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Radio Frequency Inductive Element Based on Silicon-on-Insulator Substrate and Its Preparation Method

A technology of silicon-on-insulator and inductance elements is applied in the field of radio frequency inductance elements based on silicon-on-insulator substrates and their preparation, which can solve the problems of low Q value resonance frequency of radio frequency inductance elements, reduce parasitic capacitance and improve Q value. , the effect of good heat dissipation conditions

Active Publication Date: 2018-07-06
SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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Problems solved by technology

[0007] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a radio frequency inductive element based on a silicon-on-insulator substrate and a preparation method thereof, which is used to solve the problem of the relatively high Q value and resonance frequency of the radio frequency inductive element in the prior art. low problem

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  • Radio Frequency Inductive Element Based on Silicon-on-Insulator Substrate and Its Preparation Method
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  • Radio Frequency Inductive Element Based on Silicon-on-Insulator Substrate and Its Preparation Method

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[0038] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0039]see Figure 1 to Figure 16 . It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, so that only the components related to the present invention are shown in the diagrams rather than the number, shape and Dimensional drawing, the type, quantity and proportion of each component can be changed arbitrarily during actual implementation, and the ...

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Abstract

The invention provides a radio frequency inductive element based on a silicon-on-insulator substrate and a preparation method thereof. The preparation method includes: 1) preparing a silicon-on-insulator substrate, the silicon-on-insulator substrate comprising sequentially stacked bottom silicon, insulating Layer and top layer of silicon, the lower part of the insulating layer has a groove at least up to the bottom silicon at the position corresponding to the preparation of the radio frequency inductive element; 2) define the device area by mask photolithography at the position corresponding to the groove , and etch and remove the top layer of silicon in the device region, exposing the upper surface of the insulating layer below; 3) preparing a radio frequency inductive element in the device region based on a CMOS process. The invention is based on a patterned silicon-on-insulator substrate, and obtains an inductance element with a substrate cavity through post-etching. The device structure can effectively suppress the inductance loss caused by the silicon substrate and reduce the parasitic capacitance, which is beneficial to improving the Q value and the resonant frequency of the inductance device.

Description

technical field [0001] The invention relates to a semiconductor component and a preparation method thereof, in particular to a radio frequency inductance element based on a silicon-on-insulator substrate and a preparation method thereof. Background technique [0002] Wireless communication technology is one of the fastest-growing technologies in the IT field in recent decades, and radio frequency circuits play a vital role in wireless communication. With the rapid development of CMOS technology, the cost of manufacturing electronic devices based on CMOS technology has been greatly reduced. According to the report of the International Solid State Circuits Annual Conference in recent years, the largest markets for integrated circuits (ICs) are network equipment, mobile phones and consumer electronics. China is already the third largest market for ICs, and its potential market attracts worldwide attention, among which the number of mobile phone users ranks first in the world. ...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L23/64H01L21/02
Inventor 俞文杰费璐刘强刘畅文娇王翼泽王曦
Owner SHANGHAI INST OF MICROSYSTEM & INFORMATION TECH CHINESE ACAD OF SCI
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