Alkali-free glass and application of alkali-free glass to substrates of flat-panel displays

An alkali-free glass and strain point technology, applied in the field of glass manufacturing, can solve problems such as the deterioration of glass surface quality and poor chemical resistance of glass substrates, achieve high strain point and Young's modulus, realize light and thin wide range of effects

Active Publication Date: 2016-06-08
ZHENGZHOU XUFEI OPTOELECTRONICS TECH +1
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0004] The purpose of the present invention is to provide an alkali-free glass, which can solve the problem of poor chemical resistance of the glass substrate in the prior art and the decrease of glass surface quality during the acid treatment thinning process

Method used

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  • Alkali-free glass and application of alkali-free glass to substrates of flat-panel displays

Examples

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Comparison scheme
Effect test

Embodiment

[0036] Table 1 shows the components and contents of the alkali-free glass in Examples 1-6 and Comparative Examples 1-2.

[0037] The alkali-free glass in each embodiment is prepared according to the following steps: each component is weighed according to the weight percentage and fully mixed, and kept in a platinum-rhodium crucible at 1650° C. for 20 hours, stirring with a platinum rod to remove air bubbles, and Clarify and homogenize the glass liquid. Then, pour the molten glass into a stainless steel mold, anneal at 800°C, and test various physical and chemical properties after cooling down to room temperature. Among them, the coefficient of linear thermal expansion is measured by a horizontal dilatometer, and the coefficient of linear thermal expansion (CTE) in the range of 50-350 °C is measured by ×10 -7 / °C; the strain point is measured by a bending beam viscometer, and the unit is expressed in °C; the density is measured by the Archimedes method, and the unit is g / cm 3...

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Abstract

The invention discloses alkali-free glass. The alkali-free glass comprises, by weight, 100 parts of SiO2, 25-45 parts of Al2O3, 1-10 parts of MgO, 2-15 parts of CaO, 1-5 parts of TiO2 and 0.5-5 parts of V2O5. An R which is computed by the aid of a formula of R=0.206w*(Al2O3)+0.4w*(MgO)-0.007w*(CaO)+0.2w*(TiO2)+0.143w*(V2O5) is 7.5-12. The alkali-free glass has the advantages that the alkali-free glass is high in chemical stability, accordingly, the problem of deterioration of the surface quality of glass of glass substrates due to thinning procedures in the prior art can be solved, glass substrates can have target thicknesses by the aid of thinning treatment on the premise that the quality of the glass substrates is guaranteed, and flat-panel display glass can be lightened and thinned; the alkali-free glass has a high strain point and high Young's modulus and is excellent in performance and wide in application range.

Description

technical field [0001] The invention relates to the field of glass manufacturing, in particular to an alkali-free glass and its application in flat panel display substrates. Background technique [0002] The development trend of flat panel display glass is lightweight and thinner. The market demand for its thickness has reached less than 0.5mm, or even 0.1mm, or even lower. However, the thickness of the glass directly produced by the current mature thin plate glass production process cannot meet the requirements. The decreasing thickness of the glass substrate usually needs to be used after thinning treatment. [0003] At present, the commonly used thinning method is the chemical thinning method, that is, first soak the glass surface with a certain concentration of hydrofluoric acid solution for erosion, and then perform physical grinding and polishing. This requires that the glass substrate must have high chemical stability to ensure the performance of the thinned glass su...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/087
CPCC03C3/087
Inventor 闫雪锋苏记华时伟娜何豪刘文渊杨忠杰王俊明
Owner ZHENGZHOU XUFEI OPTOELECTRONICS TECH
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