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Diffuse reflective film and method of making the same

A diffuse reflection and thin film technology, applied in the field of diffuse reflection materials, can solve the problems of low reflectivity, complex preparation process, and difficulty in mass production, and achieve high reflectivity and high diffuse reflection effects

Inactive Publication Date: 2019-06-18
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Existing reflective materials, which are sold by American Labsphere (Northsutton, NH) under the trademark of SPECTRALON, have excellent reflectivity and diffuse reflection performance, but they contain relatively hard blocks, and the preparation process determines that the thickness of the material is relatively large, and the minimum The thickness is up to 4mm, which limits the application of this material to some extent
Zirong Tang(Highly visible-light reflective SiO x N y nanowires for bright-white reflector applications. ThinSolid Films, 2013, 529: 115–118.) et al. used randomly grown silicon oxynitride nanowires to prepare bright white diffuse reflection materials. Compared with traditional materials, the thickness of the material is greatly reduced, but Its reflectivity is low, and the preparation process is complicated, so it is difficult to realize large-scale production

Method used

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  • Diffuse reflective film and method of making the same
  • Diffuse reflective film and method of making the same
  • Diffuse reflective film and method of making the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0049] In this example, a diffuse reflective thin film material composed of 650nm PS microspheres is prepared, which has ultra-thin, high reflectivity, and diffuse reflective properties close to Lambertian reflection. Its preparation process is as follows:

[0050] 1) A suspension of monodisperse PS microspheres with a diameter of 650nm was prepared by hydrothermal dispersion polymerization, with a mass fraction of 2% and a surface potential of -30mv.

[0051] 2) Add 20uLCaCl with a molar concentration of 1M / L to 2ml of PS microsphere suspension 2 solution.

[0052] 3) Sonicate the microsphere suspension with electrolyte added in 2) for 5 min.

[0053] 4) The ultrasonic suspension is drop-coated on the glass substrate, and the large particles aggregated from the microspheres in the suspension are randomly deposited on the glass substrate.

[0054] 5) Volatilize at room temperature for 8 hours. After the solvent in the system evaporates completely, a randomly stacked PS micr...

Embodiment 2

[0058] The difference between this example and Example 1 is that: the PS microsphere suspension with a diameter of 950 nm was prepared by hydrothermal dispersion polymerization; the solvent volatilization temperature was 40° C. and the solvent volatilization time was 6 h. Its preparation process is with embodiment 1.

[0059] What the present invention obtains is that diameter is that the microsphere diffuse reflection film thickness of 950nm is 21um, and spectral reflectance is as Figure 4 As shown, it has a very high reflectivity in the visible light to near-infrared band, and the reflectivity distribution is flat in the whole band; when the incident light wavelength is 632.8nm, the reflected light intensity angle distribution is as follows Figure 5 As shown, the reflected light intensity distribution is almost uniform in the range of 0-180°, and the diffuse reflection characteristics are close to the Lambertian reflective surface. It can be known that the microsphere dif...

Embodiment 3

[0061] The difference between this example and Example 1 is that: SiO with a diameter of about 1400 nm was prepared by stober method 2 Microsphere suspension, its mass fraction is 4%, the surface potential is -30mv; to 4ml SiO 2 Add 100uL of NaCl electrolyte solution with a concentration of 0.5M / L to the microsphere suspension; after settling, the solvent volatilization temperature is 40°C, and the volatilization time is 6h; the sintering heat treatment temperature is 400°C, and the sintering time is 2h. All the other preparation processes are similar to Example 1.

[0062] The present invention obtains SiO with a diameter of 1400nm 2 Microsphere diffuse reflective film, the thickness is 28um, the SiO 2 The microsphere diffuse reflective material has ultra-thin, wide-band high reflectivity and excellent diffuse reflective properties close to Lambertian reflection.

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Abstract

The invention discloses a diffuse reflection film. The diffuse reflection film is composed of randomly-stacked monodisperse microspheres which have no light absorption ability or have a low light absorption rate; the diameter of the microspheres ranges from 300 to 3000 nm. The invention also discloses a manufacturing method of the diffuse reflection film. The method includes the following steps that: a microsphere suspension is prepared, the diameter of microspheres ranging from 300 to 3000 nm; an electrolyte solution making the microspheres aggregated is added into the suspension; the microsphere-aggregated microsphere suspension is deposited on a substrate; and a solvent in the microsphere suspension is completely volatilized, heating is carried out so as to make the microspheres adhered, and therefore, the diffuse reflection film can be obtained. With the diffuse reflection film and the manufacturing method thereof provided by the invention adopted, high-reflectivity diffuse reflection can be realized with a very thin film material.

Description

technical field [0001] The invention relates to the technical field of diffuse reflection materials, in particular to a diffuse reflection film and a manufacturing method thereof. Background technique [0002] Diffuse reflection materials can reflect the light incident on the surface in all directions, and are widely used in the fields of lighting, display, energy and optical testing instruments. For example, in a liquid crystal display (LCD), a reflective plate with excellent diffuse reflection characteristics is required to achieve the best image quality; in thin-film silicon solar cells, a back reflection layer with high reflectivity and excellent scattering characteristics can increase the light in the cell. process to improve battery efficiency. Lambertian reflective materials can reflect incident light on the surface uniformly in all directions according to Lambert's cosine law. Lambertian reflective materials with high reflectivity are the key to many optical metrol...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/02G02B1/04C08J5/18
Inventor 叶雄英王敏毕明朝
Owner TSINGHUA UNIV
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