Method for pretreatment in electroplating process
A pretreatment, electrochemical technology, applied in the field of pretreatment in the electroplating process, can solve the problem of long use time, and achieve the effect of long service life and easy electroplating reaction
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Embodiment 1
[0011] Provided is a method for pretreatment in the electroplating process, comprising the steps of: degreasing and etching processes for the parts to be plated. The electrochemical degreasing liquid used in the degreasing process includes sodium hydroxide and sodium metasilicate. The components of the electrochemical degreasing liquid are: sodium hydroxide 5g / L, sodium metasilicate 55g / L. The time of the degreasing process is 4 minutes.
[0012] The bright etching solution used in the etching process includes sulfuric acid with a mass fraction of 98%, concentrated nitric acid and hydrochloric acid with a mass fraction of 37%. The components of the bright etching solution are: sulfuric acid 720g / L, concentrated nitric acid 500g / L, hydrochloric acid 5g / L. The etching time in the etching step is 8 minutes.
Embodiment 2
[0014] Provided is a method for pretreatment in the electroplating process, comprising the steps of: degreasing and etching processes for the parts to be plated. The electrochemical degreasing liquid used in the degreasing process includes sodium hydroxide and sodium metasilicate. The components of the electrochemical degreasing liquid are: sodium hydroxide 15g / L, sodium metasilicate 40g / L. The time of the degreasing process is 2 minutes.
[0015] The bright etching solution used in the etching process includes sulfuric acid with a mass fraction of 98%, concentrated nitric acid and hydrochloric acid with a mass fraction of 37%. The components of the bright etching solution are: sulfuric acid 700g / L, concentrated nitric acid 550g / L, hydrochloric acid 3g / L. The time for etching in the etching step is 13 minutes.
Embodiment 3
[0017] Provided is a method for pretreatment in the electroplating process, comprising the steps of: degreasing and etching processes for the parts to be plated. The electrochemical degreasing liquid used in the degreasing process includes sodium hydroxide and sodium metasilicate. The components of the electrochemical degreasing liquid are: sodium hydroxide 10g / L, sodium metasilicate 50g / L. The time of the degreasing process is 3 minutes.
[0018] The bright etching solution used in the etching process includes sulfuric acid with a mass fraction of 98%, concentrated nitric acid and hydrochloric acid with a mass fraction of 37%. The components of the bright etching solution are: sulfuric acid 750g / L, concentrated nitric acid 450g / L, hydrochloric acid 8g / L. The etching time in the etching step is 5 minutes.
[0019] The beneficial effects of the present invention are:
[0020] 1. This method can degrease the surface of the plated parts, remove scale and passivation film, and...
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