Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photocurable composition and methods for optical component by using the same

一种光固化性、组合物的技术，应用在半导体/固态器件制造、光学、电气元件等方向

Active Publication Date: 2016-02-17
CANON KK
View PDF7 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, even in such methods using condensable gas, the force (mold release force) required to separate (release) the mold from the cured resist film is still large.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photocurable composition and methods for optical component by using the same
  • Photocurable composition and methods for optical component by using the same
  • Photocurable composition and methods for optical component by using the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0221] [Preparation of Photocurable Composition 1]

[0222] A (meth)acrylate monomer (component (A)), a photopolymerization initiator (component (B)), and a release agent (component (C)) described below were mixed to obtain a mixed solution.

[0223] Component (A) (total: 100 parts by weight)

[0224] (A-1) Isobornyl acrylate (manufactured by Kyoeisha Chemical Co., Ltd., trade name: IB-XA): 75 parts by weight

[0225] (A-2) 1,10-Decanediol diacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: A-DOD-N): 25 parts by weight

[0226] Component (B)

[0227] (B-1) IRGACURE369 (manufactured by BASF): 3 parts by weight

[0228] Note that (B-1) IRGACURE369 is a compound represented by the following formula (1), which is (2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1 ).

[0229] [chemical formula 12]

[0230]

[0231] Component (C)

[0232] (C-1) Megaface EXP.TF-2067 (manufactured by DIC Corporation, nonionic fluorine-based surfactant): 1.1 parts...

Embodiment 2

[0238] [Preparation of Photocurable Composition 2]

[0239] Except using 2.0 parts by weight of (C-2) BLAUNONSA-30 / 702000R (manufactured by Aoki Oil Industrial Co., Ltd., non-ionic alkyl-based surfactant) as a release agent (component (C)), as in Example 1 Prepare photocurable composition 2.

[0240] (Measurement of release force)

[0241] The average release force was measured as in Example 1 except by using Photocurable Composition 2. The average release force is 13N. This value was lower than when the photocurable composition of the comparative example described below was used.

Embodiment 3

[0243] [Preparation of Photocurable Composition 3]

[0244] A photocurable composition 3 was prepared as in Example 1 except that 0.8 parts by weight of (C-3) Pluriol A760E (manufactured by BASF, methyl polyethylene glycol) was used as a release agent (component (C)).

[0245] (Measurement of release force)

[0246] The average release force was measured as in Example 1 except by using Photocurable Composition 3. The average release force is 17N. This value was lower than when the photocurable composition of the comparative example described below was used.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
surface tensionaaaaaaaaaa
surface tensionaaaaaaaaaa
surface tensionaaaaaaaaaa
Login to View More

Abstract

In an imprint method in a condensable gas atmosphere, the force (mold releasing force) required to separate a mold from a resist cured film (mold release) has been large. A photocurable composition for performing imprint in an atmosphere containing a condensable gas includes a component (A) which is a (meth)acrylate monomer; a component (B) which is a photopolymerization initiator; and a component (C) which is a mold releasing agent. The saturated solubility of the component (C) in the condensable gas at 5 degrees (Celsius) and 1 atm is 50% by weight or more, the condensable gas being in a liquid state at 5 degrees (Celsius) and 1 atm.

Description

technical field [0001] The present invention relates to a photocurable composition, a method for producing a film, an optical component, a circuit board, and an electronic component using the photocurable composition, and a cured product. Background technique [0002] The demand for miniaturization of semiconductor devices and microelectromechanical systems (MEMS) has increased the need for existing photolithography and a technique called photoimprinting in which a mold is used to shape a resist (photocurable composition) on a wafer, Attention to the combination of nanofabrication techniques to form resist patterns on the substrate. According to this technology, sub-ten nanometer-order fine structures can be formed on a substrate. In the photoimprint system, a resist is first applied to a pattern-forming region on a substrate, and then the resist is shaped by using a mold on which a pattern has been formed in advance. The resist is then irradiated with light to be cured, a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027B29C59/02C08F2/44C08F2/50
CPCC08F2/44C08F2/50G03F7/0002H01L21/0271H01L21/266C08K2201/00B29C33/62C08F222/102C08F220/1811B29C59/002B29C59/005B29C59/026B29K2033/08B29K2105/0005C08L33/08
Inventor 本间猛伊藤俊树米泽诗织千叶启子山下敬司
Owner CANON KK
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com