Normal-voltage glow plasma device

Abstract

The invention provides a normal-voltage glow plasma device. The normal-voltage glow plasma device comprises a middle frequency plasma chamber and a radio frequency plasma chamber, wherein gas entering the plasma device firstly flows into the middle frequency plasma chamber and enters the radio frequency plasma chamber after generating plasmas in the middle frequency plasma chamber. According to the invention, when the gas enters the device by means of a performing system, a middle frequency power supply is firstly used in the device to excite the gas to generate the plasmas in the middle frequency plasma chamber, the plasmas are continuously transmitted to the radio frequency plasma chamber, and more seed electrons are provided to a radio frequency power supply for generating plasmas by exciting, so that the breakdown voltage of an RF voltage is lowered, Townsend discharge is smoothly generated, and uniform glow discharge is finally generated in a large area.

Description

technical field [0001] The invention relates to an atmospheric pressure glow plasma device. Background technique [0002] Plasma technology has been widely used in many disciplines such as materials, microelectronics, chemical engineering, machinery and environmental protection, and has gradually formed a plasma industry with broad application prospects since the 1960s. For example, in materials science, some new functional thin film materials can be synthesized by using plasma physical vapor deposition technology and chemical vapor deposition technology; in the microelectronics industry, ultra-large-scale integrated circuits can be processed by using plasma etching technology; In engineering, some polymer thin film materials can be prepared by using plasma polymerization technology. The plasma that is widely used in the industry is still low-pressure plasma, because it is more stable, highly repeatable, and can form a large area of ​​plasma. [0003] Although low-pressure...

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Problems solved by technology

[0005] However, the existing atmospheric pressure plasma technology usually uses an intermediate frequency power supply (tens to hundreds of kHz) to generate plasma. This method can achieve a large area of ​​plasma, but the plasma it produces is usually filamentary discharge rather than Non-uniform glow discharge, so the bombardment energy is relatively high, it is easier to damage the substrate or introduce electrode pollutants during deposition or processing, and because it is non-uniform glow discharge, its uniformity is poor, which also leads to deposition or Uneven continuum of treatment effects

However, if RF power is used to stimulate plasma generation, uniform glow discharge plasma can usually be generated, but it is difficult to achieve large-area discharge, and the conditions for plasma generation are very harsh.

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