Tungsten-titanium co-doped diamond coating material and preparation technique thereof
A diamond coating and coating material technology, applied in metal material coating process, coating, ion implantation plating and other directions, to achieve the effect of low wear rate and low friction coefficient
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[0017] The patent of the present invention will be described in further detail below in conjunction with specific examples, but not as a limitation to the patent of the present invention.
[0018] First, use ultrasonic cleaning to remove the contamination layer on the surface of the workpiece; then use argon ions generated by glow discharge to perform ion etching and cleaning on the surface of the workpiece. During etching, the argon pressure in the vacuum chamber is 2Pa, and the voltage between the workpiece and the vacuum chamber is 600- 1000V. Then use reactive magnetron sputtering deposition technology to prepare Ti / TiN / TiCN / TiC gradient transition layer. The magnetron sputtering target is made of high-purity titanium, the target voltage is 400V, the target current is 15-20A; the negative bias of the workpiece is 100 -300V; In the process of preparing the transition layer, argon, argon / nitrogen mixed gas, argon / nitrogen / methane mixed gas, argon / methane mixed gas are introd...
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