Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A three-coordinate four-degree-of-freedom diffraction light intensity measurement platform

A diffraction light intensity and measurement platform technology, applied in the field of experimental instruments, can solve problems such as unfavorable comparative analysis of diffraction effects of different diffraction elements, further research on limiting light diffraction phenomena, and difficulty in measurement and adjustment, so as to achieve accurate and reliable experimental data. Low manufacturing cost and the effect of expanding the scope of experiments

Active Publication Date: 2018-01-23
YANSHAN UNIV
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the diffraction light intensity measurement system used in schools is generally aimed at grating diffraction. The light intensity measurement system is located on the same horizontal axis as the grating, and it is difficult to measure and adjust. When the angle of the light source is fixed, this device cannot use a prism as a diffraction element for diffraction spectrum measurement. Light intensity measurement is not conducive to comparative analysis of the diffraction effects of different diffraction elements, which limits students' further research on light diffraction phenomena

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A three-coordinate four-degree-of-freedom diffraction light intensity measurement platform
  • A three-coordinate four-degree-of-freedom diffraction light intensity measurement platform
  • A three-coordinate four-degree-of-freedom diffraction light intensity measurement platform

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The present invention will be described in more detail below in conjunction with the specific embodiments of the accompanying drawings:

[0023] A three-coordinate four-degree-of-freedom diffraction light intensity measurement platform, such as figure 1 -3 shown, including base 1, X-axis mechanism 2, Y-axis mechanism 3, Z-axis mechanism 4, rotation mechanism 5 and light intensity detector, with figure 1 For reference, the left and right horizontal direction is defined as the X axis, the front and rear horizontal direction is defined as the Z axis, and the up and down vertical direction is defined as the Y axis; the X-axis mechanism 2 is installed on the base 1, and the Y-axis mechanism 3 is installed on the X-axis mechanism 2 Above, the Z-axis mechanism 4 is installed on the Y-axis mechanism 3, the rotation mechanism 5 is installed on the Z-axis mechanism 4, and the light intensity detector is installed on the rotation mechanism 5;

[0024] refer to Figure 4 As shown...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a three-coordinate four-degree-of-freedom diffracted light intensity measuring platform, comprising a base, an X-axis mechanism, a Y-axis mechanism, a Z-axis mechanism, a rotating mechanism and a light intensity detector, wherein the X-axis mechanism is installed on the base, the Y-axis mechanism is installed on the X-axis mechanism, the Z-axis mechanism is installed on the Y-axis mechanism, the rotating mechanism is installed on the Z-axis mechanism, and the light intensity detector is installed on the rotating mechanism. The platform can be used for measuring the spectra of optical axis deflection caused by a diffraction element, overcomes the defects of traditional diffraction measurers, improves the measuring accuracy and precision relative to manual adjustment under the control of an upper computer, can be applied to teaching demonstration and experimental study, and brings great help to education practice and scientific research.

Description

technical field [0001] The invention relates to an experimental instrument, in particular to a three-coordinate four-degree-of-freedom diffraction light intensity measurement platform, which is a diffraction light intensity measurement instrument after grating diffraction and triangular prism diffraction in physics, and can be used in teaching demonstrations and experimental researches middle. Background technique [0002] Diffraction of light is a basic phenomenon in optics. Diffraction of light is very important and widely used, and plays a pivotal role in daily life and scientific research. Diffraction of light can be applied to spectral analysis and structural analysis. Using its "magnification" effect that is quite sensitive to fine structures, structural analysis can be carried out through patterns, such as X-ray structure, diffraction imaging spectral analysis and imaging in coherent light In the system, the concept of two-time diffraction imaging is introduced, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01J1/04G09B23/22
CPCG01J1/0403G09B23/22
Inventor 张立国徐婧金梅刘晓飞刘宁
Owner YANSHAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com