the sample, the speed of the sample stage is 14r / min. In order to improve the film quality, 20min pre-sputtering is required to clean the target surface before sputtering. During the deposition process, a medium-frequency pulse bias of -90V was applied to the substrate, the substrate temperature was co...

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Abstract

The invention relates to a method for preparing a nano hastelloy coating resistant to acid and alkali by adopting magnetron sputtering and vacuum heat treatment. The method comprises the following steps: preparing a nano C-276 hastelloy coating by adopting magnetron sputtering; ultrasonically cleaning the prepared nano C-276 hastelloy coating, and then carrying out vacuum heat treatment and cooling treatment. The method has the advantages of simple process, obvious effect and no environmental pollution. The method for preparing the nano C-276 hastelloy coating by combining with magnetron sputtering can prepare the coating most resistant to acid and alkali and corrosion.

Description

technical field [0001] The invention belongs to the field of preparation of nano alloy coatings, in particular to a method for preparing acid and alkali resistant nano Hastelloy coatings by magnetron sputtering and vacuum heat treatment. Background technique [0002] Magnetron sputtering coating technology refers to the use of high-energy particles with kinetic energy above tens of electron volts to bombard the surface of the material in a vacuum chamber, and the particles in the target are shot out through the transfer of particle momentum, and the material is excited into a gaseous state. It is deposited on a substrate to form a thin film technology. Because the particles of sputtering coating often have extremely high energy, the substance is deposited on the substrate in the form of high-energy particles, which makes the most prominent feature of the film obtained by sputtering deposition is the extremely high density of the film and the strong bonding force between the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/14C23C14/35C23C14/58
Inventor 张俊喜钟庆东吴世权史茜舒明勇韩洪波
Owner 江苏尚大海洋工程技术有限公司
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