The invention discloses a
radio frequency inductor element based on a
silicon substrate on an insulator, and a preparation method for a
radio frequency inductor element, and the method comprises the steps: 1), preparing the
silicon substrate on the insulator, wherein the
silicon substrate comprises a bottom silicon layer, an insulating layer and a top silicon layer, wherein the bottom silicon layer, the insulating layer and the top silicon layer are stacked together. A part, corresponding to a position where a
radio frequency inductor element is prepared, of the lower part of the insulating layer is provided with a groove which at least reaches the bottom silicon layer; 2), defining a device region at a position corresponding to the groove through
mask photoetching, removing the top silicon layer of the device region through
etching, and exposing the upper surface of the insulating layer; 3), preparing the radio frequency inductor element in the device region based on the
CMOS technology. The radio frequency inductor element is based on the patterned silicon substrate on the insulator, and the radio frequency inductor element with a substrate cavity is obtained through the later
etching. The radio frequency inductor element can effectively inhibit the
inductance loss caused by the silicon substrate, reduces the stray
capacitance, and facilitates the improvement of the Q value and resonant frequency of the inductor.