Automatic exposure machine mechanism
A technology of automatic exposure and lifting mechanism, which is used in microlithography exposure equipment, photolithography process exposure devices, etc., can solve the problems of image pad printing failure, prone to errors, inconsistent focus, etc., to achieve precise alignment, convenient operation, The effect of improving work efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0029] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments. Terms such as "upper", "lower", "left", "right", "middle" and "one" quoted in the preferred embodiment are only for convenience of description, and are not used to limit the scope of the present invention. The scope of implementation and the change or adjustment of its relative relationship shall also be regarded as the scope of implementation of the present invention without substantive changes in technical content.
[0030] See figure 1 , an automatic exposure machine mechanism designed in a preferred embodiment of the present invention, which specifically includes: an upper frame 101 , a lower frame 102 , a lower frame lifting mechanism 200 , a frame changing mechanism 300 and a lifting alignment device 400 .
[0031] See figure 2 Specifically, the upper frame 101 and the lower frame 102 have the same basic structure, which is mainly compos...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com