Easy-cleaning and quick-drying wall cloth fabric with shape memory function
A fabric and memory technology, applied in the field of easy-to-wash and quick-drying wall cloth fabrics, can solve the problems of airtightness, easy mold, and bacteria breeding in wall cloth, and achieve the effect of good anti-wrinkle function and resilience performance.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0020] see figure 1 and figure 2 , the present invention relates to an easy-washable and quick-drying wall cloth fabric with shape memory function, which includes a fabric body 1, the fabric body 1 is interwoven into a grid structure by warps 2 and wefts 3, and the grid structure makes the fabric The main body 1 has good air permeability and layering. The weft thread 3 is made of memory fiber polyester. This memory fiber polyester makes the fabric body 1 have an excellent anti-wrinkle function and good resilience performance. The fabric body 1 The front of the front is covered with polyurethane layer 4, flax fiber core layer 5 and ramie fiber layer 6 in turn, wherein the polyurethane layer 4 has the characteristics of waterproof, breathable, transparent and visible, and antibacterial, and the flax fiber core layer 5 has the characteristics of moisture absorption and heat dissipation, health care and antibacterial, Anti-fouling, anti-static, anti-ultraviolet, and high flame-r...
PUM

Abstract
Description
Claims
Application Information

- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com