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23 results about "Glow discharge plasma" patented technology

Preparation method of HiPIMS coating adaptive to multi-grain-size hard alloy and hard alloy cutting tool of HiPIMS coating

The invention relates to the technical field of hard alloy coating preparation, and discloses a preparation method of a HiPIMS coating adaptive to multi-grain-size hard alloy and a hard alloy cutting tool thereof. The preparation method of the HiPIMS coating adaptive to the multi-grain-size hard alloy comprises the main steps of vacuumizing, heating and heat preservation, argon glow discharge plasma etching and cleaning, arc electron source auxiliary cleaning and activation, and metal nitride coating deposition on the surface of a base material through the high-power pulse magnetron sputtering technology. According to the preparation method disclosed by the invention, the preparation of the metal nitride coatings on the hard alloy substrates with different grain sizes is realized, and the prepared metal nitride coatings have relatively high hardness and adhesive force, so that the problem that process parameters of hard alloys with different grain sizes need to be independently optimized in the prior art is solved; and the production efficiency is improved.
Owner:KUNSHAN DONG DACHANGYING NEW MATERIALS TECHNOLOGY CO LTD

A SiCf / SiC composite material with ultra-high temperature ceramic gradient coating, its preparation method and application

This invention discloses a SiC with an ultra-high temperature ceramic gradient coating. f / SiC composite materials, their preparation methods, and applications. A double-layer glow discharge plasma surface metallurgical method is used to prepare SiC composite materials. f A (Hf,Si,Ta)C gradient composite coating was prepared on the surface of the SiC composite material. This coating was able to resist SiC in an oxygen atmosphere at 1773 K. f Effective protection of SiC composite materials. The specific advantages of this invention are: (1) Ion bombardment of the substrate significantly improves the point defects and conductivity of the composite substrate; (2) The (Hf,Si,Ta)C coating has a continuous gradient structure, forming a good metallurgical bond between the coating and the substrate, with high bonding strength; (3) The similar thermal expansion coefficients of the (Hf,Si,Ta)C coating and the substrate can improve the thermal mismatch between the coating and the substrate, reducing the tendency for coating peeling and cracking during service; (4) The (Hf,Si,Ta)C coating system has a high service temperature and self-healing ability. The coating prepared by this invention has excellent high-temperature protection performance, improving the protection of SiC. f The high-temperature service life of SiC composite materials has broad application prospects in the aerospace field.
Owner:NANJING UNIV OF AERONAUTICS & ASTRONAUTICS +1

Modified dodecylamine collector, preparation method and application thereof

PendingCN122141862APressurized chemical processFlotationGlow discharge plasmaMineral processing
The present application relates to the technical field of mineral processing, and particularly relates to a modified dodecylamine collector, a preparation method and application thereof.The preparation method of the modified dodecylamine collector provided by the present application comprises the following steps: carrying out glow discharge air plasma treatment on dodecylamine by taking air as a working gas.The present application introduces oxygen-containing and / or nitrogen-containing active groups on the surface of dodecylamine molecules by means of glow discharge air plasma modification of dodecylamine, and the dodecylamine is used for flotation separation of quartz and hematite, so that the adsorption capacity and selectivity of the dodecylamine to quartz, especially fine quartz, are enhanced, and efficient separation of quartz and hematite can be realized at a lower dosage; and the raw material of the preparation method is green and environmentally friendly, the modification process is low-temperature, safe and controllable, no by-product is generated, and the energy consumption is low.
Owner:SONGXIAN SHANJIN MINING CO LTD +1

A glow cathode plasma source having a light-transmitting gap

ActiveCN115763201BElectric discharge tubesParticle physicsGlow discharge plasma
The application discloses a glow cathode plasma source with a light transmission gap, belongs to the field of plasma discharge, and aims at solving the problem that the existing glow discharge equipment cannot realize optical monitoring. The glow cathode plasma source comprises a holding electrode, a quartz glass and a front end of an electron extraction electrode which is rotated and cut to have a hole for transporting plasma; the upper end of a cathode side wall surface is provided with a C-shaped gap, the upper end of a holding electrode side wall surface is provided with a first L-shaped gap, and the upper end of an electron extraction electrode side wall surface is provided with a second L-shaped gap; a working gas enters a chamber surrounded by the cathode through a gas inlet pipe; the cathode is provided with an external connecting post for applying a negative potential, the holding electrode is provided with an external connecting post for applying a positive high-voltage potential, and the working gas is broken down to generate plasma in a vacuum environment; and an optical monitor monitors the generated plasma through the C-shaped gap, the first L-shaped gap, the second L-shaped gap and the quartz glass. The application is used for a glow discharge plasma source.
Owner:HARBIN INST OF TECH +1

Supported catalyst for synthesizing methyl methacrylate, preparation method and application thereof

The present invention provides a supported catalyst for synthesizing methyl methacrylate. The catalyst includes a carrier and an active component arranged on the carrier. The carrier is a Ce-M-N composite oxide treated with glow discharge plasma. The active component is Au, M is selected from one or more of Al, Ni, Cu, and Zr, and N is selected from one or more of K, Ca, Ba, and Mg. The Au loading is 0.5-3.0 wt%. The supported catalyst for synthesizing methyl methacrylate and a preparation method thereof are provided. The Ce-M-N oxide composite is used as a carrier and is composited with M to reduce its oxygen vacancy formation energy, making it easier to form oxygen vacancies. The electrons and negatively charged high-energy particles in the glow discharge plasma are utilized to generate oxygen vacancies in CeO2. The oxygen vacancies are easily activated by oxygen adsorption, thereby facilitating the oxidative esterification reaction of methanol and methacrolein, thereby improving the activity of the catalyst.
Owner:WUXI WEIFU ENVIRONMENT PROTECTION CATALYST

Apparatus and method for high spectral and temporal resolution glow discharge spectrometry

The invention relates to a glow discharge spectrometry apparatus (100) comprising a glow discharge lamp (1) and an optical emission spectrometer adapted to receive a light beam (20) emitted by a glow discharge plasma (2). According to the invention, the optical emission spectrometer comprises a dispersive optical component (7) and a ladder grating (8) arranged and configured to form a two-dimensional spectrum (26) of the light beam, the two-dimensional spectrum (26) being dispersed in a plurality of diffraction orders (P1, …Pj,…PT), the plurality of diffraction orders (P1, …Pj,…PT) extending along a first direction (X) and each diffraction order (P1, …Pj,…PT) extending spectrally along a second direction (Y) transverse to the first direction (X), and a pixel-matrix CMOS detector (10) arranged and configured to acquire the two-dimensional spectrum (26) as a function of time. Figure for the abbreviation: Fig. 1
Owner:HORIBA FRANCE SAS

A method for preparing a GaON epitaxial film grown by plasma-enhanced chemical vapor deposition

The application relates to the field of semiconductor material preparation, in particular to a preparation method of a GaON epitaxial film prepared through plasma-enhanced chemical vapor deposition (PECVD). The GaON epitaxial film is prepared by taking metal gallium as a gallium source, taking oxygen as an oxygen source, taking nitrogen as a nitrogen source and taking argon as a transport gas. The GaON epitaxial film is prepared by optimizing post-growth parameters through a PECVD system. The method can make gaseous substances containing film components chemically react through glow discharge plasma, and then realize film material growth. Since a large number of high-energy electrons are contained in the plasma, the high-energy electrons can provide the activation energy required by the chemical vapor deposition process, so that the reaction temperature is significantly reduced, and the efficiency and quality of film deposition are improved. The GaON epitaxial film prepared through the method has excellent performance and meets the needs of future industrialized mass production.
Owner:ZHEJIANG SCI-TECH UNIV

Method and apparatus for plasma processing

The invention relates to a method for processing a sample using glow discharge plasma, the method comprising one or more processing steps in which the sample for processing is subjected to plasma in a processing vessel provided with a temperature control system for cooling or heating the sample, wherein during the one or more processing steps the processing vessel is rotated around an axis to agitate the sample. The invention also relates to a device for use in such a method.
Owner:HAYDALE GRAPHENE IND

A micro-deformation, high-wear-resistant and impact-resistant plasma nitriding method for titanium alloy transmission parts

The present invention discloses a method for producing micro-deformation, highly wear-resistant and impact-resistant plasma nitriding for titanium alloy transmission parts. This method belongs to the field of titanium alloy surface treatment technology and includes ultrasonic cleaning, heating and cleaning, glow ion cleaning and activation, plasma nitriding, and furnace cooling. The method uses H2 and NH3 as process gases, and through a glow discharge plasma process, nitrogen is bombarded and infiltrated into the surface layer of the Ti alloy matrix in the form of active microparticles. The process gas composition ratio is adjusted within a range of 1:9 to 3:7. The plasma nitrided layer produced by the present invention does not affect the dimensional accuracy of the components. It significantly enhances the wear resistance and impact resistance of titanium alloy transmission components, thereby significantly extending the service life of the components.
Owner:MAANSHAN FY PRECISION MACHINERY CO LTD +2

Laboratory organic wastewater treatment device based on glow discharge

A laboratory organic wastewater treatment device based on glow discharge is characterized in that a reaction tank is arranged on a magnetic stirrer, an anode bar, a spraying mechanism, a sewage inlet and an exhaust structure are arranged at the top of the reaction tank, the anode bar is located in the center of the top of the reaction tank, a support is arranged on the lower middle portion in the reaction tank, and a cathode plate is arranged on the support; the cathode plate is located under the anode bar and forms a glow discharge plasma system with the anode bar, iron powder is placed in the reaction tank, an electromagnetic adsorption mechanism used for fixing the iron powder is arranged on the outer side wall of the reaction tank, and a water outlet is formed in the bottom of the reaction tank. According to the device disclosed by the utility model, refractory organic pollutants in water can be efficiently degraded by adopting a glow discharge plasma technology, the refractory organic pollutants are converted into micromolecular, low-toxicity or non-toxic substances, and compared with a physical method and a chemical method, the glow discharge plasma technology almost does not need consumables, so that the treatment cost is reduced.
Owner:SHAANXI NORMAL UNIV

Modified dodecylamine collector, preparation method and application thereof

ActiveCN122141862BGlow discharge plasmaMineral processing
The present application relates to the technical field of mineral processing, and particularly relates to a modified dodecylamine collector, a preparation method and application thereof.The preparation method of the modified dodecylamine collector provided by the present application comprises the following steps: carrying out glow discharge air plasma treatment on dodecylamine by taking air as a working gas.The present application introduces oxygen-containing and / or nitrogen-containing active groups on the surface of dodecylamine molecules by means of glow discharge air plasma modification of dodecylamine, and the dodecylamine is used for flotation separation of quartz and hematite, so that the adsorption capacity and selectivity of the dodecylamine to quartz, especially fine quartz, are enhanced, and efficient separation of quartz and hematite can be realized at a lower dosage; and the raw material of the preparation method is green and environmentally friendly, the modification process is low-temperature, safe and controllable, no by-product is generated, and the energy consumption is low.
Owner:SONGXIAN SHANJIN MINING CO LTD +1

Method for modifying activated carbon and its application in adsorbing cvocs

This invention discloses a method for modifying activated carbon and its application in the adsorption of CVOCs, belonging to the field of environmental protection technology. This invention prepares activated carbon through a multi-step modification process using low-pressure glow discharge plasma. The resulting activated carbon possesses high specific surface area, high adsorption capacity, and excellent hydrophobic properties. The adsorption system achieves fully automated integrated CVOCs adsorption-desorption-regeneration-wastewater treatment. The system of this invention can treat concentrations ≥10000 mg / m³. 3 The CVOCs waste gas, after purification, has a gas concentration ≤50mg / m³. 3 Simultaneously, it treats CVOCs wastewater with COD of 5000~7000mg / L to ≤50mg / L, all meeting national standards; the system reduces operating costs by over 77%, and after 7200 hours of continuous use, the activated carbon loss rate is ≤2%, and the purification efficiency is ≥99%, resulting in significant environmental and economic benefits.
Owner:JIANGSU QIQING ENVIRONMENTAL TECH CO LTD

A method for physical vapor deposition of ceramic coating on the surface of the working belt of an extrusion die

PendingCN122358123ACeramic coatingAcid washing
This invention discloses a method for physical vapor deposition of a ceramic coating on the surface of an extrusion die working belt, belonging to the technical field of coating on the surface of extrusion die working belts. The method includes the following steps: surface pretreatment of the extrusion die working belt, including cleaning and degreasing, polishing, and activation treatment; the activation treatment refers to sequentially performing acid washing, primary salt washing, water washing, glow discharge plasma treatment, secondary salt washing, and water washing on the surface of the extrusion die working belt using an activation treatment solution; preparing a ceramic coating material by depositing the ceramic coating material on the surface of the extrusion die working belt using physical vapor deposition equipment to form a ceramic coating with a thickness of 4 micrometers to 6 micrometers; and post-treatment of the extrusion die working belt surface. The ceramic coating of this invention has high hardness, strong bonding strength with the die surface, excellent impact resistance, and is less prone to cracking, peeling, or even breakage.
Owner:SHANDONG XINGBANG MOULD TECH CO LTD

Substrate processing device based on direct current glow discharge plasma

ActiveCN223465256UCleaning processes and apparatusGlow discharge plasmaPumping vacuum
The utility model discloses a substrate processing device based on direct-current glow discharge plasma. The substrate processing device comprises a process chamber, a discharge device arranged in the process chamber, a substrate fixing device, a direct-current high-voltage power supply located outside the process chamber, and a vacuumizing device connected with the process chamber. The process chamber is further communicated with a gas path system used for gas inlet and gas outlet, an electrode flange is arranged between the direct-current high-voltage power supply and the discharging device, the two sides of the electrode flange are connected with the direct-current high-voltage power supply and the discharging device respectively, and a cooling device is arranged at the tail of the electrode flange. According to the scheme, the substrate is cleaned through the direct current glow discharge plasma technology, the adhesive force between the substrate and the colloid is increased, and the problem of degumming in the subsequent technological process is avoided. According to the scheme, the substrate treatment process is realized by arranging the process chamber, the discharging device, the direct-current high-voltage power supply, the vacuumizing device and the like, the structure is simple, the device can be suitable for treating substrates of different specifications, and the use requirements are met.
Owner:ANHUI ZHONGKE GRATING TECH CO LTD

Four-pipeline special-shaped polyester fiber fabric surface functionalization modification equipment and method based on radio frequency and normal-pressure glow discharge

The invention discloses four-pipeline special-shaped polyester fiber fabric surface functional modification equipment and method based on radio frequency and normal-pressure glow discharge plasma, and belongs to the technical field of textile material modification. The equipment consists of a radio frequency plasma reactor and a normal-pressure glow discharge reactor, wherein the radio frequency plasma reactor comprises a parallel plate electrode, a gas injection pipeline and a central control system; the normal-pressure glow discharge plasma reactor is provided with a needle electrode, a PID temperature control module and a gas mixing system. Through the synergistic effect of the double reactors and in combination with multi-channel gas precise injection and intelligent control, flame-retardant, antibacterial and hydrophobic multifunctional modification is achieved. The method comprises the steps of pretreatment cleaning, surface activation with argon, flame-retardant monomer grafting, helium cross-linking strengthening, CF4 hydrophobic treatment, antibacterial agent grafting and post-treatment. The preparation method breaks through the limitation of a traditional process, solves the problems of single function, poor uniformity and low durability, and is suitable for the fields of high-temperature working protective clothing, medical textiles and the like.
Owner:NANJING TECH UNIV

Plasma parameter diagnosis method based on Bi-LSTM model and related equipment

The invention discloses a plasma parameter diagnosis method based on a Bi-LSTM model and related equipment, and the method comprises the steps: obtaining I-V characteristic data of double probes in a DC glow discharge plasma device under different potential deviation angles and different discharge voltage-air pressure combinations, plasma parameters corresponding to the I-V characteristic data at the datum point are recorded; taking the plasma parameters as labels of the I-V characteristic data to construct a data set, dividing the data set into a training set and a verification set, and training a preset Bi-LSTM model by taking minimization of a mean absolute error as a target to obtain a target Bi-LSTM model; and inputting the I-V characteristic data of the double probes to be tested into the target Bi-LSTM model to obtain plasma parameters corresponding to the I-V characteristic data of the double probes to be tested.
Owner:DALIAN MARITIME UNIVERSITY

Resonant constant current source driven bimodal discharge plasma wastewater treatment system and method

This invention discloses a resonant constant current source-driven dual-mode discharge plasma wastewater treatment system and method, belonging to the field of organic wastewater technology. The glow discharge unit of this invention is located within a reaction chamber and is used to generate stable glow discharge plasma in a pure oxygen atmosphere to generate hydrogen peroxide in situ. The packed bed dielectric barrier discharge unit includes at least one U-shaped discharge tube, high-dielectric particles filled inside the U-shaped discharge tube, a carbon fiber high-voltage electrode disposed at the center of the U-shaped discharge tube, and a grounded cooling pool. The U-shaped discharge tube is immersed in the grounded cooling pool. The carbon fiber high-voltage electrode is electrically connected to the resonant constant current unit via a high-voltage switch. The inlet of the U-shaped discharge tube is connected to an oxygen source, and the outlet is connected to the interior of the reaction chamber, used to generate ozone in an oxygen atmosphere and introduce the ozone into the reaction chamber. This invention improves the degradation rate and eliminates secondary pollution.
Owner:XI AN JIAOTONG UNIV

System and method for driving plasma to convert carbon dioxide and water through new energy

The invention discloses a system and method for driving plasma to convert carbon dioxide and water through new energy, and belongs to the technical field of greenhouse gas resource utilization and energy conversion. The system for driving the plasma to convert the carbon dioxide and the water through the new energy comprises a renewable power supply module, a plasma catalysis carbon dioxide and water conversion module and a product aftertreatment module, a plasma reactor comprises an outer medium pipe, and a net-shaped supporting piece is arranged in the outer medium pipe; a plurality of atmospheric pressure glow discharge plasma jet devices arranged in an array structure are arranged above the net-shaped supporting piece, an atmospheric pressure glow discharge plasma jet array can be provided, the effective action volume of plasmas is enlarged, the contact effect of active species in the plasmas with a carbon bed and a catalyst bed is further improved, and the service life of the plasmas is prolonged. And the production rate and selectivity of the product meet industrial application requirements.
Owner:XI AN JIAOTONG UNIV

Axial magnetic field regulated low temperature plasma material surface processing device

ActiveCN115942583BPlasma techniqueLow temperature plasmaGlow discharge plasma
This invention belongs to the field of plasma applications and relates to a material surface treatment device for axial magnetic field-controlled low-temperature plasma. The device includes an outer cylinder, a high-voltage tip electrode, a flat ground electrode, an electromagnetic coil, and a magnetic core. One end of the high-voltage tip electrode penetrates the left cover plate and extends into the discharge cavity, while the other end is connected to a high-voltage power supply. The flat ground electrode is disposed inside the outer cylinder and opposite to the high-voltage tip electrode. A placement platform for placing the material to be treated is pre-fabricated on the side of the flat ground electrode closest to the high-voltage tip electrode. An electromagnetic coil is laterally arranged around the outer cylinder and connected to a magnetic control unit. A magnetic core is disposed on the inner wall of the outer cylinder. An air inlet is opened on the left cover plate, and an air outlet is opened on the right cover plate. A large-area diffuse distribution of atmospheric pressure glow discharge plasma can be obtained between the high-voltage tip electrode and the flat ground electrode. The size of the distribution space can be precisely adjusted by the magnitude of the magnetic field strength, thereby expanding the distribution space of atmospheric pressure glow discharge diffuse low-temperature plasma.
Owner:XI AN JIAOTONG UNIV

A Plasma-Enhanced Physical Vapor Deposition Method

This invention provides a plasma-enhanced physical vapor deposition method, comprising the following steps: (1) a) sequentially forming a high-resistivity metal oxide and a metal thin film protective layer on the surface of a metal shield, and generating a negative potential; or b) depositing a metal thin film protective layer on an insulating shield by magnetron sputtering, and generating a negative potential; (2) preparing a metal film by magnetron sputtering: transferring the substrate to the stage, lifting the annular metal baffle into the shield, introducing a certain flow rate of argon gas to form a glow discharge plasma, the plasma colliding with sputtered metal atoms to generate a large number of metal ions, forming a metal film on the substrate; (3) eliminating and initializing the charge on the surface of the shield in the PVD vacuum chamber. This invention forms a high-resistivity metal oxide and a metal thin film protective layer on the surface of a metal shield or forms a metal thin film protective layer on an insulating shield, and generates a negative potential, which can enhance the plasma density during metal thin film sputtering and improve the metal thin film step coverage.
Owner:WUXI SHANGJI SEMICON TECH CO LTD

Plasma reactor for greenhouse gas conversion

PendingUS20250281895A1Process control/regulationHydrogenGlow discharge plasmaMechanical engineering
The present disclosure relates to a plasma reactor for plasma-based gas conversion comprising a pin electrode extending along a longitudinal axis from a first end to a second end, an opposing electrode opposing a discharge tip of the 10 pin electrode, a plasma chamber for confining a glow discharge plasma, and an electrically-insulating body that comprises an inner bore extending along the longitudinal axis from a bore entrance to a bore exit. The second end of the pin electrode comprises a discharge tip. The pin electrode penetrates the inner bore from the bore entrance and extends at least partly through the inner bore and a15 radial wall of a portion of the inner bore located between the second end of the pin electrode and the opposing electrode, is radially delimiting the plasma chamber. The plasma reactor is further configured for varying an electrode separation distance between the discharge tip of the pin electrode and the opposing electrode.
Owner:UNIVERSITEIT ANTWERPEN

Preparation method of composite catalyst for catalyzing polyol conversion

The invention discloses a preparation method of a composite catalyst for catalyzing polyol conversion, which specifically comprises the following steps: soaking foam metal in a salt solution of second metal to be loaded, and loading the second metal component onto the foam metal by using a glow discharge plasma reduction method, a replacement method or an electrodeposition method; and cleaning and drying the reacted product to obtain the composite catalyst. According to the method, an efficient catalytic activity interface can be constructed on the surface of the foam metal, based on the synergistic effect of the two metal components, the polyol is quickly converted into a product with a high additional value under the reaction conditions of normal temperature and normal pressure, and the conversion rate of the polyol (glycerol and glucose) to a target product (such as 1, 2-propylene glycol) is remarkably increased. The conversion rate and the selectivity of 1, 3-propylene glycol, gluconic acid) are improved.
Owner:NANJING TECH UNIV

Method for regulating and controlling interface of composite material based on plasma at low temperature

The invention relates to the technical field of low-temperature plasma and interface construction, in particular to a method for regulating and controlling a composite material interface at low temperature based on plasma. According to the method, the composite material is placed in a glow discharge plasma chamber, inert gas is introduced after vacuumizing, low-temperature regulation and control treatment is carried out, and regulation and control of the interface of the composite material are completed. According to the method for low-temperature regulation and control of the composite material interface based on the plasma, low-temperature precise regulation and control of the composite material interface can be achieved, the macroscopic temperature of the composite material interface is close to the room temperature during application, and therefore the structure of the material cannot be damaged; the method only needs one-step operation, is simple, high in treatment speed, safe and reliable, does not use toxic reagents, has few material defects, is uniform in composite material component distribution, and has a wide application prospect in the fields of catalysis, microelectronics industry, polymer films and the like.
Owner:SHANGHAI JIAOTONG UNIV